Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A multilayer deposition multipixel image pickup device comprising a pixel unit, wherein the pixel unit comprises: a plurality of electromagnetic absorption layers being capable of absorbing electromagnetic waves of different wavelengths and performing photoelectric conversion; at least one pair of electrodes that sandwich each of electromagnetic absorption layers; a charge transfer and charge read part; and a plurality of contact parts that couple at least one of the electrodes and the charge transfer and charge read part, wherein a length between outermost surfaces of ones among electrodes of the pixel unit is smaller than a pixel size that is a circle-equivalent diameter of the same area as a first electromagnetic absorption layer of the electromagnetic absorption layers, the first electromagnetic absorption layer having a largest area in said plurality of electromagnetic absorption layers.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A multilayer deposition multipixel image pickup device comprising a pixel unit, wherein the pixel unit comprises: a plurality of electromagnetic absorption layers being capable of absorbing electromagnetic waves of different wavelengths and performing photoelectric conversion; at least one pair of electrodes that sandwich each of electromagnetic absorption layers; a charge transfer and charge read part; and a plurality of contact parts that couple at least one of the electrodes and the charge transfer and charge read part, wherein a length between outermost surfaces of ones among electrodes of the pixel unit is smaller than a pixel size that is a circle-equivalent diameter of the same area as a first electromagnetic absorption layer of the electromagnetic absorption layers, the first electromagnetic absorption layer having a largest area in said plurality of electromagnetic absorption layers.

Abstract: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Abstract: A silver halide photographic material is disclosed, comprising a support having provided thereon at least one silver halide emulsion layer, wherein the silver halide emulsion layer contains, in the dispersion medium phase of the emulsion, one or more kinds of inorganic fine particles having a refractive index the total weight of the fine particles contained in the unit volume of the dispersion medium phase is from 1.0 to 95 wt %, the dispersion medium phase containing the fine particles is substantially transparent to the photosensitive peak wavelength light of the emulsion layer, and the photographic material is exposed and processed in the development process comprising at least a developing step and a fixing step.

Abstract: A silver halide photographic material is disclosed, comprising a support having provided thereon at least one silver halide emulsion layer, wherein the silver halide emulsion layer contains, in the dispersion medium phase of the emulsion, one or more kinds of inorganic fine particles having a refractive index the total weight of the fine particles contained in the unit volume of the dispersion medium phase is from 1.0 to 95 wt %, the dispersion medium phase containing the fine particles is substantially transparent to the photosensitive peak wavelength light of the emulsion layer, and the photographic material is exposed and processed in the development process comprising at least a developing step and a fixing step.

Abstract: A silver halide photographic light-sensitive material has at least one silver halide emulsion layer on a support, wherein the silver halide emulsion layer contains a silver halide emulsion consisting of tabular silver halide grains not containing a cavity extending through two major planes opposing each other and having an average aspect ratio of 1.5 or more, except that 20% or more of the tabular silver halide grains started to be developed containing a cavity extending through the major planes when the silver halide emulsion was developed with a color developer containing a silver halide solvent and a p-phenylenediamine-based color developing agent for 60 sec. A method for forming images includes the step of performing color development for the material for 25 to 90 sec by using a color developing solution containing thiosulfate, methanethiosulfonate, thiocyanate or at least one of the silver halide solvents represented by the formula (A), (B), (C), (D) and (E) each defined in the specification.

Abstract: Disclosed is a silver halide photographic material comprising a support having provided thereon at least one silver halide emulsion layer comprising a substantially surface-latent-image-type silver halide emulsion which comprises hole-injection-type sensitizing dye(s) in an amount of 4.times.10.sup.-4 mol or more per mol of silver in the emulsion and further comprises supersensitizing compound(s), wherein the hole-injection-type sensitizing dye and the supersensitizing compound satisfy the requirements defined herein. The photographic material, thus comprising at least one silver halide emulsion that has been spectrally sensitized with a large amount of sensitizing dyes in a wavelength range longer than 545 nm and has been further sensitized by reduction sensitization, has a much increased sensitivity, while being fogged poorly, and has excellent storage stability.

