Patents by Inventor Sijbe A. H. Van Der Lei

Sijbe A. H. Van Der Lei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus
    Patent number: 6348303
    Abstract: A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan. Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminum, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: February 19, 2002
    Assignee: ASM Lithography B.V.
    Inventors: Sijbe A. H. Van Der Lei, Rard Willem De Leeuw, Gerrit Maarten Bonnema, Wilhelmus Maria Corbeij