Patents by Inventor Shinya Houman

Shinya Houman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate holder, deposition method using substrate holder, hard disk manufacturing method, deposition apparatus, and program
    Patent number: 7927473
    Abstract: A substrate holder for supporting an insulating substrate includes a conductive substrate holder main body having an opening, a first support member formed to protrude inside the opening from the inner periphery of the opening, and including a clamping member which supports one end portion of the insulating substrate, and a second support member including a clamping member which supports the other end portion of the insulating substrate, and is movable so as to protrude inside the opening or retract from inside the opening.
    Type: Grant
    Filed: April 5, 2010
    Date of Patent: April 19, 2011
    Assignee: Canon Anelva Corporation
    Inventors: Shinya Houman, Hiroshi Torii
  • SUBSTRATE HOLDER, DEPOSITION METHOD USING SUBSTRATE HOLDER, HARD DISK MANUFACTURING METHOD, DEPOSITION APPARATUS, AND PROGRAM
    Publication number: 20100189912
    Abstract: A substrate holder for supporting an insulating substrate includes a conductive substrate holder main body having an opening, a first support member formed to protrude inside the opening from the inner periphery of the opening, and including a clamping member which supports one end portion of the insulating substrate, and a second support member including a clamping member which supports the other end portion of the insulating substrate, and is movable so as to protrude inside the opening or retract from inside the opening.
    Type: Application
    Filed: April 5, 2010
    Publication date: July 29, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Shinya Houman, Hiroshi Torii
  • CARRIER WITH DEPOSITION SHIELD
    Publication number: 20090308317
    Abstract: The peeling-off of a deposited film caused by a carrier is restrained, and the exchange period of the carrier is prolonged. In a carrier 1 including a slider 7 having a mechanism for conveying a substrate holder 3 that supports a substrate 2, a deposition shield 20a, 20b that can cover the substrate holder 3 and has an opening equivalent to or larger than the substrate 2 on which a film is formed is installed on both surfaces of the substrate holder 3. At this time, the substrate holder 3, supporting claws 4, and fixing parts 6 are arranged so as to be hidden by the deposition shield 20. In a film forming chamber, to form a predetermined film on the substrate 2, the carrier 1 covered by the deposition shield 20 is exposed to a plasma space in the film forming chamber, and the film is formed. The deposition of film onto the substrate holder 3, the supporting claws 4, and the fixing parts 6 that are covered by the deposition shield 20 can be restrained.
    Type: Application
    Filed: May 20, 2009
    Publication date: December 17, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hiroshi Sone, Shinya Houman, Naoyuki Nozawa, Yoshiro Hasegawa