Patents by Inventor Shu-Hsin Kao
Shu-Hsin Kao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240176093Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.Type: ApplicationFiled: February 5, 2024Publication date: May 30, 2024Inventors: Chao-Chang HU, Chih-Wei WENG, Chia-Che WU, Chien-Yu KAO, Hsiao-Hsin HU, He-Ling CHANG, Chao-Hsi WANG, Chen-Hsien FAN, Che-Wei CHANG, Mao-Gen JIAN, Sung-Mao TSAI, Wei-Jhe SHEN, Yung-Ping YANG, Sin-Hong LIN, Tzu-Yu CHANG, Sin-Jhong SONG, Shang-Yu HSU, Meng-Ting LIN, Shih-Wei HUNG, Yu-Huai LIAO, Mao-Kuo HSU, Hsueh-Ju LU, Ching-Chieh HUANG, Chih-Wen CHIANG, Yu-Chiao LO, Ying-Jen WANG, Shu-Shan CHEN, Che-Hsiang CHIU
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Patent number: 11934027Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.Type: GrantFiled: June 21, 2022Date of Patent: March 19, 2024Assignee: TDK TAIWAN CORP.Inventors: Chao-Chang Hu, Chih-Wei Weng, Chia-Che Wu, Chien-Yu Kao, Hsiao-Hsin Hu, He-Ling Chang, Chao-Hsi Wang, Chen-Hsien Fan, Che-Wei Chang, Mao-Gen Jian, Sung-Mao Tsai, Wei-Jhe Shen, Yung-Ping Yang, Sin-Hong Lin, Tzu-Yu Chang, Sin-Jhong Song, Shang-Yu Hsu, Meng-Ting Lin, Shih-Wei Hung, Yu-Huai Liao, Mao-Kuo Hsu, Hsueh-Ju Lu, Ching-Chieh Huang, Chih-Wen Chiang, Yu-Chiao Lo, Ying-Jen Wang, Shu-Shan Chen, Che-Hsiang Chiu
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Patent number: 6875085Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing.Type: GrantFiled: September 23, 2002Date of Patent: April 5, 2005Assignee: Mosel Vitelic, Inc.Inventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6588139Abstract: A gravitational animal trap. The trap includes a trap cage having a movable door, an unturned plate that can be adjusted in terms of different fulcrums thereof, and a sensing device that is pivotally jointed with the upturned plate to activate the door switch. When the prey enters the trap cage and steps on the upturned plate, causing the upturned plate to alter the state of equilibrium due to the gravitational force of the prey, the sensing device is activated to shut the movable door, thus achieving the object of entrapping the prey. A weight-adjusting balance device can be further installed with the present invention to effectively improve upon the sensitivity and timing for the shutting of the movable door of the gravitational animal trap.Type: GrantFiled: January 4, 2002Date of Patent: July 8, 2003Inventors: Huan Fu Kao, Shu Hsin Kao, Shu Yin Kao, Shu Lin Kao
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Publication number: 20030019148Abstract: A gravitational animal trap comprises a trap cage having a movable door, an upturned plate that can be adjusted in terms of different fulcrums thereof, and a sensing device that is pivotally jointed with the upturned plate to activate the door switch. When the prey enters the trap cage and steps on the upturned plate, causing the upturned plate to alter the state of equilibrium due to the gravitational force of the prey, the sensing device is activated to shut the movable door, thus achieving the object of entrapping the prey. A weight-adjusting balance device can be further installed with the present invention to effectively improve upon the sensitivity and timing for the shutting of the movable door of the gravitational animal trap.Type: ApplicationFiled: January 4, 2002Publication date: January 30, 2003Inventors: Huan Fu Kao, Shu Hsin Kao, Shu Yin Kao, Shu Lin Kao
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Publication number: 20030017787Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing.Type: ApplicationFiled: September 23, 2002Publication date: January 23, 2003Inventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6454641Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing.Type: GrantFiled: November 7, 2000Date of Patent: September 24, 2002Inventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6267655Abstract: An improved wafer polishing machine is disclosed. In one embodiment, the wafer polishing machine has a movable polishing surface and a holder that holds an object, such as a semiconductor wafer, against the movable polishing surface. The holder includes a support structure that supports the object in contact with the polishing surface and an annular retaining ring that retains the object in alignment with the support structure. The retaining ring has a plurality of projections projecting inwardly from its inner circumference. The projections are evenly spaced around the inner circumference of the retaining ring. In one embodiment, the projections on the retaining ring define a circle with a diameter no less than the diameter of the object being polished. In an alternative embodiment, the retaining ring has a smooth, circular inner circumference formed from a flexible material which distends to from a continuous arc of contact with the wafer during polishing.Type: GrantFiled: July 15, 1998Date of Patent: July 31, 2001Assignee: Mosel Vitelic, Inc.Inventors: David E. Weldon, Shu-Hsin Kao, Michael Leach, Charles J. Regan, Linh X. Can
