Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide is B2O3 and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has B2O3, and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WO3 and wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

Abstract: A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.

Abstract: A magnetic recording medium includes a substrate, a barrier layer, a crystal grain size control layer, and a magnetic layer that are arranged in this order. The barrier layer includes at least one of oxides, nitrides, and carbides, and the crystal grain size control layer is a crystalline layer including Ag and having an average thickness in a range of 0.1 nm to 1 nm. The barrier layer makes contact with the crystal grain size control layer, and the magnetic layer includes an alloy having a L10 crystal structure and a (001) face orientation.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has B2O3 and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: A magnetic recording medium includes a substrate, a barrier layer, a crystal grain size control layer, and a magnetic layer that are arranged in this order. The barrier layer includes at least one of oxides, nitrides, and carbides, and the crystal grain size control layer is a crystalline layer including Ag and having an average thickness in a range of 0.1 nm to 1 nm. The barrier layer makes contact with the crystal grain size control layer, and the magnetic layer includes an alloy having a L10 crystal structure and a (001) face orientation.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WO3 and wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

Abstract: A magnetic recording medium is disclosed in which, on a non-magnetic substrate 1, at least an orientation control layer that controls orientation of a layer immediately above and a vertical magnetic layer in which an easy axis of magnetization is mainly vertically oriented with respect to the non-magnetic substrate are laminated. The orientation control layer includes an Ru-containing layer containing Ru or Ru alloy, and a diffusion prevention layer provided on the Ru-containing layer on the side of the vertical magnetic layer, is made of a material having a melting point of 1500° C. or higher and 4215° C. or lower and formed by a covalent bond or an ionic bond, and prevents thermal diffusion of Ru atoms of the Ru-containing layer.