Patents by Inventor Shoei Tsuji
Shoei Tsuji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8262435Abstract: A chemical mechanical polishing aqueous dispersion includes: (A) an amino acid, (B) abrasive grains, (C) a surfactant, (D) an oxidizing agent, and (E) ammonia, the ratio (WA/WD) of the content (WA) of the amino acid to the content (WD) of the oxidizing agent being 1.5 to 6.0, and the ratio (WE/WD) of the content (WE) of the ammonia to the content (WD) of the oxidizing agent being 0.05 to 0.6.Type: GrantFiled: May 18, 2009Date of Patent: September 11, 2012Assignee: JSR CorporationInventors: Eiichirou Kunitani, Atsushi Baba, Masayuki Motonari, Shoei Tsuji
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Patent number: 8053521Abstract: The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the polishing pad is 100 parts by mass, polymer matrix (A) includes 1,2-polybutadiene in an amount of at least 60 parts by weight, relative to 100 parts by mass of the polishing pad, component (B) includes the copolymer having a polyether block in an amount of at most 40 parts by weight relative to 100 parts by mass of the polishing pad, and the polishing pads have a surface resistivity of 2.6×107 to 9.9×1013?.Type: GrantFiled: January 30, 2007Date of Patent: November 8, 2011Assignee: JSR CorporationInventors: Takahiro Okamoto, Rikimaru Kuwabara, Keisuke Kuriyama, Shoei Tsuji
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Publication number: 20090291620Abstract: A chemical mechanical polishing aqueous dispersion includes: (A) an amino acid, (B) abrasive grains, (C) a surfactant, (D) an oxidizing agent, and (E) ammonia, the ratio (WA/WD) of the content (WA) of the amino acid to the content (WD) of the oxidizing agent being 1.5 to 6.0, and the ratio (WE/WD) of the content (WE) of the ammonia to the content (WD) of the oxidizing agent being 0.05 to 0.6.Type: ApplicationFiled: May 18, 2009Publication date: November 26, 2009Applicant: JSR CORPORATIONInventors: Eiichirou KUNITANI, Atsushi BABA, Masayuki MOTONARI, Shoei TSUJI
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Publication number: 20090053983Abstract: There is provided a chemical mechanical polishing pad which has a circular polishing surface and a non-polishing surface that is the back side of the polishing surface and incorporates an information recording medium that is readable or readable/writable by an electromagnetic wave in a noncontact manner and in which the position of the center of gravity of the information recording medium in the radial direction of the polishing surface is preferably within a range of 0 to 10% or 80 to 100% of the radius of the polishing surface in the direction from the center on the radius of the polishing surface toward the periphery of the polishing surface.Type: ApplicationFiled: January 22, 2007Publication date: February 26, 2009Applicant: JSR CORPORATIONInventors: Yukio Hosaka, Shoei Tsuji
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Publication number: 20090036045Abstract: A chemical mechanical polishing pad which provides a high removal rate, can suppress the production of a scratch on the polished surface completely and can achieve high in-plane uniformity in the amount of polishing of the polished surface. The chemical mechanical polishing pad has a surface resistivity of its polishing layer of 1.0×107 to 9.9×1013?. The polishing layer is made of a composition containing (A) a polymer matrix component having a volume resistivity of 1.0×1013 to 9.9×1017 ?·cm and (B) a component having a volume resistivity of 1.0×106 to 9.9×1012 ?·cm.Type: ApplicationFiled: January 30, 2007Publication date: February 5, 2009Applicant: JSR CORPORATIONInventors: Takahiro Okamoto, Rikimaru Kuwabara, Keisuke Kuriyama, Shoei Tsuji
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Patent number: 7357703Abstract: A chemical mechanical polishing pad of the present invention has the following two groups of grooves on the polishing surface: (i) a group of first grooves intersect a single virtual straight line extending from the center toward the periphery of the polishing surface and have a land ratio represented by the following equation of 6 to 30: Land ratio=(P?W)÷W (where P is the distance between adjacent intersections between the virtual straight line and the first grooves, and W is the width of the first grooves); and (ii) a group of second grooves extend from the center portion toward the peripheral portion of the polishing surface and consist of second grooves which are in contact with one another in the area of the center portion and second grooves which are not in contact with any other second grooves in the areas of the center portion.Type: GrantFiled: December 27, 2006Date of Patent: April 15, 2008Assignee: JSR CorporationInventors: Hideki Nishimura, Takafumi Shimizu, Keisuke Kuriyama, Shoei Tsuji
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Publication number: 20070149096Abstract: A chemical mechanical polishing pad of the present invention has the following two groups of grooves on the polishing surface: (i) a group of first grooves intersect a single virtual straight light extending from the center toward the periphery of the polishing surface and have a land ratio represented by the following equation of 6 to 30: Land ratio=(P?W)÷W (P is the distance between adjacent intersections between the virtual straight line and the first grooves, and W is the width of the first grooves); and (ii) a group of second grooves extend from the center portion toward the peripheral portion of the polishing surface and consist of second grooves which are in contact with one another in the area of the center portion and second grooves which are not in contact with any other second grooves in the area of the center portion.Type: ApplicationFiled: December 27, 2006Publication date: June 28, 2007Applicant: JSR CORPORATIONInventors: Hideki Nishimura, Takafumi Shimizu, Keisuke Kuriyama, Shoei Tsuji
