Patents by Inventor Shinji Shiraki

Shinji Shiraki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230323105
    Abstract: Provided is a thermosetting resin composition capable of forming a resin layer having sufficiently low relative dielectric constant and dissipation factor, and high flexibility and toughness in a relatively short period of time, a cured material thereof, a prepreg, a laminate, a metal clad laminate, and a printed circuit board. This is accomplished by a thermosetting resin composition including a (A) polymerizable polyphenylene ether compound of General Formula (1), an (B) elastomer, and a (C) tetrafluoroethylene-based polymer particle, wherein a content of (C) is from 1 parts by mass to 30 parts by mass, with respect to 100 parts by mass of the composition.
    Type: Application
    Filed: December 27, 2021
    Publication date: October 12, 2023
    Inventor: Shinji Shiraki
  • Publication number: 20230089555
    Abstract: The present invention is to provide a light emitting material, for an organic EL device, exhibiting higher light emitting efficiency, and particularly, to provide a blue light emitting material, wherein the light emitting material comprises a compound of the following General Formula (1): X is an aryl group including a tertiary amine structure, and Y is a phenyl group having an alkyl or aryl substituent at one ortho position.
    Type: Application
    Filed: January 8, 2021
    Publication date: March 23, 2023
    Applicant: LG Chem, Ltd.
    Inventors: Yongwook Kim, Jaechol Lee, Hisayuki Kawamura, Shinji Shiraki, Tsukasa Owada, Ayato Arai, Hisahiro Sasabe, Junji Kido
  • Publication number: 20220195118
    Abstract: The present disclosure proposes an improved heat resistant base for electronic equipment having transparency, heat resistance and mechanical strength and also having superior optical properties and quality, and thereby capable of replacing a transparent glass base. The present disclosure is accomplished by the heat resistant base for electronic equipment including a polyimide-based resin and a hollow particle, wherein a plurality of the hollow particles are dispersed and present in the polyimide-based resin, and the hollow particle has an average particle diameter of greater than or equal to 10 nm and less than or equal to 300 nm.
    Type: Application
    Filed: March 30, 2020
    Publication date: June 23, 2022
    Applicant: LG CHEM, LTD.
    Inventors: Youngsun PARK, Shinji SHIRAKI
  • Patent number: 10784049
    Abstract: The purpose of the present invention is to provide a winding-type stacked body for a condenser capable of realizing a high electrostatic capacitance and a high degree of withstand voltage. The purpose is accomplished by a winding-type stacked body for a condenser, comprising a metal layer and a dielectric layer, wherein the dielectric layer exists on the metal layer, two metal layers having the dielectric layers constitute a pair and are stacked and wound to configure the winding-type stacked body, which comprises no plastic film.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: September 22, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Shinji Shiraki, Sang-Hyun Park
  • Publication number: 20170178816
    Abstract: The purpose of the present invention is to provide a winding-type stacked body for a condenser capable of realizing a high electrostatic capacitance and a high degree of withstand voltage. The purpose is accomplished by a winding-type stacked body for a condenser, comprising a metal layer and a dielectric layer, wherein the dielectric layer exists on the metal layer, two metal layers having the dielectric layers constitute a pair and are stacked and wound to configure the winding-type stacked body, which comprises no plastic film.
    Type: Application
    Filed: February 3, 2015
    Publication date: June 22, 2017
    Inventors: Shinji SHIRAKI, Sang-Hyun PARK
  • Patent number: 7378224
    Abstract: There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.
    Type: Grant
    Filed: July 13, 2004
    Date of Patent: May 27, 2008
    Assignee: JSR Corporation
    Inventors: Masaaki Hanamura, Shinji Shiraki, Atsushi Kumano
  • Patent number: 6984476
    Abstract: The invention provides a radiation-sensitive resin composition, by which a patterned insulation film whose water repellency varies is easily formed with high precision, a process for forming a patterned insulation film using this composition, a display element and an flat-panel disply device using the composition, and a process for producing the flat-panel disply device. The resin composition comprises (A) an alkali-soluble copolymer, (B) a 1,2-quinonediazide compound and (C) a water-repellent siloxane resin in particular proportions. In the production process of the patterned insulation film, patterning exposure and development are conducted on a coating formed of the resin composition. The display element and flat-panel disply device are equipped with an interlayer insulation film formed by the resin composition.
