Patents by Inventor Shinobu Nakashima

Shinobu Nakashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5852108
    Abstract: A composite particulate material for resin reinforcement which comprises an inorganic particulate material (A) and an elastic polymer (B) having a glass transition temperature of -10.degree. C. or below and also having functional groups capable of forming chemical bonds with resins to be reinforced, said components (A) and (B) accounting for 50-99 wt % and 50-1 wt %, respectively, of their total amount. A process for producing said composite particulate material. A reinforced resin composition incorporated with said composite particulate material. The resin composition yields molded articles which are improved in mutually contradicting properties (that is, impact strength vs. stiffness and elongation at break vs. heat resistance) and which have mechanical properties with less anisotropy. It offers good characteristic properties which are hardly attained by conventional engineering plastic materials.
    Type: Grant
    Filed: February 7, 1996
    Date of Patent: December 22, 1998
    Assignee: Toray Industries, Inc.
    Inventors: Toru Yamanaka, Mitsunari Sotokawa, Shinobu Nakashima
  • Patent number: 4464456
    Abstract: A photosensitive polymer composition containing 0.01% to 10% by weight of a photosensitizer and, the following components A and B, is presented.A. 100 parts by weight of polyether-ester amide comprising (a) at least one compound selected from the group consisting of aminocarboxylic acids having 6 to 15 carbon atoms, lactams having 6 to 15 carbon atoms and nylon mn salts wherein 10.ltoreq.m+n.ltoreq.30, (b) at least one poly(alkylene oxide) glycol having a number average molecular weight of 200 to 6000, and (c) at least one dicarboxylic acid having 4 to 20 carbon atoms; andB. 10 to 200 parts by weight of at least one photopolymerizable vinyl monomer having a terminal ethylenically unsaturated bond and having a boiling point of at least 150.degree. C.This photosensitive polymer composition is extremely effective for use in a photosensitive flexographic printing plate developable in water or in alcohol.
    Type: Grant
    Filed: January 3, 1983
    Date of Patent: August 7, 1984
    Assignee: Toray Industries, Inc.
    Inventors: Junichi Fujikawa, Hiroshi Mataki, Chiaki Tanaka, Shinobu Nakashima
  • Patent number: 4438240
    Abstract: Provided is a polyether-ester-amide consisting essentially of about 5 to 50 weight percent of polaymide segment (A) and about 95 to 50 weight percent of polyether ester segment (B), and having a melting point not lower than 160.degree. C., a Shore hardness in the range of 80A to 45D, a tensile modulus in the range of 100 to 1,000 kg/cm.sup.2 and an elastic recovery at 50% elongation of not less than 70%,said polyamide segment (A) having been obtained from:a C.sub.6 -C.sub.20 aliphatic diamine (A-1); andat least one dicarboxylic acid (A-2) selected from the group consisting of C.sub.6 -C.sub.15 aliphatic dicarboxylic acids, terephthalic acid and hexahydroterephthalic acid, provided the total number of carbon atoms of said diamine and said dicarboxylic acid is not less than 16,said polyether ester segment (B) having been obtained from:a poly(alkylene oxide) glycol (B-1) having a ratio of carbon atom number to oxygen atom number of not smaller than 2.
    Type: Grant
    Filed: May 25, 1983
    Date of Patent: March 20, 1984
    Assignee: Toray Industries, Incorporated
    Inventors: Chiaki Tanaka, Shinobu Nakashima, Makoto Kondow
  • Patent number: 4376856
    Abstract: An improved polyether-ester amide is prepared by mixing (A) an aminocarboxylic acid, (B) a poly(alkylene oxide)glycol having a number-average molecular weight of 300 to 6,000 and (C) a dicarboxylic acid at such a mixing ratio that the amount of the component (B) is 5 to 90% by weight based on the total amount and the amino, carboxyl and hydroxyl groups in the mixture satisfy the following requirement:0.95.ltoreq.[COOH]/([NH.sub.2 ]+[OH]).ltoreq.1.05heating the mixture at 150.degree. to 260.degree. C. and then polymerizing the mixture at 220.degree. to 300.degree. C. under high vacuum. This polyether-ester amide is excellent in the impact resistance and rubbery elasticity.
    Type: Grant
    Filed: November 16, 1981
    Date of Patent: March 15, 1983
    Assignee: Toray Industries, Inc.
    Inventors: Chiaki Tanaka, Shinobu Nakashima
  • Patent number: 4376194
    Abstract: A polyester amide having excellent mechanical strength, transparency, resistance to oil, adhesive property and heat-sensitivity, comprises (A) an ester unit derived mainly from a benzenedicarboxylic acid and 1,4-butanediol and (B) an amide unit consisting of dodecaneamide and/or undecaneamide, the weight ratio of the ester unit to the amide unit being from 5:95 to 95:5.
    Type: Grant
    Filed: August 17, 1981
    Date of Patent: March 8, 1983
    Assignee: Toray Industries, Inc.
    Inventors: Chiaki Tanaka, Shinobu Nakashima, Nagayoshi Naito