Patents by Inventor Shunsuke Koshihara
Shunsuke Koshihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10732512Abstract: An image processor, a method for generating a pattern using self-organizing lithographic techniques, and a computer program are provided to achieve image processing suitable for addressing a sample generated by patterning using Directed Self-Assembly (DSA), and the processor, method, and computer program are characterized in that a template for addressing is prepared on the basis of guide pattern data used for patterning by DSA. The above configuration makes it possible to provide an addressing pattern suitable for visual field positioning in measuring or inspecting a pattern formed through the patterning process using DSA.Type: GrantFiled: February 23, 2018Date of Patent: August 4, 2020Assignee: Hitachi High-Tech CorporationInventors: Takumichi Sutani, Miki Isawa, Shunsuke Koshihara, Akiyuki Sugiyama
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Publication number: 20180181009Abstract: An image processor, a method for generating a pattern using self-organizing lithographic techniques, and a computer program are provided to achieve image processing suitable for addressing a sample generated by patterning using Directed Self-Assembly (DSA), and the processor, method, and computer program are characterized in that a template for addressing is prepared on the basis of guide pattern data used for patterning by DSA. The above configuration makes it possible to provide an addressing pattern suitable for visual field positioning in measuring or inspecting a pattern formed through the patterning process using DSA.Type: ApplicationFiled: February 23, 2018Publication date: June 28, 2018Inventors: Takumichi SUTANI, Miki ISAWA, Shunsuke KOSHIHARA, Akiyuki SUGIYAMA
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Publication number: 20150277237Abstract: An image processor, a method for generating a pattern using self-organizing lithographic techniques, and a computer program are provided to achieve image processing suitable for addressing a sample generated by patterning using Directed Self-Assembly (DSA), and the processor, method, and computer program are characterized in that a template for addressing is prepared on the basis of guide pattern data used for patterning by DSA. The above configuration makes it possible to provide an addressing pattern suitable for visual field positioning in measuring or inspecting a pattern formed through the patterning process using DSA.Type: ApplicationFiled: November 14, 2013Publication date: October 1, 2015Inventors: Takumichi Sutani, Miki Isawa, Shunsuke Koshihara, Akiyuki Sugiyama
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Patent number: 8581187Abstract: An amount of displacement and an overlapping area between first and second patterns formed through a double patterning lithography process can be determined. The first pattern is formed by a first exposure while the second pattern is formed by a later second exposure. A first image of the first pattern is formed prior to the formation of the second pattern. A second image of both patterns is formed after the formation of the second pattern. A two-step matching process between combined information and images of the first and second patterns is performed. The combined information includes information regarding the first pattern, as formed, combined with design information of the second pattern. Based on a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.Type: GrantFiled: September 16, 2009Date of Patent: November 12, 2013Assignee: Hitachi High-Technologies CorporationInventors: Mihoko Kijima, Shunsuke Koshihara, Hitoshi Komuro, Ryoichi Matsuoka
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Patent number: 8552371Abstract: There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.Type: GrantFiled: November 2, 2010Date of Patent: October 8, 2013Assignee: Hitachi High-Technologies CorporationInventors: Shigeki Sukegawa, Shunsuke Koshihara, Kyoungmo Yang
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Patent number: 8180140Abstract: To create a template for use in image recognition based on design data, luminance information is set for each area in the template based on the information regarding the region defined by the template. The luminance information may be set based on material information, pattern size information of a pattern arranged in the region defined by the template, and layer information of the region defined by the template. Alternatively, luminance information may be set based on material information, setup conditions of the scanning electron microscope, and pattern outline information of a pattern arranged in the region defined by the template.Type: GrantFiled: March 6, 2009Date of Patent: May 15, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kyoungmo Yang, Makoto Nishihara, Shunsuke Koshihara
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Publication number: 20110139982Abstract: An object of the present invention is to provide a method that can properly carry out the evaluation of a displacement and an overlapping area between first and second patterns formed through double patterning and a device therefor. To accomplish the above object, a method and a device are provided that execute a two-step matching between combined information having information concerning the first pattern combined with design information of the second pattern formed through a second exposure of double patterning and images displaying the first and second patterns, and on the basis of a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.Type: ApplicationFiled: September 16, 2009Publication date: June 16, 2011Inventors: Mihoko Kijima, Shunsuke Koshihara, Hitoshi Komuro, Ryoichi Matsuoka
