Patents by Inventor Shuzo Hebiguchi

Shuzo Hebiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming fluorine-doped low-dielectric-constant insulating film
    Patent number: 7037855
    Abstract: A method of forming low-dielectric-constant silicon oxide films by capacitive-coupled plasma CVD comprises: introducing a processing gas comprising SiH4 as a silicon source gas, SiF4 as a fluorine source gas, and CO2 as an oxidizing gas to a reaction chamber at a ratio of (SiH4+SiF4)/CO2 in the range of 0.02 to 0.2 and at a total pressure of 250 Pa to 350 Pa; applying first RF power at a frequency of 10 MHz to 30 MHz and second RF power at a frequency of 400 kHz to 500 kHz by overlaying the two RF powers to generate a plasma reaction field within the reaction chamber; and controlling a flow of the respective gases and the respective RF power outputs.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: May 2, 2006
    Assignee: ASM Japan K.K.
    Inventors: Naoto Tsuji, Yozo Ikedo, Ryu Nakano, Shuzo Hebiguchi
  • METHOD OF FORMING FLUORINE-DOPED LOW-DIELECTRIC-CONSTANT INSULATING FILM
    Publication number: 20060046519
    Abstract: A method of forming low-dielectric-constant silicon oxide films by capacitive-coupled plasma CVD comprises: introducing a processing gas comprising SiH4 as a silicon source gas, SiF4 as a fluorine source gas, and CO2 as an oxidizing gas to a reaction chamber at a ratio of (SiH4+SiF4)/CO2 in the range of 0.02 to 0.2 and at a total pressure of 250 Pa to 350 Pa; applying first RF power at a frequency of 10 MHz to 30 MHz and second RF power at a frequency of 400 kHz to 500 kHz by overlaying the two RF powers to generate a plasma reaction field within the reaction chamber; and controlling a flow of the respective gases and the respective RF power outputs.
    Type: Application
    Filed: August 31, 2004
    Publication date: March 2, 2006
    Applicant: ASM JAPAN K.K.
    Inventors: Naoto Tsuji, Yozo Ikedo, Ryu Nakano, Shuzo Hebiguchi
  • Shower plate
    Patent number: D665055
    Type: Grant
    Filed: January 24, 2012
    Date of Patent: August 7, 2012
    Assignee: ASM IP Holding B.V.
    Inventors: Ippei Yanagisawa, Shuzo Hebiguchi, Kei Hara