    Type: Grant
    Filed: April 10, 2003
    Date of Patent: January 10, 2006
    Assignees: Sharp Kabushiki Kaisha, JSR Corporation
    Inventors: Kazuki Kobayashi, Ikuo Sakono, Shinji Shiraki, Hirofumi Sasaki, Kazuaki Niwa
  • Publication number: 20050244674
    Abstract: The invention provides a phosphorescent polymer that has excellent luminescent properties and capable of forming a film by a wet method, and an organic electroluminescence device that has excellent luminescent properties and durability, can achieve long service life and can be easily produced. The invention also provides a novel metal complex-containing compound used as a monomer for providing the phosphorescent polymer that has excellent luminescent properties and capable of forming a film by a wet method, and a production process thereof. The phosphorescent polymer has a metal complex-containing group having a phenylpyridine structure which is bonded to a main chain containing an aromatic compound group. The organic electroluminescence device has a luminescent layer formed by the phosphorescent polymer. The metal complex-containing compound has a metal complex-containing group having a phenylpyridine structure which is bonded to an aromatic compound having two reactive functional groups.
    Type: Application
    Filed: April 26, 2005
    Publication date: November 3, 2005
    Applicant: JSR Corporation
    Inventors: Hiroyuki Yasuda, Hyunshik Oh, Shinji Shiraki
  • Publication number: 20050238917
    Abstract: The invention provide a novel charge transporting polymer capable of easily forming a thin film as being excellent in solubility in solvents and useful as electronic materials and other resin materials, a process for producing a novel charge transporting polymer excellent in solubility in solvents, capable of easily forming a thin film and useful as electronic materials and other resin materials, a polymer composition for organic electroluminescence device, by which an organic electroluminescence device excellent in luminescent properties and durability is provided, and an organic electroluminescence device. The charge transporting polymer has a specific repeating unit. The production process of the charge transporting polymer is that reacting the specific compound and the specific N-(4-aminophenyl) carbazole compound.
    Type: Application
    Filed: April 15, 2005
    Publication date: October 27, 2005
    Applicant: JSR CORPORATION
    Inventors: Hiroyuki Yasuda, Hyunshik Oh, Shinji Shiraki
  • Publication number: 20050214574
    Abstract: Disclosed is a polymer comprising a repeating unit represented by the following structural formula (1): wherein R1, R2 and R3 are each a monovalent organic group, l is an integer of 0 to 4, m is an integer of 0 to 4, and n is an integer of 0 to 4. A composition comprising the polymer and a triplet luminescent metal complex compound, and an organic EL device having a luminescent layer formed from the composition are also disclosed. The polymer is capable of forming an organic EL layer having high luminance by a wet process. The organic EL device has a luminescent layer having high luminance.
    Type: Application
    Filed: March 25, 2005
    Publication date: September 29, 2005
    Applicant: JSR Corporation
    Inventors: Hiroyuki Yasuda, Hyun-Shik Oh, Shinji Shiraki
  • Patent number: 6852476
    Abstract: A radiation sensitive resin composition for forming a rib comprising (A) a copolymer of (a-1) hexafluoropropylene, (a-2) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a-3) an unsaturated compound other than the components (a-1) and (a-2), (B) an acid generating compound which generates an acid upon exposure to radiation, (C) a crosslinkable compound and (D) a fluorine-containing organic compound other than the component (A). A rib formed from the composition, a rib forming method, and an organic EL display element and liquid crystal display element having the rib. The rib does not cause a “satellite” phenomenon when an organic EL layer or ITO transparent electrodes are formed by coating, and an organic EL display element and liquid crystal display element having the rib of the present invention are excellent in productivity and reliability.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: February 8, 2005
    Assignee: JSR Corporation
    Inventors: Shinji Shiraki, Masayoshi Suzuki, Hirofumi Sasaki, Kazuaki Niwa
  • Publication number: 20050014100
    Abstract: There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.
