Abstract: A vertical alignment mode liquid crystal display device having an improved viewing angle characteristic is provided. The liquid crystal display device uses a liquid crystal having a negative anisotropic dielectric constant, and orientations of the liquid crystal are vertical to substrates when no voltage is applied, almost horizontal when a predetermined voltage is applied, and oblique when an intermediate voltage is applied. At least one of the substrates includes a structure as domain regulating means, and inclined surfaces of the structure operate as a trigger to regulate azimuths of the oblique orientations of the liquid crystal when the intermediate voltage is applied.

Abstract: A TFT matrix-type liquid crystal display device is used in laptop personal computers and wall TVs. On a transparent insulating substrate 10 there are formed gate bus lines 14 for commonly connecting the gates of thin film transistors, drain bus lines 16 for commonly connecting the drains of the thin film transistors, and outside terminals 20 and outside terminals 30 opposed respectively to the ends of the gate bus lines and the drain bus lines 16, opposed respectively to the ends of the gate bus lines and the drain bus lines. Gate connection lines 24 for commonly connecting the gate bus lines 14 and drain connection lines 34 for commonly connecting the drain bus lines are formed in regions inner of the outside terminals 20, 30. The thin film transistor matrix device can be fabricated without occurrence of short circuit defects, with little characteristic change and with high yields.

Abstract: A vertically alignment mode liquid crystal display device having an improved viewing angle characteristic is disclosed. The disclosed liquid crystal display device uses a liquid crystal having a negative anisotropic dielectric constant, and orientations of the liquid crystal are vertical to substrates when no voltage being applied, almost horizontal when a predetermined voltage is applied, and oblique when an intermediate voltage is applied. At least one of the substrates includes a structure as domain regulating means, and inclined surfaces of the structure operate as a trigger to regulate azimuths of the oblique orientations of the liquid crystal when the intermediate voltage is applied.

Abstract: A conductive film made of Al or alloy containing Al as a main component is formed on an underlying substrate. An upper conductive film is disposed on the conductive film. A first opening is formed through the upper conductive film. An insulating film is disposed on the upper conductive film. A second opening is formed through the insulating film. An inner wall of the second opening is retreated from an inner wall of the first opening. An ITO film is formed covering a partial upper surface of the insulating film and inner surfaces of the first and second openings, and contacting a partial upper surface of the upper conductive film at a region inside of the second opening. Good electrical contact between an Al or Al alloy film and an ITO film can be established and productivity can be improved.

Abstract: A conductive film made of Al or alloy containing Al as a main component is formed on an underlying substrate. An upper conductive film is disposed on the conductive film. A first opening is formed through the upper conductive film. An insulating film is disposed on the upper conductive film. A second opening is formed through the insulating film. An inner wall of the second opening is retreated from an inner wall of the first opening. An ITO film is formed covering a partial upper surface of the insulating film and inner surfaces of the first and second openings, and contacting a partial upper surface of the upper conductive film at a region inside of the second opening. Good electrical contact between an Al or Al alloy film and an ITO film can be established and productivity can be improved.

Abstract: A TFT matrix-type liquid crystal display device is used in laptop personal computers and wall TVs. On a transparent insulating substrate 10 there are formed gate bus lines 14 for commonly connecting the-gates of thin film transistors, drain bus lines 16 for commonly connecting the drains of the thin film transistors, and outside terminals 20 and outside terminals 30 opposed respectively to the ends of the gate bus lines and the drain bus lines 16, opposed respectively to the ends of the gate bus lines and the drain bus lines. Gate connection lines 24 for commonly connecting the gate bus lines 14 and drain connection lines 34 for commonly connecting the drain bus lines are formed in regions inner of the outside terminals 20, 30. The thin film transistor matrix device can be fabricated without occurrence of short circuit defects, with little characteristic change and with high yields.

Abstract: A TFT matrix-type liquid crystal display device is used in laptop personal computers and wall TV's. On a transparent insulating substrate there are formed gate bus lines for commonly connecting the gates of thin film transistors, drain bus lines for commonly connecting the drains of the thin film transistors, and outside terminals and outside terminals opposed respectively to the ends of the gate bus lines and the drain bus lines, opposed respectively to the ends of the gate bus lines and the drain bus lines. Gate connection lines for commonly connecting the gate bus lines and drain connection lines for commonly connecting the drain bus lines are formed on the transparent insulating substrate in regions inner of the outside terminals. The thin film transistor matrix device can be fabricated without occurrence of short circuit defects, with little characteristic change and with high yields.

Abstract: A TFT matrix-type liquid crystal display device is used in laptop personal computers and wall TVs. On a transparent insulating substrate 10 there are formed gate bus lines 14 for commonly connecting the gates of thin film transistors, drain bus lines 16 for commonly connecting the drains of the thin film transistors, and outside terminals 20 and outside terminals 30 opposed respectively to the ends of the gate bus lines and the drain bus lines 16, opposed respectively to the ends of the gate bus lines and the drain bus lines. Gate connection lines 24 for commonly connecting the gate bus lines 14 and drain connection lines 34 for commonly connecting the drain bus lines are formed in regions inner of the outside terminals 20, 30. The thin film transistor matrix device can be fabricated without occurrence of short circuit defects, with little characteristic change and with high yields.

Abstract: A conductive film made of Al or alloy containing Al as a main component is formed on an underlying substrate. An upper conductive film is disposed on the conductive film. A first opening is formed through the upper conductive film. An insulating film is disposed on the upper conductive film. A second opening is formed through the insulating film. An inner wall of the second opening is retreated from an inner wall of the first opening. An ITO film is formed covering a partial upper surface of the insulating film and inner surfaces of the first and second openings, and contacting a partial upper surface of the upper conductive film at a region inside of the second opening. Good electrical contact between an Al or Al alloy film and an ITO film can be established and productivity can be improved.

Abstract: A conductive film made of Al or alloy containing Al as a main component is formed on an underlying substrate. An upper conductive film is disposed on the conductive film. A first opening is formed through the upper conductive film. An insulating film is disposed on the upper conductive film. A second opening is formed through the insulating film. An inner wall of the second opening is retreated from an inner wall of the first opening. An ITO film is formed covering a partial upper surface of the insulating film and inner surfaces of the first and second openings, and contacting a partial upper surface of the upper conductive film at a region inside of the second opening. Good electrical contact between an Al or Al alloy film and an ITO film can be established and productivity can be improved.

Abstract: A pattern forming method of forming an overall pattern by connecting a plurality of pattern forming regions. The pattern forming method includes the steps of (A) forming, using a first exposure mask (RT11a), a plurality of latent images of first patterns arranged regularly in a photosensitive resist film (52) on a first region while forming unexposed regions having a size in which one or more of the first patterns are included and latent images of the first patterns in it on a third region (JT1), and (B) forming, using a second exposure mask (RT11b), a plurality of latent images of the first patterns arranged regularly in the photosensitive resist film (52) on a second region while forming latent images of the first patterns in the unexposed regions on the third region (JT1).

Abstract: A TFT matrix-type liquid crystal display device is used in laptop personal coputers and wall TV's. On a transparent insulating substrate there are formed gate bus lines for commonly connecting the gates of thin film transistors, drain bus lines for commonly connecting the drains of the thin film transistors, and outside terminals and outside terminals opposed respectively to the ends of the gate bus lines and the drain bus lines, opposed respectively to the ends of the gate bus lines and the drain bus lines. Gate connection lines for commonly connecting the gate bus lines and drain connection lines for commonly connecting the drain bus lines are formed on the transparent insulating substrate in regions inner of the outside terminals. The thin film transistor matrix device can be fabricated without occurrence of short circuit defects, with little characteristic change and with high yields.