Abstract: A sputtering target comprised of a plurality of members including a target material and a base material, wherein the plurality of members includes a first member and a second member laminated to each other, wherein the first member contains Al, and the second member contains Cu, wherein at least one of the first member and the second member contains Mg, wherein the sputtering target includes an alloy layer containing Al and Cu between the first member and the second member, the alloy layer being in contact with the first member and the second member, and wherein the alloy layer further includes an Mg-containing layer containing 5.0 at % or more of Mg in at least a part of the alloy layer.

Abstract: The disclosure is related to reducing the cost of sputtering target products. Provided is a sputtering target product wherein: the sputtering target product includes a target, a backing plate or backing tube, and insert material layer; at least a part of the non-sputtering side of the target is profiled so as to have protrusions and recesses that have plane symmetry; the insert material layer is formed so as to adhere closely to the profiled side, and the insert material is made of metal with specific gravity that is at least less than those of the metal constituting the target.

Abstract: Provided is a titanium sputtering target having a recrystallized structure having an average crystal grain diameter of 1 ?m or less. Also provided is a method for producing a titanium sputtering target, the method comprising the steps of: subjecting a cut titanium ingot to large strain processing to provide a processed sheet; subjecting the processed sheet to cold rolling at a rolling ratio of 30% or more to provide a rolled sheet; and subjecting the rolled sheet to a heat treatment at a temperature of 320° C. or less.

Abstract: The disclosure is related to reducing the cost of sputtering target products. Provided is a sputtering target product wherein: the sputtering target product includes a target, a backing plate or backing tube, and insert material layer; at least a part of the non-sputtering side of the target is profiled so as to have protrusions and recesses that have plane symmetry; the insert material layer is formed so as to adhere closely to the profiled side, and the insert material is made of metal with specific gravity that is at least less than those of the metal constituting the target.

Abstract: Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material includes one or more metal elements, and has a crystal grain size of 10 ?m or less.

Abstract: Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material comprises one or more metal elements, the target material has a crystal grain size of 50 ?m or less, and the target material has an oxygen concentration of 1000 ppm by mass or less.

Abstract: A sputtering target comprising a flat part and a tapered part on a sputter surface, wherein of the tapered part includes a crystal distortion having an average KAM value of 0.5° or more. It is possible to lower the ignition failure rate of ignition (plasma ignition), and start the sputter process stably. Because the downtime of the device can thereby be shortened, it is possible to contribute to the improvement in throughput and cost performance.

Abstract: A sputtering target comprising a flat part and a tapered part, wherein a machined groove for use in ignition is arranged on a sputtering surface of the target. With the sputtering target of the present invention, the ignition failure rate during ignition (plasma ignition) can be reduced, and the sputtering process can be started stably. It is thereby possible to shorten the downtime of the device, and consequently contribute to improved throughput and enhanced cost performance.

Abstract: Provided is a sputtering target having a molybdenum content of 99.99% by mass or more, a relative density of 98% or more, and an average crystal grain diameter of 400 ?m or less.

Abstract: An aspect of the present invention is directed to a method for producing a glass sheet with a coating, produced by applying a functional liquid for providing a function to the glass sheet, to at least one face of the glass sheet, including a first step of supplying the functional liquid to an ejection portion having a nozzle that ejects the functional liquid toward the glass sheet, and a second step of applying the functional liquid to the glass sheet while moving the glass sheet relative to the ejection portion in a fixed state such that the functional liquid ejected from the nozzle is applied to a predetermined region on the at least one face of the glass sheet, wherein a tube member that transports the functional liquid is connected to the ejection portion, and, in the first step, the functional liquid is supplied by the tube member to the ejection portion.

Abstract: Provided is a novel anode for electroplating, which replaces the Cu anode and which is capable of suppressing plating defects. The Co anode has a number of particles with a grain size of 0.5 ?m or more of 6000 particles/g or less, as measured by an in-liquid particle counter according to JIS B 9925 after dissolving the Co anode in dilute nitric acid having a nitric acid concentration of 20% by mass.

Abstract: Provided is a titanium sputtering target having a recrystallized structure having an average crystal grain diameter of 1 ?m or less. Also provided is a method for producing a titanium sputtering target, the method comprising the steps of: subjecting a cut titanium ingot to large strain processing to provide a processed sheet; subjecting the processed sheet to cold rolling at a rolling ratio of 30% or more to provide a rolled sheet; and subjecting the rolled sheet to a heat treatment at a temperature of 320° C. or less.

