Patents by Inventor Shinya Umemoto

Shinya Umemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor oxidation apparatus and method of producing semiconductor element
    Patent number: 7981700
    Abstract: A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.
    Type: Grant
    Filed: February 13, 2006
    Date of Patent: July 19, 2011
    Assignee: Ricoh Company, Ltd.
    Inventors: Shunichi Sato, Naoto Jikutani, Akihiro Itoh, Shinya Umemoto, Yoshiaki Zenno, Takatoshi Yamamoto
  • Molecular Beam Cell Having Purge Function
    Publication number: 20100218723
    Abstract: A molecular beam cell includes a crucible (2) for containing a material (29), a coil heater (3) for heating the material (29), and a side reflector (5) for reflecting the heat from the coil heater (3). The molecular beam cell further includes a base (7) supporting the crucible (2), the coil heater (3) and the side reflector (5). The base (7) is held by a disc-shaped flange (9) via a plurality of posts (20). A purge gas introduction pipe (44) for supplying purge gas (48) into the crucible (2) is provided, whereby ambient gas (36) is prevented from coming into contact with the material (29).
    Type: Application
    Filed: January 29, 2007
    Publication date: September 2, 2010
    Applicant: ROHM CO., LTD
    Inventors: Takatoshi Yamamoto, Shinya Umemoto, Tetsuhiro Tanabe, Yoshio Nishimoto
  • Semiconductor Oxidation Apparatus and Method of Producing Semiconductor Element
    Publication number: 20080233017
    Abstract: A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.
    Type: Application
    Filed: February 13, 2006
    Publication date: September 25, 2008
    Inventors: Shunichi Sato, Naoto Jikutani, Akihiro Itoh, Shinya Umemoto, Yoshiaki Zenno, Takatoshi Yamamoto