Patents by Inventor Shotaro Ohishi

Shotaro Ohishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5750987
    Abstract: When neutralized plasma is generated, the cylindrical electrode 8 is set at a negative potential against the processing chamber 23 by the DC power source 18, so that ions 23 in the neutralized plasma can be collected at the cylindrical electrode 8. Electrons 24 equal to the collected ion charge can be supplied uniformly toward the ion beam 25. Therefore, by allowing the cylindrical electrode to collect ions, the ion collection area can be spread easily, and only by generating neutralized plasma of low density, a sufficient volume of ions can be collected surely from the plasma and a sufficient volume of electrons can be supplied to the ion beam 25 at the same time.
    Type: Grant
    Filed: April 24, 1996
    Date of Patent: May 12, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Ichimura, Tadashi Sato, Kenzo Kobayashi, Shotaro Ohishi, Hisao Oonuki