Abstract: A very high reflection prevention effect can be produced for a variety of kinds of substrates, including those having transparent films and those having high reflectivity like metallic films, without posing any problem, such as aspect ratios, during the process of forming anti-reflective films This method can form fine and precise resist patterns and therefore improve the yield and reliability of devices to be manufactured. When applied to logic LSIs, this invention enables them to be manufactured at high dimensional precision and increases their operation speeds. While we have shown and described several embodiments in accordance with the present invention, it is understood that the same is not limited thereto, but is susceptible to numerous changes and modifications as is known in the art; and we therefore do not wish to be limited to the details shown and described herein, but intend to cover all such modifications as are encompassed by the scope of the appended claims.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.

Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method.

Abstract: A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film.

Abstract: A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.

Abstract: An optical contact of a patternwise powdery coating layer is improved by permeating a substantially transparent inorganic material having a refractive index of 1.2 to 2.0 into a paternwise powdery coating layer formed on a substrate, thereby forming a mixture layer of the transparent inorganic material and the powdery coating layer between the patternwise powdery coating layer and the substrate.

Abstract: A light-transmitting layer is formed on a transparent glass panel, the light-transmitting layer having a larger refractive index than that of the glass panel, and a light-absorbing layer having a light-transmitting region is formed on the light-transmitting layer. The light reflected from the interface of the glass panel and the light-absorbing layer is effectively attenuated by the light-transmitting layer, so that it is possible to obtain an excellent image having a considerably strong contrast.

Abstract: A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas: ##STR1## wherein A stands for a substituent selected from among ##STR2## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition.This composition gets sticky upon exposure to light.

Abstract: A photosensitive composition turning shicky by light exposure, which comprises a salt or p-aminobenzenediazonium compound and at least one of salts of o- and m-aminobenzenediazonium compounds, has a distinguished effect in forming a phosphor screen of a color picture tube.

Abstract: A photosensitive composition becoming sticky upon exposure to light which comprises (a) a salt of a diazonium compound represented by the formula ##STR1## wherein R.sub.1 and R.sub.2 are independently --H, --CH.sub.3, --OCH.sub.3 or ##STR2## but R.sub.1 and R.sub.2 cannot be ##STR3## at the same time; and R.sub.3 and R.sub.4 are independently a straight-chain lower alkyl group, and (b) a salt of an aromatic diazonium compound having no --OH group directly bonding to a benzene ring, has an improved sensitivity because it contains the salt of the compound represented by the above formula. By using said photosensitive composition, there is provided a process for forming a pattern of powder coated layer excellent in light sensitivity.

Abstract: A photosensitive composition improved in sensitivity by adding a salt of a compound represented by the general formula: ##STR1## (wherein R.sub.1 and R.sub.2 each represents a straight chain alkyl group, and X, Y and Z each represents H, a straight chain alkyl group or an alkoxy group, but two or more of X, Y and Z can not be H at the same time) to an aromatic diazonium salt which gets sticky upon exposure to light.

Abstract: A process for forming a fluorescent screen, where polychroic patterns are successively formed from at least two kinds of phosphors having different color emission or black powder by means of a photosensitive substance capable of turning tacky by light irradiation, which comprises bringing a finer particulate filling material than particles of the phosphors in contact with tackified parts when or after the particles of the phosphors are applied to the tackified parts in the individual steps of forming patterns each of the individual phosphors. The filling material saturates the tackiness of the phosphor pattern in question in advance to formation of a phosphor pattern in the successive step, and a cause for contamination of the pattern of the preceding step with the phosphor of the successive step can be eliminated thereby.

Abstract: A photosensitive composition improved in sensitivity by adding a salt of a compound represented by the general formula: ##STR1## (wherein R.sub.1 and R.sub.2 each represents a straight chain alkyl group, and X, Y and Z each represents H, a straight chain alkyl group or an alkoxy group, but two or more of X, Y and Z can not be H at the same time) to an aromatic diazonium salt which gets sticky upon exposure to light.

Abstract: The photosensitive resin which exhibits stickiness by photo-reaction is added with a binder which does not substantially raise dark reaction, and a resultant mixture is applied onto the inner surface of face panel of the color picture tube to form a film. Portion of the film where powdery material is going to be applied is exposed to light and rendered sticky. Phosphor powder, when used as the powdery material, is applied to the sticky portion and adhered thereto to form a fluorescent screen.