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Patent number: 6803423Abstract: An (meth)acryloyl group-modified ethylene-&agr;-olefin copolymer (A) which has (meth)acryloyl group as a the side-chain thereof, wherein the intrinsic viscosity [&eegr;] was 0.01 to 10 dl/g measured in decalin at a temperature of 135° C.; and a rubber composition which comprises said (meth)acryloyl group-modified ethylene-&agr;-olefin copolymer, a vulcanizing agent, and/or a crosslinking agent; in addition, a liquid curable rubber composition which comprises, component (A), reactive diluent (D), and if necessary, photopolymerization initiator (E).Type: GrantFiled: June 17, 2002Date of Patent: October 12, 2004Assignee: JSR CorporationInventors: Toshiyuki Hayakawa, Toshihiro Nishimura, Motoharu Higuchi, Minoru Tanaka, Shoei Tsuji
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Patent number: 6670426Abstract: An olefin thermoplastic elastomer containing an olefin random copolymer formed by copolymerizing ethylene, an &agr;-olefin having 3 to 10 carbon atoms and an unsaturated monomer having a functional group, and optionally a non-conjugated diene, and metal ions crosslinking the olefin random copolymer, has the same or similar rubber elasticity, flexibility and molding and processability as the conventional olefin thermoplastic elastomers, and has good mechanical properties, wear resistance, in particular scratch resistance.Type: GrantFiled: February 10, 2003Date of Patent: December 30, 2003Assignee: JSR CorporationInventors: Kentarou Kanae, Akihiko Morikawa, Hideo Nakanishi, Shoei Tsuji
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Publication number: 20030158347Abstract: Disclosed herein are an olefin thermoplastic elastomer having the same or similar rubber elasticity, flexibility and molding and processability as those of the conventional olefin thermoplastic elastomers, and are good in mechanical properties and wear resistance and excellent in scratch resistance in particular and a production process thereof, a composition containing the olefin thermoplastic elastomer and a production process thereof, and molded products thereof.Type: ApplicationFiled: February 10, 2003Publication date: August 21, 2003Inventors: Kentarou Kanae, Akihiko Morikawa, Hideo Nakanishi, Shoei Tsuji
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Patent number: 6534586Abstract: The invention provides a flame-retardant rubber composition which may form a vulcanizate of an elastomer whose deterioration of mechanical strength is little to enjoy excellent mechanical properties, even when a nonhalogenated flame retardant is contained in a high proportion in the composition, and a flame-retardant elastomer obtained therefrom. The flame-retardant rubber composition contains (A) an olefin copolymer having a functional group, which comprises (a-1) a structural unit derived from ethylene, (a-2) a structural unit derived from an &agr;-olefin compound having 3 to 10 carbon atoms, (a-3) a structural unit derived from a functional group-containing unsaturated compound, and optionally (a-4) a structural unit derived from a nonconjugated diene compound, and has an intrinsic viscosity [&eegr;] of 0.1 to 10 dL/g as measured in decalin at 135° C., (B) a vulcanizing agent and/or a crosslinking agent and (C) a nonhalogenated flame retardant.Type: GrantFiled: September 10, 2001Date of Patent: March 18, 2003Assignee: JSR CorporationInventors: Shoei Tsuji, Junji Ayukawa, Toshiyuki Hayakawa, Minoru Tanaka, Fumio Tsutsumi
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Publication number: 20020058746Abstract: The invention provides a flame-retardant rubber composition which may form a vulcanizate of an elastomer whose deterioration of mechanical strength is little to enjoy excellent mechanical properties, even when a nonhalogenated flame retardant is contained in a high proportion in the composition, and a flame-retardant elastomer obtained therefrom.Type: ApplicationFiled: September 10, 2001Publication date: May 16, 2002Applicant: JSR CorporationInventors: Shoei Tsuji, Junji Ayukawa, Toshiyuki Hayakawa, Minoru Tanaka, Fumio Tsutsumi
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Patent number: 5677382Abstract: An ethylene-.alpha.-olefin-non-conjugated diene copolymer rubber composition comprising a low molecular weight component copolymer composed of an ethylene-.alpha.-olefin-non-conjugated diene copolymer having a Mooney viscosity (ML.sub.1+4, 100.degree. C.) of 10 to 150, an .alpha.-olefin content of 30 to 60% by weight and an iodine value of 37 to 65, and a high molecular weight component copolymer composed of an ethylene-.alpha.-olefin-non-conjugated diene copolymer having a Mooney viscosity (ML.sub.1+4, 100.degree. C.) of 100 to 500, an .alpha.-olefin content of 15 to 50% by weight and an iodine value of 3 to 15, the ratio of the iodine value of the low molecular weight component copolymer to the iodine value of the high molecular weight component copolymer being at least 4/1. The above composition can inhibit a gel from being produced during processing and achieve a high degree of cross-linking and is excellent in compression set, shape-retention and sponge surface skin.Type: GrantFiled: December 5, 1995Date of Patent: October 14, 1997Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Shoei Tsuji, Hidekatsu Gotoh, Akihiko Morikawa, Fumio Tsutsumi, Yoji Mori
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Patent number: 5646224Abstract: A rubber composition excellent in shape-retainability also in processibility, compression set and the like, which comprises a single ethylene-.alpha.-olefin-non-conjugated diene copolymer which has (1) a Mooney viscosity (ML.sub.1+4, 100.degree. C.) of 80 to 200, (2) a weight average molecular weight/number average molecular weight ratio of 6 or more as measured by a gel permeation chromatography (GPC), and (3) a stress-retention of 0.2 or more after 100 seconds at 80.degree. C. in a compression type stress-relaxation test.Type: GrantFiled: January 3, 1996Date of Patent: July 8, 1997Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Takashi Kawata, Shoei Tsuji, Yoji Mori