Patents by Inventor Shuichi Kimura
Shuichi Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210402143Abstract: A catheter assembly includes: a catheter having a lumen; a catheter hub located at a proximal end of the catheter and having a hollow portion that communicates with the lumen; and a valve body located in the catheter hub, wherein the valve body is an monolithic structure including: a fixed portion fixed to the catheter hub, a deformable portion continuous with the fixed portion and having a slit that is openable and closable, and a pusher portion extending from the deformable portion in a proximal direction. The pusher portion is configured to be pushed in a distal direction by a connector inserted into the hollow portion from a proximal end of the catheter hub to deform the deformable portion and open the slit.Type: ApplicationFiled: September 14, 2021Publication date: December 30, 2021Applicant: TERUMO KABUSHIKI KAISHAInventors: Takayuki YOKOTA, Shuichi KIMURA
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Patent number: 9918773Abstract: In a plasma treatment system, a temperature detection section detecting a temperature of a perfusion layer of an electrically conductive solution is fixed to a treatment portion, and is located at a position to be immersed in the perfusion layer when a first electrode portion and a second electrode portion are immersed in the perfusion layer. In the plasma treatment system, a control section controls an adjustment of a temperature in a temperature adjustment unit and controls a supply volume and a suction volume of the electrically conductive solution on the basis of a detection result in the temperature detection section so that the temperature of the perfusion layer is within a target temperature range.Type: GrantFiled: September 2, 2016Date of Patent: March 20, 2018Assignee: OLYMPUS CORPORATIONInventors: Manabu Ishikawa, Shuichi Kimura, Koichiro Watanabe
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Patent number: 9827032Abstract: A plasma treatment system includes a spout, a suction hole, a first electrode and a second electrode, an impedance acquisition unit, a liquid volume adjustment unit, and a first control unit. The first electrode and a second electrode are configured to generate plasma to treat a living tissue by the application of a voltage. The impedance acquisition unit acquires impedance between the first electrode and the second electrode. The liquid volume adjustment unit adjusts the supply volume or suction volume of the electrically conductive solution. The first control unit controls the liquid volume adjustment unit to increase or decrease the supply volume or suction volume of the electrically conductive solution based on the impedance.Type: GrantFiled: June 20, 2016Date of Patent: November 28, 2017Assignee: OLYMPUS CORPORATIONInventors: Manabu Ishikawa, Shuichi Kimura, Koichiro Watanabe
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Patent number: 9779855Abstract: A thin high-voltage insulted electric wire which comprises a conductor and an insulating layer covering the conductor, said insulating layer comprising both an ethylene-acrylic ester copolymer resin and polyethylene. The insulating layer is made of a composition which exhibits a reciprocal of the product of tensile break strength (?f) (MPa) and tensile break elongation (?), 1/(?f·?), of 4.8×10?2 or less [wherein ?f refers to the tensile break strength of the insulating layer and ? refers to the tensile break elongation thereof], a storage elastic modulus (E) of 520 MPA or more, and a D hardness of 45 or more.Type: GrantFiled: July 29, 2015Date of Patent: October 3, 2017Assignee: YAZAKI CORPORATIONInventor: Shuichi Kimura
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Publication number: 20170020594Abstract: In a plasma treatment system, a coefficient K which is a ratio of a supply amount and a suction amount of saline and also a minimal water amount required for generation of plasma is provided, and the required supply amount and suction amount of the saline are set from the coefficient K acquired on the basis of an output level of high-frequency energy, thereby performing a plasma treatment.Type: ApplicationFiled: September 30, 2016Publication date: January 26, 2017Applicant: OLYMPUS CORPORATIONInventors: Manabu ISHIKAWA, Shuichi KIMURA, Koichiro WATANABE
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Publication number: 20160367307Abstract: In a plasma treatment system, a temperature detection section detecting a temperature of a perfusion layer of an electrically conductive solution is fixed to a treatment portion, and is located at a position to be immersed in the perfusion layer when a first electrode portion and a second electrode portion are immersed in the perfusion layer. In the plasma treatment system, a control section controls an adjustment of a temperature in a temperature adjustment unit and controls a supply volume and a suction volume of the electrically conductive solution on the basis of a detection result in the temperature detection section so that the temperature of the perfusion layer is within a target temperature range.Type: ApplicationFiled: September 2, 2016Publication date: December 22, 2016Applicant: OLYMPUS CORPORATIONInventors: Manabu ISHIKAWA, Shuichi KIMURA, Koichiro WATANABE
