Patents by Inventor Shinzou Nomura

Shinzou Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Having a protective film of a polymer having a fluorine-containing aliphatic cyclic structure
    Patent number: 5117272
    Abstract: A semiconductor integrated circuit device having a protective film made of a polymer having a fluorine-containing aliphatic cyclic structure.
    Type: Grant
    Filed: April 16, 1990
    Date of Patent: May 26, 1992
    Assignees: Asahi Glass Company Ltd., NMB Semiconductor Co., Ltd.
    Inventors: Shinzou Nomura, Hiroshi Katsushima, Toru Kawasaki, Masao Unoki, Masaru Nakamura