Patents by Inventor Shou Kubouchi

Shou Kubouchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method
    Patent number: 8506359
    Abstract: A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spectrometry, or ammonium ion quantitative analysis using ion chromatography having a relationship in which the sodium content is 5 to 500 ppm and at least one of the potassium content and the ammonium ion content is 100 to 20,000 ppm.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: August 13, 2013
    Assignee: JSR Corporation
    Inventors: Hirotaka Shida, Takafumi Shimizu, Masatoshi Ikeda, Shou Kubouchi, Yousuke Shibata, Kazuhito Uchikura, Akihiro Takemura
  • AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD
    Publication number: 20110081780
    Abstract: A chemical mechanical polishing aqueous dispersion includes (A) silica particles, and (B1) an organic acid, the number of silanol groups included in the silica particles (A) calculated from a signal area of a 29Si-NMR spectrum being 2.0 to 3.0×1021/g.
    Type: Application
    Filed: February 13, 2009
    Publication date: April 7, 2011
    Applicant: JSR CORPORATION
    Inventors: Hirotaka Shida, Takafumi Shimizu, Masatoshi Ikeda, Shou Kubouchi, Yousuke Shibata, Michiaki Andou, Kazuhito Uchikura, Akihiro Takemura
  • AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD
    Publication number: 20110053462
    Abstract: A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spectrometry, or ammonium ion quantitative analysis using ion chromatography having a relationship in which the sodium content is 5 to 500 ppm and at least one of the potassium content and the ammonium ion content is 100 to 20,000 ppm.
    Type: Application
    Filed: January 16, 2009
    Publication date: March 3, 2011
    Applicant: JSR CORPORATION
    Inventors: Hirotaka Shida, Takafumi Shimizu, Masatoshi Ikeda, Shou Kubouchi, Yousuke Shibata, Kazuhito Uchikura, Akihiro Takemura