Patents by Inventor Shoji Den
Shoji Den has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10577719Abstract: A molecular beam epitaxy apparatus includes a radical generator for generating a radical species, a molecular beam cell for generating a molecular beam or an atomic beam, and a vacuum chamber for accommodating a substrate therein, in use, the substrate being irradiated with the radical species and the molecular beam or the atomic beam in vacuum, to thereby form, on the substrate, a crystal of a compound derived from the element of the radical species and the element of the molecular beam or the atomic beam.Type: GrantFiled: August 19, 2016Date of Patent: March 3, 2020Assignees: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, NU ECO ENGINEERING CO., LTD., KATAGIRI ENGINEERING CO., LTD.Inventors: Masaru Hori, Hiroshi Amano, Hiroyuki Kano, Shoji Den, Koji Yamakawa
-
Publication number: 20160355946Abstract: A molecular beam epitaxy apparatus includes a radical generator for generating a radical species, a molecular beam cell for generating a molecular beam or an atomic beam, and a vacuum chamber for accommodating a substrate therein, in use, the substrate being irradiated with the radical species and the molecular beam or the atomic beam in vacuum, to thereby form, on the substrate, a crystal of a compound derived from the element of the radical species and the element of the molecular beam or the atomic beam.Type: ApplicationFiled: August 19, 2016Publication date: December 8, 2016Inventors: Masaru HORI, Hiroshi AMANO, Hiroyuki KANO, Shoji DEN, Koji YAMAKAWA
-
Patent number: 9447518Abstract: A radical generator includes a supply tube, a plasma-generating tube, a coil winding about an outer circumference of the plasma-generating tube, for generating an inductively coupled plasma in the plasma-generating tube, an electrode for generating a capacitively coupled plasma in the plasma-generating tube and adding the capacitively coupled plasma to the inductively coupled plasma, and a parasitic-plasma-preventing tube including a dielectric material which extends from a bottom of the plasma-generating tube to an opening of the supply tube in a space between the bottom and the opening, and a tip part thereof is inserted into the supply tube to cover an inner wall of the supply tube for preventing a generation of a parasitic plasma between the electrode and the inner wall of the supply tube.Type: GrantFiled: August 24, 2011Date of Patent: September 20, 2016Assignees: National University Corporation Nagoya University, NU ECO Engineering Co., Ltd., Katagiri Engineering Co., Ltd.Inventors: Masaru Hori, Hiroshi Amano, Hiroyuki Kano, Shoji Den, Koji Yamakawa
-
Publication number: 20130220223Abstract: [Object] To provide a radical generator which can produce radicals at higher density. [Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A cylindrical CCP electrode 13 is disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube at the downstream end of the CCP electrode 13. A parasitic-plasma-preventing tube 15 made of a ceramic material is inserted into an opening of the supply tube 10 at the connection site between the supply tube 10 and the plasma-generating tube 11.Type: ApplicationFiled: August 24, 2011Publication date: August 29, 2013Applicants: KATAGIRI Engineering Co, Ltd., NU Eco Engineering Co. Ltd.Inventors: Masaru Hori, Hiroshi Amano, Hiroyuki Kano, Shoji Den, Koji Yamakawa
-
Patent number: 8310673Abstract: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere. The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode.Type: GrantFiled: March 24, 2008Date of Patent: November 13, 2012Assignees: Nu Eco Engineering Co., Ltd., Katagiri Engineering Co., Ltd.Inventors: Masaru Hori, Hiroyuki Kano, Shoji Den
-
Patent number: 7782463Abstract: Disclosed is a particle density measuring probe for measuring the density of atoms or molecules in a plasma atmosphere by absorption spectroscopy. The probe has a cylindrical light guiding member provided in the plasma atmosphere. At the front end of the light guiding member, there is provided a reflection plate for reflecting light that has propagated through the cylindrical light guiding member. Behind the reflection plate, in a cross section perpendicular to the longitudinal direction of the light guiding member, a part devoid of a portion of wall surface is provided by a predetermined length in the longitudinal direction. A plasma introducing portion allows mutual contact between light passing through this part devoid of a portion of wall surface and atoms or molecules in the plasma atmosphere. The probe has a main body that guides light in an axial direction by total reflection by a side wall, and that is located behind the plasma introducing portion.Type: GrantFiled: November 28, 2007Date of Patent: August 24, 2010Assignees: Nu ECO Engineering Co., Ltd., KATAGIRI Engineering Co., Ltd.Inventors: Masanu Hori, Seigo Takashima, Hiroyuki Kano, Shoji Den
