Patents by Inventor Shoh-Yue Lin

Shoh-Yue Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming a microstructure
    Patent number: 8703409
    Abstract: A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: April 22, 2014
    Assignee: Far Eastern New Century Corporation
    Inventors: Da-Ren Chiou, Wei-Che Hung, Shoh-Yue Lin, Chiu-Fang Chen, Tzu-Ying Chen
  • METHOD FOR FORMING A MICROSTRUCTURE
    Publication number: 20120114903
    Abstract: A method for forming a microstructure includes: (a) forming a photocurable layer on a substrate, the photocurable layer including at least one photocurable compound that has a photocurable functional group equivalent weight ranging from 70 to 700 g/mol; (b) covering partially the photocurable layer using a patterned mask; (c) exposing the photocurable layer through the patterned mask using a first light source so that the photocurable layer is cured at first regions which are exposed; (d) removing the patterned mask; and (e) illuminating the photocurable layer using a second light source to cure second regions of the photocurable layer which have not been cured. The first and second regions have different surface heights and provide a surface roughness for the microstructure.
    Type: Application
    Filed: September 13, 2011
    Publication date: May 10, 2012
    Applicant: FAR EASTERN NEW CENTURY CORPORATION
    Inventors: Da-Ren Chiou, Wei-Che Hung, Shoh-Yue Lin, Chiu-Fang Chen, Tzu-Ying Chen