Abstract: A remover solution for photoresist comprising (a) a solvent which is typically water, (b) an inorganic or organic alkaline compound such as sodium and potassium hydroxides, and (c) a borohydride compound such as sodium and lithium borohydrides and organic amine borane compounds. When used for removing patterned photoresist layer in the manufacturing process of, for example, electronic circuit board substrates. The method gives quite satisfactory results without discoloration or denaturation of the copper surface and solder surface, consequently leading to the production of high-quality products.

Abstract: The invention provides a novel means for providing a highly heat-resistant and corrosion-resistant coating film on the surface of a substrate such as a semiconductor silicon wafer or glass plate by coating the surface with a liquid coating composition which is a solution of an oligomeric organopolysiloxane as a partial dehydration-condensation product of a monohydrocarbylsilane triol RSi(OH).sub.3, optionally, with admixture of a dihydrocarbylsilane diol R.sub.2 Si(OH).sub.2, R being a monovalent hydrocarbon group, e.g. methyl or phenyl, in an organic solvent followed by baking of the coated substrate to convert the coating layer into a cured resin film.

Abstract: The inventive liquid separator of laboratory use can overcome the problems in the conventional separatory funnels used for liquid-liquid phase separation. The inventive apparatus comprises (a) a first bottle-like vessel with a mouth, (b) a second bottle-like vessel with a mouth connected with the first vessel at the mouths with air-tightness but disconnectable therefrom, (c) a porous membrane partitioning the first and the second vessels and made, preferably, of a sintered body of a water-repellent plastic resin such as a fluorocarbon polymer, and (d) an air-passage tubing opening at the ends in the first and the second vessels. When a two-phase mixture of an aqueous liquid and an organic liquid is taken in the first vessel positioned above the second vessel, the organic liquid can pass through the porous membrane to be transferred into the second vessel but the aqueous liquid is retained in the first vessel by virtue of the water-repellency of the fluorocarbon polymer.

Abstract: Liquid compositions suitable for providing silica-based coating films on to various substrate surfaces are prepared by the reaction of an alkoxy-containing silane, a lower carboxylic acid and an alcohol in the presence of a reaction accelerator which is an organic acid different from the above mentioned lower carboxylic acid. The reaction proceeds very smoothly even in the absence of any halogen-containing compounds, and the resultant liquid coating compositions are free from the problem of corrosion due to the presence of a halogen-containing ingredient.

Abstract: An improved apparatus for plasma treatment of silicon semiconductor wafers is proposed in which the end point of the plasma etching or ashing can be readily detected by monitoring with an optical fiberscope penetrating the wall of the plasma reaction chamber with one terminal located inside the plasma reaction chamber with a condenser lens attached thereto and the other terminal located outside the plasma reaction chamber at a distanced position free from the influence of the high frequency electric field inherent to plasma generation which otherwise interferes with the photoelectric recording by the photocell connected to the outer terminal of the optical fiberscope.