Abstract: A sputtering target formed from monocrystalline silicon is provided, wherein a sputter surface of the sputtering target is a plane inclined at an angle that exceeds 1° and is less than 10° from a {100} plane. The sputtering target formed from monocrystalline silicon provides a sputtering target which yields superior mechanical strength as well as exhibiting a sputter performance which is equivalent to that of a {100} plane. From a different perspective, in addition to superior mechanical strength, the monocrystalline silicon sputtering target yields superior particle characteristics, sputtering rate, crack resistance, surface shape uniformity and other characteristics.

Abstract: An aspect of the present invention is directed to a method for producing a glass sheet with a coating, produced by applying a functional liquid for providing a function to the glass sheet, to at least one face of the glass sheet, including a first step of supplying the functional liquid to an ejection portion having a nozzle that ejects the functional liquid toward the glass sheet, and a second step of applying the functional liquid to the glass sheet while moving the glass sheet relative to the ejection portion in a fixed state such that the functional liquid ejected from the nozzle is applied to a predetermined region on the at least one face of the glass sheet, wherein a tube member that transports the functional liquid is connected to the ejection portion, and, in the first step, the functional liquid is supplied by the tube member to the ejection portion.

Abstract: An aspect of the present invention is directed to a method for producing a glass sheet with a coating, produced by applying a functional liquid for providing a function to the glass sheet, to at least one face of the glass sheet, including a first step of supplying the functional liquid to an ejection portion having a nozzle that ejects the functional liquid toward the glass sheet, and a second step of applying the functional liquid to the glass sheet while moving the glass sheet relative to the ejection portion in a fixed state such that the functional liquid ejected from the nozzle is applied to a predetermined region on the at least one face of the glass sheet, wherein a tube member that transports the functional liquid is connected to the ejection portion, and, in the first step, the functional liquid is supplied by the tube member to the ejection portion.

Abstract: A sputtering target comprising a flat part and a tapered part on a sputter surface, wherein of the tapered part includes a crystal distortion having an average KAM value of 0.5° or more. It is possible to lower the ignition failure rate of ignition (plasma ignition), and start the sputter process stably. Because the downtime of the device can thereby be shortened, it is possible to contribute to the improvement in throughput and cost performance.

Abstract: A sputtering target formed from monocrystalline silicon is provided, wherein a sputter surface of the sputtering target is a plane inclined at an angle that exceeds 1° and is less than 10° from a {100} plane. The sputtering target formed from monocrystalline silicon provides a sputtering target which yields superior mechanical strength as well as exhibiting a sputter performance which is equivalent to that of a {100} plane. From a different perspective, in addition to superior mechanical strength, the monocrystalline silicon sputtering target yields superior particle characteristics, sputtering rate, crack resistance, surface shape uniformity and other characteristics.

Abstract: A sputtering target comprising a flat part and a tapered part, wherein a machined groove for use in ignition is arranged on a sputtering surface of the target. With the sputtering target of the present invention, the ignition failure rate during ignition (plasma ignition) can be reduced, and the sputtering process can be started stably. It is thereby possible to shorten the downtime of the device, and consequently contribute to improved throughput and enhanced cost performance.

Abstract: An aspect of the present invention is directed to a method for producing a glass sheet with a coating, produced by applying a functional liquid for providing a function to the glass sheet, to at least one face of the glass sheet, including a first step of supplying the functional liquid to an ejection portion having a nozzle that ejects the functional liquid toward the glass sheet, and a second step of applying the functional liquid to the glass sheet while moving the glass sheet relative to the ejection portion in a fixed state such that the functional liquid ejected from the nozzle is applied to a predetermined region on the at least one face of the glass sheet, wherein a tube member that transports the functional liquid is connected to the ejection portion, and, in the first step, the functional liquid is supplied by the tube member to the ejection portion.

Abstract: The present invention provides an antifog-film-coated article including an antifog film having high hardness while maintaining sufficient antifog performance, which article can be employed in various applications, including antifog mirrors, windowpanes for automobiles, and windowpanes for buildings. The antifog-film-coated article of the present invention includes a hard substrate, and a water-absorbing composite film formed on the substrate, wherein the water-absorbing composite film contains a polyvinyl acetal resin; colloidal silica in an amount of 30 to 80 parts by mass on the basis of 100 parts by mass of the resin; and silica-equivalent particles derived from a hydrolysis product or partial hydrolysis product of a silicon alkoxide compound in an amount of 5 to 55 parts by mass on the basis of 100 parts by mass of the resin.