Abstract: In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

Abstract: The present invention relates to a polyethylene resin composition for lamination having excellent adhesiveness to a substrate or the like, and preferably also excellent in easy-opening properties such as easy piercing properties, and more specifically, relates to a polyethylene resin composition (C) for lamination containing an ethylene/propylene copolymer (A) having the following properties (a-1) to (a-4). (a-1) A constituent unit derived from ethylene is contained 80 to 98 mol % as a main component, a constituent unit derived from propylene is contained 2 to 20 mol % as an essential sub-component, and a constituent unit derived from a third ?-olefin other than ethylene and propylene may be contained 5 mol % or less as a sub-component. (a-2) MFR 0.1 to 100 g/10 min. (a-3) Density is 0.88 to 0.94 g/cm3. (a-4) Total of vinyl and vinylidene is 0.35 or more.

Abstract: A polyethylene resin composition for a foamable laminate satisfying the following properties (a-1) to (a-4): (a-1) the melt flow rate (MFR) of the polyethylene-based resin (A) as measured in accordance with JIS K7210 (190° C., a load of 21.18N) is 7 g/10 minutes or more and less than 20 g/10 minutes, (a-2) the density of the polyethylene-based resin (A) in accordance with JIS K7112 at a test temperature of 23° C. is from 0.900 to 0.930 g/cm3, (a-3) the oxygen induction time (OIT) at 180° C. is 10 minutes or more and less than 190 minutes, (a-4) the memory effect (ME) of the polyethylene-based resin (A) as measured using a melt indexer to be used in JIS K7210 and under conditions of a cylinder temperature of 240° C. and a constant-rate extrusion output of 3 g/minute is less than 2.0.

Abstract: In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

Abstract: The present invention provides a polyethylene-based resin composition for a foamable laminate which contains a polyethylene-based resin (A) satisfying the following properties (a-1) to (a-3): (a-1) MFR is 6 g/10 minutes or more and less than 20 g/10 minutes; (a-2) the density is from 0.920 to 0.930 g/cm3; and (a-3) the ratio of eluates at an elution temperature of 70° C. or higher is from 47 to 83% by weight in the elution curve obtained by a temperature rising elution fractionation (TREF) with o-dichlorobenzene.

Abstract: In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality of conversion processes to create the write data, and applying a plurality of pre-processes to a plurality of pieces of second frame data into which second chip data of the write data is divided, and registering the second chip data into the writing apparatus. The plurality of conversion processes and the plurality of pre-processes are each performed in a pipeline processing on a per-frame basis. The write data is registered into the writing apparatus on a per-chip basis, on a per-virtual chip basis, or on a per-frame basis. The virtual chip includes a plurality of chips combined together.

Abstract: The present invention provides a polyethylene resin composition for a foamable laminate which gives foamed cells having sufficient height and good appearance (foamed layer), even in the case of machining under high speed conditions at the time of extrusion lamination, a foamable laminate, a method for producing the same, a foamed converted paper, and a heat insulating container. The invention relates to a polyethylene resin composition for a foamable laminate, which is used for forming a polyethylene-based resin layer (I) for foaming on at least one side of a substrate mainly composed of paper, wherein the resin composition comprises a polyethylene-based resin (A) and satisfies the following properties (a-1) to (a-4): (a-1) the melt flow rate (MFR) of the polyethylene-based resin (A) as measured in accordance with JIS K7210 (190° C., a load of 21.

Abstract: In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry. The drawing data with the hierarchical map includes a plurality of files in which division maps are respectively described in files in units of subframes. Each division map includes dose correction information associated with corresponding one of blocks of the drawing area. The process further includes generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

Abstract: In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality of conversion processes to create the write data, and applying a plurality of pre-processes to a plurality of pieces of second frame data into which second chip data of the write data is divided, and registering the second chip data into the writing apparatus. The plurality of conversion processes and the plurality of pre-processes are each performed in a pipeline processing on a per-frame basis. The write data is registered into the writing apparatus on a per-chip basis, on a per-virtual chip basis, or on a per-frame basis. The virtual chip includes a plurality of chips combined together.

Abstract: In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry, the drawing data with the hierarchical map including a plurality of files in which division maps are respectively described in files in units of subframes, each division map including dose information associated with corresponding one of blocks of the drawing area, and the process further including generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

Abstract: The energy harvesting device includes a power management circuit to charge a storage with power from a generator including generation units to generate AC power when vibrated. The power management circuit includes: a first power extraction circuit including a rectification circuit converting AC power at a first input unit into DC power; a second power extraction circuit including a switching circuit operating with power from the storage and generating DC power using AC power at a second input unit; and a switch circuit having a first connection mode of connecting the first input unit to the generation units to receive an AC voltage greater in effective value than an AC voltage to the second input unit, and a second connection mode of connecting the second input unit to the generation units to receive an AC voltage greater in effective value than an AC voltage to the first input unit.

