Patents by Inventor Shohei Koizumi

Shohei Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240164012
    Abstract: Provided is a method of manufacturing a metal wiring on a substrate, including the steps of: forming a first layer containing a first material in at least part on the substrate; forming a crack in the first layer to form the first layer having the crack; and forming a second layer containing a second material in the first layer having the crack.
    Type: Application
    Filed: January 25, 2024
    Publication date: May 16, 2024
    Applicant: NIKON CORPORATION
    Inventors: Shohei KOIZUMI, Yoshiaki KITO, Seiji KAWABATA, Tohru KIUCHI
  • Patent number: 11964839
    Abstract: A conveyance route switching mechanism and a paper sheet handling apparatus that includes the conveyance route switching mechanism include a driving source, a gate, a first gear, and an internal gear. The driving source includes a driving shaft. The gate includes a gate shaft, and a blade that is provided on the gate shaft, and switches conveyance routes of paper sheets. The first gear is provided on the gate shaft. The internal gear meshes with the first gear. According to rotation of the driving shaft, the gate shaft rotates on an axis of the gate shaft, and revolves with the driving shaft as a rotation center while the first gear meshes with the internal gear.
    Type: Grant
    Filed: September 8, 2022
    Date of Patent: April 23, 2024
    Assignee: FUJITSU FRONTECH LIMITED
    Inventors: Takashi Wada, Tomoyuki Tamahashi, Satoshi Hayashi, Atsushi Ando, Shohei Koizumi, Shoichi Deguchi, Akira Yamada
  • Publication number: 20230368598
    Abstract: A paper sheet handling apparatus includes: a partition portion that forms an insertion space into which a paper sheet is inserted from an insertion port with a first opposing portion, and forms a taking-out space from which the paper sheet is taken out from the insertion port with a second opposing portion; and a conveyor that conveys the paper sheet left in the taking-out space in a state of protruding toward the taking-out space from a first opening portion of the first opposing portion and a second opening portion of the partition portion. The partition portion includes a second shutter that openably closes the second opening portion, and a second shutter opening/closing unit that opens the second opening portion by opening the second shutter in conjunction with an operation in which the partition portion moves to the remaining banknote conveyance position.
    Type: Application
    Filed: July 24, 2023
    Publication date: November 16, 2023
    Inventors: Akira YAMADA, Tomoyuki TAMAHASHI, Takashi WADA, Atsushi ANDO, Shohei KOIZUMI, Satoshi HAYASHI, Yasuhiro MOTOHASHI
  • Publication number: 20230002182
    Abstract: A conveyance route switching mechanism and a paper sheet handling apparatus that includes the conveyance route switching mechanism include a driving source, a gate, a first gear, and an internal gear. The driving source includes a driving shaft. The gate includes a gate shaft, and a blade that is provided on the gate shaft, and switches conveyance routes of paper sheets. The first gear is provided on the gate shaft. The internal gear meshes with the first gear. According to rotation of the driving shaft, the gate shaft rotates on an axis of the gate shaft, and revolves with the driving shaft as a rotation center while the first gear meshes with the internal gear.
    Type: Application
    Filed: September 8, 2022
    Publication date: January 5, 2023
    Inventors: Takashi WADA, Tomoyuki TAMAHASHI, Satoshi HAYASHI, Atsushi ANDO, Shohei KOIZUMI, Shoichi DEGUCHI, Akira YAMADA
  • Publication number: 20220392293
    Abstract: A paper sheet handling apparatus includes: a first facing section and a second facing section that are disposed to face each other across an insertion/take-out space; a partition section that is disposed between the first and second facing sections so as to be capable of moving in a facing direction in which the first and second facing sections face each other, forms, within the insertion/take-out space, an insertion space between the partition section and the first facing section, and forms, within the insertion/take-out space, a take-out space between the partition section and the second facing section. The partition section includes a movable member provided at a leading end portion of the partition section on an insertion/take-out port side and capable of moving toward each of the first facing section and the second facing section.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Akira YAMADA, Tomoyuki TAMAHASHI, Takashi WADA, Atsushi ANDO, Shohei KOIZUMI, Shoichi DEGUCHI, Satoshi HAYASHI
  • Publication number: 20220392291
