Abstract: The present invention uniformly dries, in a clean room in which down flow is constituted, a coated film formed on a surface of a substrate held in a state that the coated surface faces down. In a coating apparatus including an absorption board holding a substrate in a state that its surface to be coated looks down, and a coating mechanism that coats with coating liquid the surface to be coated of the substrate held by this absorption board, there is provided an air current generating apparatus which supplies clean gas toward the surface to be coated.

Abstract: A coating apparatus 1a for forming a coating film on a coated surface by raising a coating liquid that is reserved under a substrate 10 by a capillary phenomenon of a substrate processing means 2, bringing the raised coating liquid into contact with the coated surface of the substrate 10 that is directed downward, and then moving relatively the substrate processing means 2 and the substrate 10, comprises a holding means 5a for holding detachably the substrate 10, a chucking means 3 for chucking the substrate 10 from the holding means 5a in a state that the processes surface of the substrate 10 is directed downward, and a moving means 4 for moving relatively the substrate processing means 2 and/or the chucking means 3 in a horizontal plane.

Abstract: A resist film forming method including a resist coating step, comprising steps of rising by a capillary phenomenon a coating liquid stored below the coating surface of a substrate held facing-downward, bringing the rised coating liquid into contact with the coating surface via a nozzle, and scanning the nozzle along the coating surface of the substrate thereby coating the resist film on the coating surface of the substrate, wherein said method further including a step of drying the coated resist film by moving the substrate at a predetermined speed with the coating surface of the substrate facing downward.

Abstract: It is a purpose of the present invention to uniformly dry, in a clean room in which down flow is constituted, a coated film formed on a surface to be coated of a substrate held in a state of that the surface to be coated looks down. In a coating apparatus comprising an absorption board holding a substrate in a state of that its surface to be coated looks down, and a coating mechanism that coats with coating liquid the surface to be coated of the substrate held by this absorption board, there is provided an air current generating apparatus which supplies clean gas toward the surface to be coated.