Patents by Inventor Shujiro Watanabe

Shujiro Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflection film and antireflection layer-affixed plastic substrate
    Publication number: 20040005482
    Abstract: A colorless antireflection film excellent in productivity and high in transparency, and an antireflection layer-affixed plastic substrate. An antireflection film and an antireflection layer-affixed plastic substrate having moisture-proofing and gas-barrier properties and being excellent in optical characteristics. An antireflection film comprising a hard coat layer formed on a substrate, and a transparent, high-refractive-index oxide layer and a transparent, low-refractive-index oxide layer alternately laminated on the hard coat layer. The transparent, high-refractive-index oxide layer is compose of a Nb2O5 layer formed by a reactive sputtering method. An antireflection film using a substrate consisting of an organic material, wherein an inorganic, moisture-proofing layer having a refractive index approximate to that of the organic material is formed in contact with one surface of the substrate.
    Type: Application
    Filed: July 21, 2003
    Publication date: January 8, 2004
    Inventors: Tomio Kobayashi, Shujiro Watanabe, Takashi Watanabe, Masaki Kagawa, Haruo Ishizaki, Sung-Kil Lee
  • Methods for producing functional films
    Patent number: 6468403
    Abstract: A method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparent conductive film, wherein intermittent electric power is supplied to the target.
    Type: Grant
    Filed: July 28, 1994
    Date of Patent: October 22, 2002
    Assignee: Asahi Glass Company Ltd.
    Inventors: Junichi Shimizu, Shujiro Watanabe, Satoru Takaki, Hisashi Osaki, Takuji Oyama, Eiichi Ando
  • Method of an apparatus for sputtering
    Patent number: 6110328
    Abstract: A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
    Type: Grant
    Filed: December 5, 1996
    Date of Patent: August 29, 2000
    Assignee: Asahi Glass Company Ltd.
    Inventors: Junichi Shimizu, Shujiro Watanabe, Satoru Takaki, Hisashi Osaki, Takuji Oyama, Eiichi Ando
  • Sputter coating power processing portion
    Patent number: 5660700
    Abstract: A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
    Type: Grant
    Filed: July 28, 1994
    Date of Patent: August 26, 1997
    Assignee: Asahi Glass Company Ltd.
    Inventors: Junichi Shimizu, Shujiro Watanabe, Satoru Takaki, Hisashi Osaki, Takuji Oyama, Eiichi Ando