    Abstract: A paper sheet handling apparatus includes: a first facing section and a second facing section which are arranged so as to face each other in a facing direction with an insertion space interposed therebetween; and a conveyance section that conveys a paper sheet. The first facing section includes a first shutter that openably closes a first opening portion, and is disposed so as to be movable, in the facing direction, to an insertion position at a time when the paper sheet is inserted and a conveyance position at a time when the paper sheet is conveyed. The first facing section and the conveyance section include first shutter opening/closing units which open the first opening portion by meshing with each other to open the first shutter when the first facing section moves from the insertion position to the conveyance position.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Shoichi DEGUCHI, Tomoyuki TAMAHASHI, Atsushi ANDO, Satoshi HAYASHI, Shohei KOIZUMI, Takashi WADA, Akira YAMADA
  • Publication number: 20220392292
    Abstract: A paper sheet handling apparatus includes a support member that is disposed so as to face a taking-out port in a taking-out space in which a paper sheet is taken out from the taking-out port, and supports a lower end of the paper sheet. The support member moves toward the taking-out port at a time when the paper sheet is taken out.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Atsushi ANDO, Tomoyuki TAMAHASHI, Satoshi HAYASHI, Shohei KOIZUMI, Shoichi DEGUCHI, Takashi WADA, Akira YAMADA
  • Patent number: 11522145
    Abstract: A method for manufacturing a transistor being a bottom-gate transistor is provided. The method for manufacturing a transistor includes a step of forming a first metal layer 32 on an insulator layer 20 provided on a substrate 10 including a gate electrode, a step of applying a resist onto the first metal layer 32, and patterning the first metal layer 32 by a photolithographic method, an oxide film removal step of removing an oxide film 26 formed on the patterned first metal layer 32, and a step of forming a source electrode and a drain electrode by forming a second metal layer 42 on the first metal layer 32.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: December 6, 2022
    Assignee: NIKON CORPORATION
    Inventor: Shohei Koizumi
  • Patent number: 11309503
    Abstract: A transistor manufacturing method includes forming a source electrode and a drain electrode on a substrate, forming a layer including an insulator layer to cover the source electrode and the drain electrode, and forming a gate electrode on the layer including the insulator layer, wherein the forming the gate electrode includes forming a plating base film, forming a protection layer of the plating base film, forming a photoresist layer on the protection layer to expose the photoresist layer with desired patterning light, causing the exposed photoresist layer to come into contact with a developer to remove the photoresist layer and the protection layer until the plating base film is uncovered corresponding to the patterning light, and after depositing a metal on the uncovered plating base film, causing an electroless plating solution to come into contact with the plating base film to perform electroless plating.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: April 19, 2022
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Yusuke Kawakami
  • Publication number: 20220082458
    Abstract: A flexible sensor includes a substrate having flexibility; and a sensor element provided on the substrate, wherein the sensor element includes a transistor having a gate electrode, a source electrode, and a drain electrode; and a variable resistance portion connected to either of the gate electrode, the source electrode, and the drain electrode, and the variable resistance portion has a resistance value changeable due to a strain, and wherein the variable resistance portion includes an extension portion extending in a direction.
    Type: Application
    Filed: November 23, 2021
    Publication date: March 17, 2022
    Applicant: NIKON CORPORATION
    Inventors: Shohei KOIZUMI, Yoshiaki KITO, Takachika SHIMOYAMA, Katsuhiro HATAYAMA, Kentaro YAMADA, Tohru KIUCHI, Yasuteru FUKAWA
  • Publication number: 20210226143
    Abstract: A method for manufacturing a transistor being a bottom-gate transistor is provided. The method for manufacturing a transistor includes a step of forming a first metal layer 32 on an insulator layer 20 provided on a substrate 10 including a gate electrode, a step of applying a resist onto the first metal layer 32, and patterning the first metal layer 32 by a photolithographic method, an oxide film removal step of removing an oxide film 26 formed on the patterned first metal layer 32, and a step of forming a source electrode and a drain electrode by forming a second metal layer 42 on the first metal layer 32.
    Type: Application
    Filed: February 5, 2021
    Publication date: July 22, 2021
    Applicant: NIKON CORPORATION
    Inventor: Shohei KOIZUMI
  • Patent number: 10550281
    Abstract: Provided is a compound which is excellent terms of stability and tight adhesion to substrates and on which wiring can be formed by electroless plating. The compound is a high-molecular-weight compound having a constituent unit represented by the following formula (1). [In formula (1), R1 represents a hydrogen atom or a methyl group, m is an integer of 2-20, and Q represents a photosensitive leaving group].