Abstract: A silver halide photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support is disclosed. The light-sensitive silver halide emulsion layer contains tabular silver halide grains having an average aspect ratio of 2 or more and contains a compound represented by the following formula (I) and/or the oxidized product thereof:X.sub.1 --A--X.sub.2 Formula (I)wherein X.sub.1 and X.sub.2 each represent OR.sub.1 or ##STR1## wherein R.sub.1 represents a hydrogen atom or a group capable of being converted to a hydrogen atom upon hydrolysis, and R.sub.2 and R.sub.3 each represent hydrogen, alkyl, aryl, heterocyclic, heterocyclic sulfonyl, heterocyclic carbonyl, sulfamoyl, or carbamoyl, A represents arylene, and at least one of the groups representative of X.sub.1, X.sub.2, and A is substituted by a group which accelerates adsorption to a silver halide grain.

Abstract: Disclosed herein is a silver halide photographic light-sensitive material comprising at least one layer made of a silver halide emulsion comprising a dispersion medium and silver halide grains dispersed in the dispersion medium. Each of the silver halide grains contains a metal or metal ions other than silver. The emulsion has been chemically sensitized in the presence of a tellurium compound which has a pseudo-first order reaction rate constant k of 1.times.10.sup.-8 to 1.times.10.sup.-0 min.sup.-1. The metal is at least one polyvalent metal selected from the group consisting of Ir, Rh, Pd, Ru, Pt, Os, Fe, Ni and Co. The metal ions are ammonium salt, acetate, nitrate, sulfate, phosphate, hydroxide, or complex salt of the metal. Telluroketones or phosphinetellurides is used as the tellurium compound. It is desirable that the silver halide emulsion is a monodispersed emulsion having a variation coefficient of 22% or less.

Abstract: A silver halide photographic light-sensitive material comprising at least one light-sensitive silver halide emulsion layer formed on a support. The emulsion layer containing at least one silver halide emulsion which comprises regular-crystal grains having a silver halide phase containing silver iodide. The silver halide phase has been formed while iodide ions are rapidly being generated.

Abstract: In a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support, at least one of the silver halide emulsion layers contains a light-sensitive silver halide emulsion, in which tabular grains having an aspect ratio of 2 or more occupy 50% or more of a total projected area of silver halide grains, and a polymer represented by Formula (1) below in an amount of 10.sup.-3 to 10 g per mole of the silver halide. In Formula (1), A represents a repeating unit derived from an ethylenic unsaturated monomer having at least one basic nitrogen atom, and B represents a repeating unit, other than A, derived from an ethylenic unsaturated monomer. x and y each represents a percentage by weight. x represents 0.1 to 100, and y represents 0 to 99.9.

Abstract: A method of manufacturing a silver halide emulsion, wherein reduction sensitization is performed by using at least one of ascorbic acid and derivatives thereof in a process of manufacturing a silver halide emulsion. The invention is further directed to a of manufacturing a silver halide emulsion, wherein reduction sensitization is performed by using at least one of ascorbic acid and derivatives thereof during precipitation of silver halide grains.

Abstract: A silver halide photographic emulsion contains chemically sensitized silver halide grains each of which has at least one structure resulting from the difference in halogen compositions. The grains have been prepared in the presence of an oxidizing agent for silver. A silver halide photographic light-sensitive material has at least one layer of the silver halide emulsion on a support.

Abstract: A silver halide photographic light-sensitive material includes a support and at least one layer of silver halide emulsion formed on the support. The emulsion layer contains silver halide grains which have been subjected both to reduction sensitization while growing and to at least one chemical sensitization selected from the group consisting of gold sensitization, sulfur sensitization, and noble-metal sensitization. Each of the silver halide grains has at least 5 mol % of silver iodide on a surface thereof.