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Publication number: 20160302843Abstract: A plasma treatment system includes a spout, a suction hole, a first electrode and a second electrode, an impedance acquisition unit, a liquid volume adjustment unit, and a first control unit. The first electrode and a second electrode are configured to generate plasma to treat a living tissue by the application of a voltage. The impedance acquisition unit acquires impedance between the first electrode and the second electrode. The liquid volume adjustment unit adjusts the supply volume or suction volume of the electrically conductive solution. The first control unit controls the liquid volume adjustment unit to increase or decrease the supply volume or suction volume of the electrically conductive solution based on the impedance.Type: ApplicationFiled: June 20, 2016Publication date: October 20, 2016Applicant: OLYMPUS CORPORATIONInventors: Manabu ISHIKAWA, Shuichi KIMURA, Koichiro WATANABE
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Publication number: 20160053079Abstract: A resin composition comprises a base resin containing an ethylene-acrylic acid ester copolymer as a main component; a lubricant dispersed in the base resin, the lubricant containing a metal soap; and a metal hydroxide in a range from 5 to 60 mass %. Such a resin composition can develop good flexibility and abrasion resistance. That is to say, the electric wire to which the resin composition of the present invention is applied can develop excellent flexibility and abrasion resistance.Type: ApplicationFiled: October 28, 2015Publication date: February 25, 2016Inventor: Shuichi KIMURA
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Publication number: 20150340126Abstract: A thin high-voltage insulted electric wire which comprises a conductor and an insulating layer covering the conductor, said insulating layer comprising both an ethylene-acrylic ester copolymer resin and polyethylene. The insulating layer is made of a composition which exhibits a reciprocal of the product of tensile break strength (?f) (MPa) and tensile break elongation (?), 1/(?f·?), of 4.8×10?2 or less [wherein ?f refers to the tensile break strength of the insulating layer and ? refers to the tensile break elongation thereof], a storage elastic modulus (E) of 520 MPA or more, and a D hardness of 45 or more.Type: ApplicationFiled: July 29, 2015Publication date: November 26, 2015Applicant: YAZAKI CORPORATIONInventor: Shuichi KIMURA
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Publication number: 20140322533Abstract: An electrically insulated wire includes a conductor and an insulating layer having an inner layer which coats an outer circumference of the conductor and an outer layer which coats an outer circumference of the inner layer. The outer layer contains a polyphenylene sulfide resin and the inner layer contains a polyphenylene ether resin and an olefin resin. An average thickness of the outer layer is 50% or less of a thickness of the entire insulating layer.Type: ApplicationFiled: April 24, 2014Publication date: October 30, 2014Applicant: YAZAKI CORPORATIONInventor: Shuichi KIMURA
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Patent number: 8614500Abstract: According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.Type: GrantFiled: March 15, 2011Date of Patent: December 24, 2013Assignee: Kabushiki Kaisha ToshibaInventors: Tsuyoshi Sato, Hiroyasu Kondo, Naoaki Sakurai, Katsuyuki Soeda, Kenichi Ooshiro, Shuichi Kimura
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Patent number: 8490571Abstract: A coater (1) includes: a droplet jet part (4) which ejects droplets of a first solution toward an object to be coated (2) to apply the droplets to the object to be coated (2); and a remoisturizing-drying part (6) which gives a residue of the first solution applied on the object to be coated (2) a solvent capable of dissolving the residue to form an applied body with a second solution containing the residue as a solute, and which dries the formed applied body with the second solution.Type: GrantFiled: February 27, 2008Date of Patent: July 23, 2013Assignees: Kabushiki Kaisha Toshiba, Canon Kabushiki KaishaInventors: Tsuyoshi Sato, Hiroyasu Kondo, Naoaki Sakurai, Junsei Yamabe, Katsuyuki Soeda, Hiroshi Koizumi, Shuichi Kimura, Shizuo Kinoshita
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Publication number: 20130101712Abstract: The present invention provides a method for reducing a level of acrylamide in a processed food by using an ingredient which is highly safe and effective in suppressing acrylamide formation. The present invention provides a method for reducing a level of acrylamide in a processed food, including adding dihydroquercetin to a carbohydrate-containing processed food ingredient or allowing dihydroquercetin to permeate the carbohydrate-containing processed food ingredient prior to or during a heat-treating process.Type: ApplicationFiled: June 21, 2011Publication date: April 25, 2013Applicants: KIMURA, Shuichi, YAMAZAKI SEIPAN KABUSHIKI KAISHA, YOSHIOKA, TeizoInventors: Shuichi Kimura, Amy Tomita, Katsuichi Himata
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Publication number: 20120076619Abstract: A transport mechanism that exchanges a workpiece between a processing chamber and a transport box arranged by mutually opposing openings while maintaining an airtight state, includes a processing chamber cap that freely opens/closes the opening of the processing chamber and also airtightly caps the opening and includes a recess in a side of the transport box, a guide mechanism that guides the processing chamber cap into the processing chamber, a workpiece support portion provided inside the processing chamber, a transport box cap that freely opens/closes the opening of the transport box and also airtightly caps the opening and is airtightly fitted into the recess, and a coupling portion that airtightly couples a front portion around the opening of the processing chamber and a front portion around the opening of the transport box.Type: ApplicationFiled: September 2, 2011Publication date: March 29, 2012Inventors: Masahiko TAKAHASHI, Kenta Fukatsu, Shuichi Kimura, Kazuhiro Teraguchi