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Publication number: 20110096309Abstract: A method and system for evaluating a lithographic pattern obtained using multiple-patterning lithographic processing are presented. In one aspect, the method includes aligning a target design with a lithographic pattern. The target design may comprise a first design and a second design. The method further comprises identifying in the lithographic pattern a stitching region based on a region of overlap between the first design and the second design. The method further comprises determining for the identified stitching region whether a predetermined criterion is fulfilled. In some embodiments, determining whether a predetermined criterion is fulfilled may comprise determining a line or trench minimum width. Alternately or additionally, determining whether a predetermined criterion is fulfilled may comprise determining a stitching metric for the identified stitching region, and evaluating whether or not the stitching metric fulfills the predetermined criterion.Type: ApplicationFiled: October 27, 2010Publication date: April 28, 2011Applicants: IMEC, Hitachi High-Technologies CorporationInventors: Vincent Jean-Marie Pierre Paul Wiaux, Ryoichi Matsuoka, Shunsuke Koshihara, Hideo Sakai
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Publication number: 20110042568Abstract: There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.Type: ApplicationFiled: November 2, 2010Publication date: February 24, 2011Inventors: SHIGEKI SUKEGAWA, Shunsuke Koshihara, Kyoungmo Yang
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Patent number: 7834316Abstract: There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.Type: GrantFiled: March 6, 2008Date of Patent: November 16, 2010Assignee: Hitachi High-Technologies CorporationInventors: Shigeki Sukegawa, Shunsuke Koshihara, Kyoungmo Yang
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Publication number: 20090304286Abstract: An object of the present invention is to maintain the ease with which a template is created based on design data without acquiring an actual image, which is achieved by providing the template with equivalent information contained by a template used for image recognition that involves same-type image comparison, and to improve image recognition performance by increasing the matching rate between a template and an actual image. To achieve the above object, the present invention provides a method, apparatus, and program for creating based on design data a template that is used for image recognition, wherein luminance information is set for each area in the template based on the material information of the region defined by the template.Type: ApplicationFiled: March 6, 2009Publication date: December 10, 2009Inventors: Kyoungmo Yang, Makoto Nishihara, Shunsuke Koshihara
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Patent number: 7521695Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: GrantFiled: April 11, 2007Date of Patent: April 21, 2009Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryulchirou Tamochi, Yayol Hosoya, Hidetoshi Morokuma
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Publication number: 20080217529Abstract: There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.Type: ApplicationFiled: March 6, 2008Publication date: September 11, 2008Inventors: Shigeki SUKEGAWA, Shunsuke Koshihara, Kyoungmo Yang
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Publication number: 20070194234Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: ApplicationFiled: April 11, 2007Publication date: August 23, 2007Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryulchirou Tamochi, Yayol Hosoya, Hidetoshi Morokuma
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Patent number: 7217925Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: GrantFiled: December 22, 2005Date of Patent: May 15, 2007Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
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Publication number: 20060102840Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: ApplicationFiled: December 22, 2005Publication date: May 18, 2006Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
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Patent number: 7009178Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: GrantFiled: April 11, 2005Date of Patent: March 7, 2006Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
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Publication number: 20050178965Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: ApplicationFiled: April 11, 2005Publication date: August 18, 2005Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
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Patent number: 6897445Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: GrantFiled: November 12, 2003Date of Patent: May 24, 2005Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
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Publication number: 20040094713Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.Type: ApplicationFiled: November 12, 2003Publication date: May 20, 2004Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma