Patents by Inventor Shuji Machida

Shuji Machida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5403908
    Abstract: The present invention provides an aryl styrene-based polymer of a degree of polymerization of at least 5 having recurring units represented by the general formula ##STR1## in the formula, R.sup.1 to R.sup.5 each denote a hydrogen atom, halogen atom or substituent group containing at least either one kind of a carbon atom, oxygen atom, nitrogen atom, sulfur atom, phosphorus atom, selenium atom, silicon atom and tin atom and at least one of the R.sup.1 to R.sup.5 denotes an aryl group having a hydrogen atom, aryl group having a halogen atom or aryl group having a substituent group containing at least either one kind of a carbon atom, oxygen atom, nitrogen atom, sulfur atom, phosphorus atom, selenium atom, silicon atom and tin atom, of which the stereospecificity is a mainly syndiotactic configuration and a method for the preparation thereof as well as a styrene-based copolymer and a method for the preparation thereof.
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: April 4, 1995
    Assignee: Idemitsu Kosan Company, Limited
    Inventors: Masami Watanabe, Shuji Machida, Satoshi Asahi
  • Patent number: 5391626
    Abstract: There are disclosed a styrenic block copolymer having a reduced viscosity of 0.01 to 20 dl/g (0.05 g/l in 1,2,4-trichlorobenzene at 135.degree. C.) which comprises highly syndiotactic styrenic-polymer segments and 10.sup.-4 to 10 mol % of heteroatom-containing styrenic polymer segments; a resin composition comprising the above styrenic block copolymer and a thermoplastic resin, an inorganic filler or an organic filler; a multi-layer material comprising at least one layer composed of the above styrenic block copolymer or the above resin composition; and a process for producing the above styrenic block copolymer which comprises polymerizing a styrenic monomer in the presence of a specific catalyst and adding a heteroatom-containing styrenic monomer to successively proceed with copolymerization reaction.
    Type: Grant
    Filed: May 20, 1993
    Date of Patent: February 21, 1995
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Shuji Machida, Toshinori Tazaki, Noriyuki Tani
  • Patent number: 5378777
    Abstract: There is disclosed a process for producing a styrenic polymer or copolymer each having syndiotactic configuration which comprises polymerizing a styrenic monomer represented by the general formula (I) ##STR1## such as phenylstyrene and trimethylsilylstyrene, or copolymerizing at least two styrenic monomers of the formula (I) or at least one styrenic monomer of the formula (I) with at least one styrenic monomer other than the styrenic monomer of the formula (I) in the presence of a catalyst comprising as principal ingredients(A) a transition metal compound derived from a group IVB metal of the Periodic Table such as pentamethylcyclopentadienyltrimethyltitanium and (B) a compound producing an ionic complex by the reaction with the above transition metal compound such as tri(n-butyl)ammonium tetra(pentafluorophenyl)borate. The aforementioned process enables efficient production of a styrenic polymer or copolymer excellent in heat resistance and mechanical strength.
    Type: Grant
    Filed: August 23, 1993
    Date of Patent: January 3, 1995
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Masami Watanabe, Shuji Machida
  • Patent number: 5362814
    Abstract: There are disclosed a graft copolymer formed by grafting a styrenic monomer onto a high polymer having double bonds in the side chain to constitute highly syndiotactic polystyrenic chain as the graft component, the graft copolymer having a content of graft component of 0.005 to 99% by weight and a reduced viscosity of 0.01 to 30 dl/g as measured at a concentration of 0.05 g/dl in 1,2,4-trichlorobenzene at 135.degree. C. or a melt index of 0.001 to 500 g/10 minutes as measured at 300.degree. C. under a load of 2.16 kg; a process for efficiently producing the above graft copolymer using a catalyst comprising specific components; and a resin composition comprising the above graft copolymer, a highly syndiotactic styrenic polymer or other thermoplastic resin and, when necessary, an inorganic or organic filler. The above graft copolymer and resin composition are excellent in resistance to heat and chemicals, electrical properties, moldability, compatibility, impact resistance, etc.
    Type: Grant
    Filed: March 3, 1993
    Date of Patent: November 8, 1994
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Shuji Machida, Noriyuki Tani
  • Patent number: 5270420
    Abstract: The present invention relates to a process for producing a stretched molding which comprises stretching a straight chain random copolymer having:a repeating unit (A) represented by the formula:--CH.sub.2 --CH.sub.2 --and a repeating unit (B) represented by the formula: ##STR1## the proportion of said repeating unit (B) being 0.01 to 10 mol %; and an intrinsic viscosity [.eta.] as measured at 135.degree. C. in decalin of at least 5 dl/g.A stretched molding obtained by the present invention has mechanical properties equivalent or superior to those of the conventional super high molecular weight polyethylene stretched molding and is excellent in adhesive properties, dyeability, printability and so on, and thus is greatly useful as an industrial material required to have high strength and further good adhesive properties and printability.
    Type: Grant
    Filed: July 16, 1992
    Date of Patent: December 14, 1993
    Assignee: Idemitsu Kosan Company Limited
    Inventors: Masato Tanaka, Junichi Amano, Shuji Machida, Satoshi Ashai
  • Patent number: 5250629
    Abstract: There is provided a process for producing a styrenic graft copolymer which comprises coplymerizing a styrenic monomer and a styrenic monomer having a hydrocarbon radical with an unsaturated bond in the presence of a catalyst comprising as primary ingredient (A) a transition metal compound and (B) a contact product of an organoaluminum compound and a condensation agent or (C) a compound which produces an ionic complex by reacting with the above-mentioned transition metal compound and subsequently graft polymerizing an ethylenically unsaturated monomer onto the resultant styrenic copolymer.The above-described styrenic graft copolymer is greatly improved in terms of compatibility, adhesivity, coatability and wettability while preserving heat resistance and chemical resistance thereof, and thus effective as a variety of constructional materials and compatibilizing agents.
    Type: Grant
    Filed: December 6, 1991
    Date of Patent: October 5, 1993
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Noriyuki Tani, Shuji Machida, Toshinori Tazaki
  • Patent number: 4956418
    Abstract: An ionomer resin having a weight-average molecular weight of at least 5,000 and containing three specific repeating units as the primary components, said units being arranged randomly and linearly with the total proportion of the two units being 0.001 to 45 mol %, is obtained by copolymerizing ethylene with an unsaturated carboxylic acid in the presence of a Lewis acid, using as a catalyst a chromium compound and a compound of a metal of Groups I to V in the periodic table and permitting a compound of a metal of Group I, II, III, IVA or VIII in the periodic table to react with the resulting copolymer. When an unsaturated carboxylic ester is used, the resulting copolymer is hydrolyzed or thermally decomposed.
    Type: Grant
    Filed: April 6, 1988
    Date of Patent: September 11, 1990
    Assignee: Idemitsu Kosan Company Limited
    Inventors: Masato Tanaka, Shuji Machida