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Publication number: 20110204490Abstract: According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.Type: ApplicationFiled: March 15, 2011Publication date: August 25, 2011Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Tsuyoshi SATO, Hiroyasu Kondo, Naoaki Sakurai, Katsuyuki Soeda, Kenichi Ooshiro, Shuichi Kimura
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Patent number: 7977670Abstract: An organic transistor having a source electrode, a drain electrode, a gate electrode, and an organic semiconductor layer, wherein the organic semiconductor layer comprises a compound represented by the following general formula [1] or [3]: General Formula [1] wherein A and B independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted heterocyclic group, or a substituted or unsubstituted aryl group. General Formula [3] wherein R1 to R10 are independently a hydrogen atom, a halogen atom, an alkyl group which has 4 or less carbon atoms and may be substituted with a halogen atom, an alkoxyl group which has 4 or less carbon atoms and may be substituted with a halogen atom, an amino group which has 4 or less carbon atoms and may be substituted with a halogen atom, a nitro group, or a cyano group, and the compound contains at least one halogen atom.Type: GrantFiled: October 12, 2006Date of Patent: July 12, 2011Assignee: Toyo Ink Mfg. Co., Ltd.Inventors: Hiroyuki Yanai, Shuichi Kimura, Kiyoshi Yase, Yuji Yoshida, Masayuki Chikamatsu
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Publication number: 20100203337Abstract: The objective of the present invention is to provide an ethylene-based composite resin composite particle having a small-sized, approximately spherical form, comprising functional filler homogeneously dispersed therein, and being compatible with other resin pellets or components. To attain the above objective, the present invention provides an environmentally friendly method for producing an ethylene-based resin composite particle, comprising: (a) dissolving ethylene-based polymer in organic solvent separable from aqueous phase and dispersing hydrophobic filler in environment-friendly organic solvent to form solution of ethylene-based polymer in the organic solvent; (b) emulsifying the solution obtained in step (a) in non-ionic surfactant-containing aqueous solution; (c) heating the emulsion obtained in step (b) to remove the organic solvent; and (d) recovering a precipitate the ethylene-based resin composite particle containing the hydrophobic filler therein.Type: ApplicationFiled: June 20, 2008Publication date: August 12, 2010Inventors: Shuichi Kimura, Kiyoshi Yagi, Makoto Egashira
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Publication number: 20100112225Abstract: A coater (1) includes: a droplet jet part (4) which ejects droplets of a first solution toward an object to be coated (2) to apply the droplets to the object to be coated (2); and a remoisturizing-drying part (6) which gives a residue of the first solution applied on the object to be coated (2) a solvent capable of dissolving the residue to form an applied body with a second solution containing the residue as a solute, and which dries the formed applied body with the second solution.Type: ApplicationFiled: February 27, 2008Publication date: May 6, 2010Applicants: Kabushiki Kaisha Toshiba, Canon Kabushiki KaishaInventors: Tsuyoshi Sato, Hiroyasu Kondo, Naoaki Sakurai, Junsei Yamabe, Katsuyuki Soeda, Hiroshi Koizumi, Shuichi Kimura, Shizuo Kinoshita
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Patent number: 7709060Abstract: The present invention aims at making it possible to easily fill liquid into a droplet spraying and applying head module, while saving work. The droplet spraying and applying head module includes a droplet spraying and applying head and a tank. The droplet spraying and applying head includes a liquid chamber for containing liquid and a plurality of nozzles communicating with the liquid chamber, and sprays droplets through the nozzles The tank contains liquid to be supplied to the liquid chamber, and communicates with the liquid chamber. The droplet spraying and applying head and the tank are coupled to each other with a coupling member. A revolute joint is interposed between the coupling member and the droplet spraying and applying head.Type: GrantFiled: September 20, 2006Date of Patent: May 4, 2010Assignee: Kabushiki Kaisha ToshibaInventor: Shuichi Kimura
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Publication number: 20100032657Abstract: An organic transistor having a source electrode, a drain electrode, a gate electrode, and an organic semiconductor layer, wherein the organic semiconductor layer comprises a compound represented by the following general formula [1] or [3]: General Formula [1] wherein A and B independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted heterocyclic group, or a substituted or unsubstituted aryl group. General Formula [3] wherein R1 to R10 are independently a hydrogen atom, a halogen atom, an alkyl group which has 4 or less carbon atoms and may be substituted with a halogen atom, an alkoxyl group which has 4 or less carbon atoms and may be substituted with a halogen atom, an amino group which has 4 or less carbon atoms and may be substituted with a halogen atom, a nitro group, or a cyano group, and the compound contains at least one halogen atom.Type: ApplicationFiled: October 12, 2006Publication date: February 11, 2010Applicant: Toyo INk Mfg Co., LtdInventors: Hiroyuki Yanai, Shuichi Kimura, Kiyoshi Yase, Yuji Yoshida, Masayuki Chikamatsu