Abstract: A semiconductor manufacturing apparatus having a guard system, an interlocking system operable in response to loss of function in a portion of the guard system, to stop a corresponding operation in the apparatus, and an interlock disabling switch for disabling the interlocking through the interlocking system. The structure accomplishes prompt disabling of the interlocking, to improve the efficiency of a maintenance or service operation. A safeguard can be achieved without a decrease of throughput.

Abstract: A fabrication apparatus including an emergency stop circuit which is an emergency stop switch has a first electromagnetic switch for supplying and shutting off power to the apparatus and a second electromagnetic switch for controlling power supply to an electromagnetic coil of the first electromagnetic switch. Power is supplied to the electromagnetic coil of the first electromagnetic switch from the primary side of the first electromagnetic switch via a contact of the second electromagnetic switch. An uninterruptible power source supplies power to an electromagnetic coil of the second electromagnetic switch via the emergency stop circuit. This emergency stop switch is inserted midway along a power line to the electromagnetic coil of the second electromagnetic switch. This allows a safe emergency stop of the fabrication apparatus for semiconductors and the like.

Abstract: An illumination device includes a radiation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

Abstract: An illumination device includes a raidation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

Abstract: A wafer processing apparatus, comprising a wafer processing station for processing a wafer, a key input portion for inputting wafer processing instructions into the wafer processing station, and wherein at least one of a portion for accommodating a wafer carrier for carrying the wafer, a mechanism for taking the wafer out of the wafer carrier and putting it back into the wafer carrier, wafer alignment station for aligning the wafer and a wafer observing station for allowing an operator to observe the wafer, is disposed at a front side of the apparatus to which the operator faces when actuating the key input portion.

Abstract: An apparatus includes a plurality of cassettes each for containing a mask or reticle having thereon an integrated circuit pattern, each cassette having a holder for holding the mask or reticle while covering the lower surface thereof, the apparatus further including a carrier for storing therein the cassettes in a layered fashion, a fork for selectively taking out one of the holders from the carrier and an elevator for feeding the take-out holder to a separation station so that the mask or reticle is automatically taken out from, fed from and moved back into the carrier.

Abstract: A wafer chuck for releasably holding a wafer, includes a base member having an upper surface for carrying and holding thereon the wafer, a lift mechanism operative on the wafer when it rests on the base member to move the wafer relative to the base member in a direction away from the base member, the lift mechanism having an operative member extending substantially in a direction to a radially inward position from a radially outward position of the base member, the operative member having an end portion movable, relative to the base member, between a first position at which it is retracted from the upper surface of the base member and a second position at which it is protrudent from the upper surface of the base member so as to engage with the wafer to move the same relative to the base member, and driving means for moving, relative to the base member, the end portion of the operative member between the first and second positions.

Abstract: An apparatus for irradiating a first object so as to achieve at least one of alignment between the first object and a second object and transfer of a pattern of the first object onto the second object. The apparatus includes an optical device disposed in the path of the irradiating beam to correct or prevent any change in the optical path length depending on the thickness of the first object.