-
Publication number: 20100201978Abstract: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere. The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode.Type: ApplicationFiled: March 24, 2008Publication date: August 12, 2010Inventors: Masaru Hori, Hiroyuki Kano, Shoji Den
-
Patent number: 7632379Abstract: A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).Type: GrantFiled: May 28, 2004Date of Patent: December 15, 2009Assignees: Tokyo Electron Limited, Katagiri Engineering Co., Ltd.Inventors: Toshio Goto, Masaru Hori, Nobuo Ishii, Shoji Den
-
Publication number: 20090237667Abstract: Disclosed is a particle density measuring probe for measuring the density of atoms or molecules in a plasma atmosphere by absorption spectroscopy. The probe has a cylindrical light guiding member provided in the plasma atmosphere. At the front end of the light guiding member, there is provided a reflection plate for reflecting light that has propagated through the cylindrical light guiding member. Behind the reflection plate, in a cross section perpendicular to the longitudinal direction of the light guiding member, a part devoid of a portion of wall surface is provided by a predetermined length in the longitudinal direction. A plasma introducing portion allows mutual contact between light passing through this part devoid of a portion of wall surface and atoms or molecules in the plasma atmosphere. The probe has a main body that guides light in an axial direction by total reflection by a side wall, and that is located behind the plasma introducing portion.Type: ApplicationFiled: November 28, 2007Publication date: September 24, 2009Applicants: NU Eco Engineering Co., Ltd., KATAGIRI Engineering Co., Ltd.Inventors: Masanu Hori, Seigo Takashima, Hiroyuki Kano, Shoji Den
-
Publication number: 20080029030Abstract: [Object] To stably generate plasma at atmospheric pressure. [Solving Means] There are provided a tubular casing 10 into which a gas and a microwave are introduced, a hole 30 provided in a bottom surface of this casing, and a columnar conductor 40 which is provided in an axis direction of the casing, a bottom surface of the conductor 40 having a contour placed inside the contour of the hole. A minute gap A formed between the contour of a bottom surface 41 of the conductor 40 and the contour of the hole, a coaxial waveguide formed of the conductor and the casing, and an insulating film 22 formed at least on a contour portion forming the hole at the minute gap are provided. In the structure described above, the microwave is guided to the minute gap by the coaxial waveguide, and the gas is made to pass through the minute gap, so that the gas is placed in a plasma state at the minute gap.Type: ApplicationFiled: January 26, 2005Publication date: February 7, 2008Inventors: Toshio Goto, Masaru Hori, Shoji Den, Mikio Nagai
-
Publication number: 20070034601Abstract: The surface of a material for an electronic device is flattened by irradiating the surface of the material with at least part of plasma components, while supplying a liquid to the surface of the material for an electronic device. There are provided a method of treating the surfaces for favorably flattening the surface of the material for an electronic device or of the substrate for an electronic device, while suppressing damage to the material or to the substrate, and an apparatus for treating the surfaces.Type: ApplicationFiled: September 22, 2003Publication date: February 15, 2007Applicant: TOKYO ELECTRON LIMITEDInventors: Toshio Goto, Masaru Hori, Nobuo Ishii, Shoji Den
-
Publication number: 20070017636Abstract: A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).Type: ApplicationFiled: May 28, 2004Publication date: January 25, 2007Applicants: Toshio Goto, Tokyo Electron Limited, Katagiri Engineering Co., Ltd.Inventors: Toshio Goto, Masaru Hori, Nobuo Ishii, Shoji Den