Patents by Inventor Siddharth Fernandes

Siddharth Fernandes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9011983
    Abstract: A process for producing polymeric films by applying a liquid composition onto a surface of a substrate under vacuum conditions in a vacuum chamber. The composition has a first component which is polymerizable or crosslinkable in the presence of a sufficient amount of an acid; and a cationic photoinitiator which generates an acid upon exposure to ultraviolet radiation, electron beam radiation or both to cause polymerizing or crosslinking of the first component. A gas which emits ultraviolet radiation upon exposure to electron beam radiation is introduced into the vacuum chamber. The composition and the gas are exposed to electron beam radiation to cause the cationic photoinitiator to generate an amount of an acid to cause polymerizing or crosslinking of the first component. The composition is exposed to both electron beam radiation and gas-generated ultraviolet radiation and cured.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: April 21, 2015
    Assignees: IdeOn LLC, Metallized Surface Technologies, LLC
    Inventors: Mikhail Laksin, Wolfgang Decker, Siddharth Fernandes
  • Publication number: 20130029057
    Abstract: A process for producing polymeric films by applying a liquid composition onto a surface of a substrate under vacuum conditions in a vacuum chamber. The composition has a first component which is polymerizable or crosslinkable in the presence of a sufficient amount of an acid; and a cationic photoinitiator which generates an acid upon exposure to ultraviolet radiation, electron beam radiation or both to cause polymerizing or crosslinking of the first component. A gas which emits ultraviolet radiation upon exposure to electron beam radiation is introduced into the vacuum chamber. The composition and the gas are exposed to electron beam radiation to cause the cationic photoinitiator to generate an amount of an acid to cause polymerizing or crosslinking of the first component. The composition is exposed to both electron beam radiation and gas-generated ultraviolet radiation and cured.
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Inventors: Mikhail Laksin, Wolfgang Decker, Siddharth Fernandes