Abstract: Disclosed is a method for measuring a profile using a device for measuring the profile in which included are: a distance measuring means 2 for measuring the distance to an edge region of a semiconductor wafer 12 in such a manner that light is emitted to be reflected at the edge region and to be detected; a first swing mechanism swingably supporting the distance measuring means 2; and a second swing mechanism swingably supporting the first swing mechanism, the method comprising the steps of: locating angles of the first swing mechanism each of which gives a maximum intensity of received light at each of predetermined angles of the second swing mechanism thereof; calculating contour points using coordinate transformation, thereby enabling points-related data to be acquired to represent a contour profile of the edge region. Thus, the method can be used for edge profile measurement of large-diameter wafers.

Abstract: An apparatus for inspecting overlapping figures includes a chip overlap inspection unit configured to input a data file on each chip of a plurality of chips arranged in a writing pattern, and inspect an existence of an overlap between a plurality of chips, based on arrangement data on each region of the plurality of chips, a setting unit configured to set, with respect to the plurality of chips, a plurality of hierarchies and a plurality of cell regions of each of the plurality of hierarchies, an extraction unit configured to extract, with respect to a plurality of chips where the overlap occurs, a cell region where the overlap is located, from a higher hierarchy level to a lower hierarchy level in order, a figure overlap judging unit configured to judge an existence of an overlap between a figure in the cell region extracted and a figure in the other cell region extracted, and an output unit configured to output data on a plurality of figures overlapping.

Abstract: A figure data verification apparatus includes an operation part configured to input design data and writing data converted from the design data and perform an exclusive OR operation between data of a figure included in the design data and data of a figure included in the writing data, a sorting part configured to sort figures produced as a result of the exclusive OR operation to at least one arbitrary-angle figure having at least one angle not being an integral multiple of 45 degrees and to at least one non-arbitrary-angle figure all angles of which are integral multiples of 45 degrees, a first removal part configured to remove a figure of a size smaller than a first allowable error value from the arbitrary-angle figure, and a second removal part configured to remove a figure of a size smaller than a second allowable error value from the non-arbitrary-angle figure.

Abstract: A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.

Abstract: A reactor for moisture generation generates high-purity moisture at a catalytic reaction temperature that is lower than an ignition point of hydrogen gas and oxygen gas so hydrogen and oxygen gas are supplied into the reactor having a platinum catalyst layer to catalyze the reaction of the gases without combustion, wherein the reactor maintains high adhesion strength for a long time of the platinum catalyst layer to a barrier layer provided between the base material and the platinum catalyst layer. The reactor includes a reactor main body that has a gas inlet and a moisture outlet, and the Y2O3 barrier layer is formed on at least a part of an internal wall surface of the reactor main body, and the platinum catalyst layer is formed on at least a part of the Y2O3 barrier layer. A film thickness of the Y2O3 barrier layer is preferably 50 nm to 5 ?m.

Abstract: Disclosed is a method for measuring a profile using a device for measuring the profile in which included are: a distance measuring means 2 for measuring the distance to an edge region of a semiconductor wafer 12 in such a manner that light is emitted to be reflected at the edge region and to be detected; a first swing mechanism swingably supporting the distance measuring means 2; and a second swing mechanism swingably supporting the first swing mechanism, the method comprising the steps of: locating angles of the first swing mechanism each of which gives a maximum intensity of received light at each of predetermined angles of the second swing mechanism thereof; calculating contour points using coordinate transformation, thereby enabling points-related data to be acquired to represent a contour profile of the edge region. Thus, the method can be used for edge profile measurement of large-diameter wafers.

Abstract: A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.

Abstract: A charged-particle beam writing apparatus includes first and second storage devices, a transfer processor for sequentially sending to the first storage several design data files per pattern layout-defined region, a first data processor which sequentially reads design data files from the first storage and converts each data file's design data into draw data for storage in the second storage while being pipelined with the transfer processing, second to n-th data processors which sequentially read data files from the second storage and apply mutually different ones of second to n-th data processings to each draw data in a way that the first to n-th data processings are pipelined and store the processed draw data in the second storage, and a pattern-writing unit for writing a pattern on a workpiece by using a beam that is controlled based on each n-th data processing-completed data being stored in the second storage.

Abstract: An easy-to-tear laminate is provided which is satisfactory in tearability and heat-sealing strength and excellent in ease of opening and contents-protecting performance. The laminate comprises a base layer and a layer comprising 10-95% by weight specific ethylene-based terpolymer (A) and 5-90% by weight specific low-density polyethylene (B) produced by the high-pressure radical polymerization method.