Patents by Inventor Shunichi KIDOGUCHI

Shunichi KIDOGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10886206
    Abstract: A lead frame for use in an optical semiconductor device has a die pad portion on which an optical semiconductor element is mounted and a lead portion electrically connectable with the optical semiconductor element. A surface on a lead frame substrate forming a part of or an entirety of the die pad portion and the lead portion is laminated with a glossy Ni plating layer having a gloss of 2.0-3.5 and a noble metal plating layer including an Ag plating layer, as an uppermost layer, having a gloss of 1.6 or more.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: January 5, 2021
    Assignee: OHKUCHI MATERIALS CO., LTD.
    Inventor: Shunichi Kidoguchi
  • Publication number: 20200035889
    Abstract: A lead frame for use in an optical semiconductor device has a die pad portion on which an optical semiconductor element is mounted and a lead portion electrically connectable with the optical semiconductor element. A surface on a lead frame substrate forming a part of or an entirety of the die pad portion and the lead portion is laminated with a glossy Ni plating layer having a gloss of 2.0-3.5 and a noble metal plating layer including an Ag plating layer, as an uppermost layer, having a gloss of 1.6 or more.
    Type: Application
    Filed: July 26, 2019
    Publication date: January 30, 2020
    Inventor: Shunichi KIDOGUCHI
  • Patent number: 9870930
    Abstract: Methods for producing a substrate for semiconductor element mounts are provided. A base substrate can be prepared having on a first metal layer, a second metal layer through which a metal layer for instrumentation is hardly diffusible. A patterned resist mask layer on the second metal layer can be formed. A surface of the second metal layer under reprocessing treatment can form a reprocessed surface which can be provided with an organic film that controls adhesion between the metal layer for instrumentation and the reprocessed surface by a liquid agent containing a component that shows the nature of amphoteric surfactant. The metal layer for instrumentation can be formed on the reprocessed surface via the organic film. A semiconductor element mount portion and an electrode terminal portion can be electroformed on the metal layer for instrumentation. The resist mask from the second metal layer of the base substrate may be removed.
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: January 16, 2018
    Assignee: SH MATERIALS CO., LTD.
    Inventors: Kaoru Hishiki, Shunichi Kidoguchi, Hiroki Nakayama
  • Publication number: 20160079091
    Abstract: [Object] To provide a substrate for semiconductor element mount that makes it possible to stably produce, in a highly mass-productive manner, surface-mount type semiconductor devices.
    Type: Application
    Filed: March 11, 2014
    Publication date: March 17, 2016
    Applicant: SH MATERIALS CO., LTD.
    Inventors: Kaoru HISHIKI, Shunichi KIDOGUCHI, Hiroki NAKAYAMA