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: February 4, 2020
    Assignee: NIKON CORPORATION
    Inventors: Yusuke Kawakami, Shohei Koizumi, Takashi Sugizaki
  • Patent number: 10510460
    Abstract: A method of manufacturing a laminate, transistor, and method of manufacturing transistor using a composition that includes an organic compound having a hydroxy group; a first cross-linking agent that is at least one organic silicon compound selected from the group including an organic silicon compound including a siloxane bond in the molecule and having three or more cyclic ether groups in the molecule, a chain organic silicon compound including two or more siloxane bonds in the molecule and having two or more cyclic ether groups in the molecule, a cyclic organic silicon compound including D unit in the molecule and having four or more cyclic ether groups bonded to a silicon atom of the D unit in the molecule, and a cyclic organic silicon compound including a T unit in the molecule and having two or more cyclic ether groups in the molecule; and a photocationic polymerization initiator.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: December 17, 2019
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Kenji Miyamoto, Yusuke Kawakami
  • Patent number: 10476005
    Abstract: Laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor using a composition having the following (a) to (c): (a) a first organic compound represented by Formula (1) below (R represents a hydrogen atom or a glycidyl group.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: November 12, 2019
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Kenji Miyamoto, Yusuke Kawakami
  • Publication number: 20190229283
    Abstract: A transistor manufacturing method includes forming a source electrode and a drain electrode on a substrate, forming a layer including an insulator layer to cover the source electrode and the drain electrode, and forming a gate electrode on the layer including the insulator layer, wherein the forming the gate electrode includes forming a plating base film, forming a protection layer of the plating base film, forming a photoresist layer on the protection layer to expose the photoresist layer with desired patterning light, causing the exposed photoresist layer to come into contact with a developer to remove the photoresist layer and the protection layer until the plating base film is uncovered corresponding to the patterning light, and after depositing a metal on the uncovered plating base film, causing an electroless plating solution to come into contact with the plating base film to perform electroless plating.
    Type: Application
    Filed: April 4, 2019
    Publication date: July 25, 2019
    Applicant: NIKON CORPORATION
    Inventors: Shohei KOIZUMI, Takashi SUGIZAKI, Yusuke KAWAKAMI
  • Patent number: 10319911
    Abstract: A wiring pattern production method includes forming, on a substrate, a precursor film for a plating base film including a first formation material having an amino group protected by a photoreactive protecting group, forming a photoresist layer including a photoresist material on a surface of the precursor film, exposing the photoresist layer with a desired pattern of light, exposing the precursor film with a desired pattern of light to form the plating base film, developing the exposed photoresist layer, removing a deprotected protecting group, and depositing an electroless plating catalyst on the exposed surface of the plating base film.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: June 11, 2019
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Yusuke Kawakami
  • Patent number: 10297773
    Abstract: A wiring pattern manufacturing method includes: applying a liquid body including a first formation material on a substrate to form a base film; applying a liquid body including a second formation material on at least part of a surface of the base film to form a protection layer of the base film; forming a resist layer on a surface of the protection layer to expose the resist layer with desired patterning light; causing the exposed resist layer to come into contact with a developer to remove the resist layer and the protection layer until the base film is uncovered corresponding to the patterning light; and after depositing a catalyst on a surface of the uncovered base film, causing an electroless plating solution to come into contact with the surface of the base film to perform electroless plating.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: May 21, 2019
    Assignee: NIKON CORPORATION
    Inventors: Shohei Koizumi, Takashi Sugizaki, Yusuke Kawakami
  • Patent number: 10214375
    Abstract: A banknote storage device includes a housing member having a loading region in which a banknote is loaded; a storage which is disposed to be adjacent to the housing member and in which the banknote is stored; a temporary accumulation region provided between the loading region and the storage so as to temporarily accumulate the banknote to be stored in the storage; and a push-in mechanism that pushes the banknote loaded to the loading region, into the temporary accumulation region and that pushes a plurality of the banknotes accumulated in the temporary accumulation region, into the storage.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: February 26, 2019
    Assignee: FUJITSU FRONTECH LIMITED
    Inventors: Hiroshi Yanagida, Shohei Koizumi, Ryo Fujiwara, Tomoyuki Tamahashi
  • Publication number: 20180351105
    Abstract: Laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor using a composition having the following (a) to (c): (a) a first organic compound represented by Formula (1) below (R represents a hydrogen atom or a glycidyl group.
    Type: Application
    Filed: August 14, 2018
    Publication date: December 6, 2018
    Applicant: NIKON CORPORATION
    Inventors: Shohei KOIZUMI, Takashi Sugizaki, Kenji Miyamoto, Yusuke Kawakami
  • Patent number: D1010553
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: January 9, 2024
    Assignee: Toyo Tire Corporation
    Inventors: Shohei Koizumi, Seiya Ishihara