Patents by Inventor Shuzo Toida

Shuzo Toida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6433122
    Abstract: A method for producing organopolysiloxane comprising (A) polymerizing or increasing the viscosity of straight-chain or cyclic organo(poly)siloxane using an acid-active solid catalyst, (B) adding at least one zeolite solid adsorbent, and (C) thereafter filtering off the adsorbent.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: August 13, 2002
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Shuzo Toida, Yohkichi Yamamoto, Naoji Kawamura
  • Patent number: 4774346
    Abstract: A method for purifying impure hexamethyldisiloxane comprising as a major portion hexamethyldisiloxane and as a minor portion a mixture of low-boiling organic solvents, other organosilicon compounds, and odor-producing materials is described. The method comprises (A) first, treating the impure hexamethyldisiloxane with a condensation catalyst to convert the organosilicon compounds to additional hexamethyldisiloxane; (B) second, washing the treated impure hexamethyldisiloxane with water; (C) third, separating a water phase from the washed impure hexamethyldisiloxane; (D) fourth, distilling the washed impure hexamethyldisiloxane to yield hexamethyldisiloxane of enhanced purity; (E) fifth, contacting the hexamethyldisiloxane of enhanced purity with acid clay at a temperature of greater than about 50.degree. C.
    Type: Grant
    Filed: January 26, 1988
    Date of Patent: September 27, 1988
    Assignee: Toray Silicone Co., Ltd.
    Inventors: Takeshi Imai, Masahiko Suzuki, Ikuzo Takahashi, Shuzo Toida
  • Patent number: 4697027
    Abstract: A method for purifying alkoxysilane with the general formula, R.sub.m Si(OR.sup.1).sub.4-m. The method significantly lowers the level of non-hydrolyzable chlorine-based impurities, as well as the level of hydrolyzable chlorine-based impurities. The method comprises: (i) heating the alkoxysilane in the presence of a treating agent selected from a group which consists of acid clays and metal halides; (ii) contacting the alkoxysilane with a neutralization agent; and (iii) separating the alkoxysilane from the unused neutralization agent and by-products of neutralization.
    Type: Grant
    Filed: October 27, 1986
    Date of Patent: September 29, 1987
    Assignee: Toray Silicon Co., Ltd.
    Inventors: Junpei Sugihara, Takeshi Imai, Shuzo Toida, Ikuzo Takahashi