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Patent number: 6244945Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing.Type: GrantFiled: June 1, 2000Date of Patent: June 12, 2001Assignee: Mosel Vitelic, Inc.Inventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6126527Abstract: A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. The boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configurations can maintain the fluid within the cavity. In one embodiment the seal mechanism is a labyrinth seal including multiple ridges. In one embodiment, the seal mechanism is a face-sealing seal which includes a jacket with a u-shaped cross section with a compressible element positioned within it. The face-sealing seal is in a groove positioned outside of the cavity. Alternatively, the face-sealing seal forms the outer edge of the cavity. In a further embodiment, the seal is an o-ring seal positioned within a double dove-tailed groove.Type: GrantFiled: July 10, 1998Date of Patent: October 3, 2000Assignee: Aplex Inc.Inventors: Shu-Hsin Kao, William F. Lapson, Charles J. Regan, David E. Weldon
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Patent number: 6086456Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing.Type: GrantFiled: November 6, 1998Date of Patent: July 11, 2000Assignee: Aplex, Inc.Inventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6062959Abstract: A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing.Type: GrantFiled: November 5, 1997Date of Patent: May 16, 2000Assignee: Aplex GroupInventors: David E. Weldon, Shu-Hsin Kao, Tim H. Huynh
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Patent number: 6000997Abstract: Heat is transferred between a linear CMP belt and an adjacent heat transfer source, providing a predetermined lateral temperature distribution across the belt. Temperature sensors generate feedback signals to control the heat transfer sources. Alternatively, process monitoring sensors provide feedback signals. The heat transfer source can include multiple selectively controllable individual heat transfer sources having differing temperatures, which can be above or below ambient temperature. The mechanism of heat transfer can include one or more of convection, conduction, and radiation. The configuration provides substantial flexibility to establish and maintain selective non-uniform temperature distributions across the polishing belt. This in turn permits precise control and stability of the polishing process. Heat transfer sources can include pulleys, slurry dispensers, polishing pad conditioners or conditioner back supports, fluid nozzles, and sealed fluid cavity belt supports.Type: GrantFiled: July 10, 1998Date of Patent: December 14, 1999Assignee: Aplex, Inc.Inventors: Shu-Hsin Kao, Shou-sung Chang, Huey M. Tzeng, Gregory C. Lee, Greg Simon, Harry Lee, David E. Weldon, Garry Kwong, William F. Lapson, Gregory A. Appel, Peter Mok
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Patent number: 5980368Abstract: A polishing tool uses a seal cavity containing a fluid that supports polishing pads against an object being polished. In one embodiment, the boundaries of the cavity include a support structure, a portion of a polishing material, and a seal between the support structure and the polishing material. The polishing material moves relative to the support structure and seal. A variety of seal configuration can maintain the fluid within the cavity. One seal includes an o-ring that the force of a spring, a magnet, or air pressure presses against the polishing material. A gas flow from outside the cavity or from an inlet inside the cavity can form a gas pocket in the cavity, adjacent the o-ring, to prevent leakage of the fluid past the o-ring. Another seal is formed by an aerostatic bearing. The fluid pressure in the cavity can be varied temporally to create vibrations in the polishing material to enhance polishing performance or can be varied spatially to change the pressure profile.Type: GrantFiled: November 5, 1997Date of Patent: November 9, 1999Assignee: Aplex GroupInventors: Shou-sung Chang, Shu-Hsin Kao, David E. Weldon