    Type: Application
    Filed: July 13, 2004
    Publication date: January 20, 2005
    Applicant: JSR Corporation
    Inventors: Masaaki Hanamura, Shinji Shiraki, Atsushi Kumano
  • Publication number: 20040202892
    Abstract: Disclosed herein are a polymer for forming an organic electroluminescence device and a polymer composition for organic electroluminescence devices, by which a thin film can be formed with ease by the wet method, and an organic electroluminescence device that can achieve light emission high in luminous luminance and stable even during continuous driving can be provided, and the organic electroluminescence device.
    Type: Application
    Filed: March 30, 2004
    Publication date: October 14, 2004
    Applicant: JSR Corporation
    Inventors: Hiroyuki Yasuda, Shinji Shiraki, Michinori Nishikawa, Tou Ryou, Yutaka Makita
  • Patent number: 6797453
    Abstract: There is disclosed a radiation sensitive composition containing a silane compound represented by the following formula (1): (R1)pSi(X)4-p  (1) wherein R1 is an unhydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3, a hydrolyzate thereof and a condensate of the hydrolyzate; and a compound which generates an acid or base upon exposure to radiation. The composition is used to form an insulating film for an organic EL display device, and an interlayer insulating film for a liquid crystal display device.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: September 28, 2004
    Assignee: JSR Corporation
    Inventors: Shinji Shiraki, Masayoshi Suzuki, Hirofumi Sasaki, Kazuaki Niwa, Michinori Nishikawa
  • Publication number: 20030215737
    Abstract: There is disclosed a radiation sensitive composition containing a silane compound represented by the following formula (1):
    Type: Application
    Filed: January 23, 2003
    Publication date: November 20, 2003
    Applicant: JSR CORPORATION
    Inventors: Shinji Shiraki, Masayoshi Suzuki, Hirofumi Sasaki, Kazuaki Niwa, Michinori Nishikawa
  • Publication number: 20030193624
    Abstract: The invention provides a radiation-sensitive resin composition, by which a patterned insulation film whose water repellency varies is easily formed with high precision, a process for forming a patterned insulation film using this composition, a display element and an flat-panel disply device using the composition, and a process for producing the flat-panel disply device.
    Type: Application
    Filed: April 10, 2003
    Publication date: October 16, 2003
    Applicants: SHARP KABUSHIKI KAISHA, JSR CORPORATION
    Inventors: Kazuki Kobayashi, Ikuo Sakono, Shinji Shiraki, Hirofumi Sasaki, Kazuaki Niwa
  • Publication number: 20030068574
    Abstract: A radiation sensitive resin composition for forming a rib comprising (A) a copolymer of (a-1) hexafluoropropylene, (a-2) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a-3) an unsaturated compound other than the components (a-1) and (a-2), (B) an acid generating compound which generates an acid upon exposure to radiation, (C) a crosslinkable compound and (D) a fluorine-containing organic compound other than the component (A). A rib formed from the composition, a rib forming method, and an organic EL display element and liquid crystal display element having the rib.
    Type: Application
    Filed: September 6, 2002
    Publication date: April 10, 2003
    Applicant: JSR CORPORATION
    Inventors: Shinji Shiraki, Masayoshi Suzuki, Hirofumi Sasaki, Kazuaki Niwa
  • Patent number: 5609988
    Abstract: A radiation sensitive resin composition useful as a negative type resist which can form a resist pattern having a good shape, has so high acid resistance as not to be affected by an etchant and a high adhesion to the substrate, and is endowed with so high a strippability as to be easily dissolved in a stripping solution consisting of an organoalkali. Said composition comprises (1) 100 parts by weight of an alkali-soluble novolak resin having a polystyrene reduced weight average molecular weight of 1,000 to 10,000, (2) 1 to 10 parts by weight of a compound having a methylol group and/or an alkoxymethyl group and being capable of cross-linking the alkali-soluble novolak resin (1) in the presence of an acid, and (3) 0.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: March 11, 1997
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Hidetoshi Miyamoto, Shinji Shiraki, Yoshiji Yumoto, Takao Miura
  • Patent number: 5494777
    Abstract: A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: February 27, 1996
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Shinji Shiraki, Hidetoshi Miyamoto, Masaaki Inoue, Toshiyuki Ota, Yoshiji Yumoto, Takao Miura