Abstract: A treatment device using active oxygen, the treatment device comprising: an ultraviolet transmission member; and a first chamber and a second chamber adjacent to each other separated by the ultraviolet transmission member, wherein the first chamber is capable of accommodating a treatment target and comprises an ozone generator, the second chamber comprises an ultraviolet light source, the ultraviolet light source is capable of irradiating a surface of the treatment target, which is accommodated in the first chamber, with ultraviolet light, and a distance between the ultraviolet transmission member and the surface of the treatment target can be adjusted to 10 mm or less.

Abstract: An active oxygen supply device comprising: a housing having at least one opening; an ozone generator located inside the housing; a means for generating an airflow comprising ozone generated inside the housing by the ozone generator, flowing toward the opening and flowing out of the housing through the opening; and an ultraviolet light source arranged so that the airflow comprising the ozone and flowing out of the housing through the opening can be irradiated with ultraviolet rays, wherein the ultraviolet light source decomposes the ozone in the airflow to generate active oxygen, and the airflow comprising the active oxygen generated by irradiating the airflow comprising the ozone with the ultraviolet rays is supplied to an object to be treated outside the housing.

Abstract: A forming method of a component used in a plasma processing apparatus includes irradiating an energy beam to a source material of the component while supplying the source material based on a surface state of the component.

Abstract: A forming method of a component for use in a plasma processing apparatus includes irradiating, while supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic, an energy beam to the source material of the first ceramic and the source material of the second ceramic.

Abstract: A placing table, on which a substrate is placed, includes a base. The base includes a first path configured to allow a heat transfer medium having a first temperature to flow therein; a first heat insulating layer disposed under the first path; and a seal member disposed under the first heat insulating layer.

Abstract: An active oxygen supply device that is a plasma actuator equipped with a plasma generator and an ultraviolet light source in a housing having at least one opening, the plasma generator being provided with a first electrode and a second electrode with a dielectric in-between and creating an induced flow that contains ozone by applying a voltage between the two electrodes, in which the plasma actuator is positioned so that the induced flow flows outside the housing from an opening, and the ultraviolet light source irradiates the induced flow with ultraviolet rays and generates active oxygen in the induced flow; a device for conducting treatment by active oxygen; and a method for conducting treatment by active oxygen.

Abstract: A sterilization device or the like is equipped with a plasma generator and an ultraviolet light source, wherein the plasma generator is a plasma actuator provided with a first electrode and a second electrode with a dielectric in-between, and in which an induced flow including ozone is generated by application of a voltage between the two electrodes, the ultraviolet light source is arranged so as to be able to irradiate the surface of an object to be sterilized, and the plasma actuator is arranged so that the induced flow is supplied to said surface.

Abstract: A substrate processing apparatus includes a processing vessel; a placing table provided within the processing vessel and configured to place a substrate thereon; and a component disposed between the processing vessel and the placing table, the component constituting an anode. The component has a flow path through which a heat exchange medium flows.

Abstract: Used is an electro-conductive member for electrophotography including: a support having an electro-conductive outer surface; and an electro-conductive layer on the outer surface of the support, wherein the electro-conductive layer includes: a matrix containing a first crosslinked rubber product and having a volume resistivity greater than 1.0×1012 ?cm; and domains dispersed in the matrix, wherein the domain includes a second crosslinked rubber product and an electron conductive agent; and the electro-conductive layer includes a region T in which the volume resistivity of the matrix decreases in a depth direction from the outer surface of the electro-conductive member.

Abstract: An interface performs a flick operation with a button selected from buttons of representative characters for each of the syllabic lines of the Japanese syllabary that are array-displayed on a touch panel so as to specify any one of Japanese characters assigned to the representative character in advance. The interface includes a storage unit that stores association information in which up, down, left, and right directions are set to each of the characters assigned to the representative characters in association with each button and a guide image display processing unit that displays a guide image guiding arrangement directions set to the characters assigned to the representative characters prior to selection of a button of the representative character in an outside of an array display region of the representative character.

Abstract: A forming method of a component for use in a plasma processing apparatus includes irradiating, while supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic, an energy beam to the source material of the first ceramic and the source material of the second ceramic.

Abstract: A forming method of a component used in a plasma processing apparatus includes irradiating an energy beam to a source material of the component while supplying the source material based on a surface state of the component.

Abstract: A monitoring system for a sealing apparatus, the sealing apparatus configured to seal a substrate treatment apparatus by a housing and fill a space sealed by the housing with a predetermined gas atmosphere, the monitoring system includes: a laser sensor for a region, which a person can enter in a space between the housing and the substrate treatment apparatus, as a detection region; and a controller configured to output a control signal to the substrate treatment apparatus or the sealing apparatus based on a detection result by the laser sensor or output a notification signal based on the detection result.

Abstract: A member to be used in a substrate processing apparatus is provided. The member is formed of aluminum containing silicon, and the silicon has a particle diameter of 1 ?m or less.

Abstract: The object is to provide a technology capable of reducing level difference between display screens of image display devices. An image display device includes an adjustment unit that adjusts a position of an LED module while the LED module is temporarily fixed to a housing frame, and a fixing unit that fixes, to the housing frame, the LED module that is temporarily fixed to the housing frame. A turning axis of an adjustment screw of the adjustment unit and a turning axis of a fixing screw of the fixing unit are arranged coaxially.

Abstract: A placing table, on which a substrate is placed, includes a base. The base includes a first path configured to allow a heat transfer medium having a first temperature to flow therein; a first heat insulating layer disposed under the first path; and a seal member disposed under the first heat insulating layer.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.

Abstract: A substrate processing apparatus includes a processing vessel; a placing table provided within the processing vessel and configured to place a substrate thereon; and a component disposed between the processing vessel and the placing table, the component constituting an anode. The component has a flow path through which a heat exchange medium flows.

Abstract: An image forming apparatus to display an image, includes a controller, a touch panel display, a color change location specification part, and an approximate color image generator. The controller allows the touch panel display to display a preview image based on image data, selects a specific location of the preview image displayed by the color change location specification part, generates an approximate color image including an approximate color of the specific location selected by the approximate color image generator, and changes a color of an area including the specific location to a color selected from the approximate color image.

Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.