Abstract: A stress analysis apparatus capable of improving the accuracy of a stress value, a method, and a program are provided. A stress analysis apparatus 100 that calculates a residual stress of a sample S includes an analysis unit configured to calculate an error as one of solutions by using an equation including an error term and prescribing a relationship between stress and strain with using measured values of diffracted X-rays with respect to a plurality of scattering vectors and a provisional value when the stress in a direction perpendicular to the surface of the sample S is constant, and a provisional value correction unit configured to correct the provisional value using the calculated error, and the analysis unit and the provisional value correction unit repeat the calculation of the error and the correction of the provisional value.

Abstract: A stress analysis apparatus capable of improving the accuracy of a stress value, a method, and a program are provided. A stress analysis apparatus 100 that calculates a residual stress of a sample S includes an analysis unit configured to calculate an error as one of solutions by using an equation including an error term and prescribing a relationship between stress and strain with using measured values by diffracted X-rays with respect to a plurality of scattering vectors and a provisional value when the stress in the direction perpendicular to the surface of the sample S is constant, and a provisional value correction unit configured to correct the provisional value by the calculated error, and the analysis unit and the correction unit repeat the calculation of the error and the correction of the provisional value.

Abstract: The X-ray diffraction apparatus irradiates a sample with an X-ray and performs frame photographing in each X-ray diffraction angle, and includes a control section (141) controlling the frame photographing by scanning without closing a shutter, a data acquisition section (142) acquiring detection data of each frame which has been detected by a semiconductor pixel detector in the frame photographing, a frame integration section (146) integrating the detection data which has been acquired in each scanning for each frame, and a determination section (147) determining whether the integrated detection data has a sufficient intensity or not, and the control section (141) controls so as to finish measurement when the integrated detection data has a sufficient intensity and so as to perform the scanning again when the integrated detection data does not have a sufficient intensity.

Abstract: A sample (1) is irradiated with X-rays at different incident angles from plural X-ray sources (21, 22). Attention is focused on a Debye-ring of each X-ray diffraction emitted conically from the sample in association with incident X-ray from each of the X-ray sources (21, 22), and stress in the sample (1) is determined on the basis of information of X-ray diffraction appearing at an intersection point between the Debye-ring of the X-ray diffraction recorded on an image plate (30) and an equatorial plane (H) and information of X-ray diffraction appearing in the neighborhood of the intersection point between the Debye-ring and the equatorial plane (H).

Abstract: The X-ray diffraction apparatus irradiates a sample with an X-ray and performs frame photographing in each X-ray diffraction angle, and includes a control section (141) controlling the frame photographing by scanning without closing a shutter, a data acquisition section (142) acquiring detection data of each frame which has been detected by a semiconductor pixel detector in the frame photographing, a frame integration section (146) integrating the detection data which has been acquired in each scanning for each frame, and a determination section (147) determining whether the integrated detection data has a sufficient intensity or not, and the control section (141) controls so as to finish measurement when the integrated detection data has a sufficient intensity and so as to perform the scanning again when the integrated detection data does not have a sufficient intensity.

Abstract: An X-ray stress measurement apparatus having: a camera for producing an optical image of a sample; a display for displaying the optical image; an input device capable of inputting positions on a display screen; an X-ray source for generating an X-ray; a table for moving the sample; an X-ray detector for detecting an X-ray exiting the sample; a measurement program for determining the measurement positions of the sample on the basis of the positions indicated by the input device, and measuring the determined measurement positions of the sample; a stress computation program for computing the stress at the measurement positions of the sample on the basis of an output signal from the X-ray detector; and an image formation program for causing the optical image, the measurement positions of the sample, the absolute value of the stress, and the direction of the stress to be displayed on the same display screen.

Abstract: A sample (1) is irradiated with X-rays at different incident angles from plural X-ray sources (21, 22). Attention is focused on a Debye-ring of each X-ray diffraction emitted conically from the sample in association with incident X-ray from each of the X-ray sources (21, 22), and stress in the sample (1) is determined on the basis of information of X-ray diffraction appearing at an intersection point between the Debye-ring of the X-ray diffraction recorded on an image plate (30) and an equatorial plane (H) and information of X-ray diffraction appearing in the neighborhood of the intersection point between the Debye-ring and the equatorial plane (H).

Abstract: An X-ray stress measurement apparatus having: a camera for producing an optical image of a sample; a display for displaying the optical image; an input device capable of inputting positions on a display screen; an X-ray source for generating an X-ray; a table for moving the sample; an X-ray detector for detecting an X-ray exiting the sample; a measurement program for determining the measurement positions of the sample on the basis of the positions indicated by the input device, and measuring the determined measurement positions of the sample; a stress computation program for computing the stress at the measurement positions of the sample on the basis of an output signal from the X-ray detector; and an image formation program for causing the optical image, the measurement positions of the sample, the absolute value of the stress, and the direction of the stress to be displayed on the same display screen.

Abstract: A specific macromolecule crystal evaluating device according to the present invention is equipped with a sample detecting stage for detecting a protein crystal in a sample container, an X-ray measuring stage that is spaced from the sample detecting stage and carries out X-ray diffraction measurement of the protein crystal, a feeding unit for feeding the sample container from the sample detecting stage to the X-ray measuring stage, and a central processing unit for recognizing the position of the protein crystal on the basis of the information achieved in the sample detecting stage and controlling the feeding unit on the basis of the position information to position the protein crystal to a sample disposing portion of the X-ray measuring stage.

Abstract: A specific macromolecule crystal evaluating device according to the present invention is equipped with a sample detecting stage for detecting a protein crystal in a sample container, an X-ray measuring stage that is spaced from the sample detecting stage and carries out X-ray diffraction measurement of the protein crystal, a feeding unit for feeding the sample container from the sample detecting stage to the X-ray measuring stage, and a central processing unit for recognizing the position of the protein crystal on the basis of the information achieved in the sample detecting stage and controlling the feeding unit on the basis of the position information to position the protein crystal to a sample disposing portion of the X-ray measuring stage.