Patents by Inventor Simon Gosselin
Simon Gosselin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240166441Abstract: An automated storage and retrieval system for managing the contents of a garment-on-hanger (GOH) storage area includes an autonomous “transporter” that is configured to transport GOH items between the processing area and the storage area and an automated “forager” that can hold and manipulate a GOH item to place it in, or retrieve it from, a storage location. The transporter and forager work together to automatically store and retrieve GOH items, riding on a system of rails and moving between vertical levels on an elevator. Standardized “mother hooks” are used from which the GOH items hang, which may be held by a picker arm of the forager, and inserted into slots in storage areas and on the transporter. Blades on the forager may be inserted to either side of a GOH item to allow adjacent GOH items to be displaced during manipulation.Type: ApplicationFiled: March 22, 2022Publication date: May 23, 2024Inventors: Gabriel ST-JEAN, Dany BOUCHARD, Charles D’AMOURS-LAVOIE, Christophe BOISCLAIR, Dominic GOSSELIN, Francis FORTIER, Guillaume PAQUET, Simon LAVIGNE, Pierre GIBEAULT, Jess WALLACE
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Publication number: 20230317424Abstract: A component for use in a plasma processing chamber is provided. The component comprises a component body. A plasma facing surface of the component body is adapted to face a plasma in the plasma processing chamber. The plasma facing surface comprises 1) a layer of silicon doped with a dopant wherein the dopant is at least one of carbon, boron, tungsten, molybdenum, and tantalum, wherein the dopant has a concentration that ranges from 0.01% to 50% by mole percentage, or 2) a layer of carbon doped with a dopant wherein the dopant is at least one of silicon, boron, tungsten, molybdenum, and tantalum, wherein the dopant has a concentration that ranges from 0.01% to 50% by mole percentage, or 3) a layer consisting essentially of boron, or 4) a layer consisting essentially of tantalum.Type: ApplicationFiled: August 17, 2021Publication date: October 5, 2023Inventors: Harmeet SINGH, Robin KOSHY, Adrian RADOCEA, Lin XU, Justin Charles CANNIFF, Simon GOSSELIN
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Patent number: 9927798Abstract: Integration of semiconductor tool maintenance operations on mobile devices to allow technicians to more accurately perform semiconductor tool maintenance and to allow more accurate analysis of data to improve maintenance procedures to be more repeatable, consistent, and efficient. Remote control of maintenance operations for the semiconductor tool via a portable electronic device decreases the time required to service semiconductor tools and thus increase throughput.Type: GrantFiled: October 6, 2015Date of Patent: March 27, 2018Assignee: LAM RESEARCH CORPORATIONInventors: Roger Patrick, Chung Ho Huang, Simon Gosselin, Vincent Wong, Ronald Ramnarine, Neal K. Newton, Mukesh Shah, Kerwin Hoversten, Robert Ahrens, Marco Mora
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Publication number: 20160104128Abstract: Integration of semiconductor tool maintenance operations on mobile devices enables technicians to more accurately perform semiconductor tool maintenance, and allows for more accurate collection and analysis of data so that maintenance procedures and resulting tool operations can be more repeatable, consistent and efficient.Type: ApplicationFiled: October 6, 2015Publication date: April 14, 2016Inventors: Simon Gosselin, Vincent Wong, Ronald Ramnarine, Neal K. Newton, Mukesh Shah, Kerwin Hoversten, Bob Ahrens, Marco Mora, Roger Patrick
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Publication number: 20160103445Abstract: Integration of semiconductor tool maintenance operations on mobile devices to allow technicians to more accurately perform semiconductor tool maintenance and to allow more accurate analysis of data to improve maintenance procedures to be more repeatable, consistent, and efficient. Remote control of maintenance operations for the semiconductor tool via a portable electronic device decreases the time required to service semiconductor tools and thus increase throughput.Type: ApplicationFiled: October 6, 2015Publication date: April 14, 2016Inventors: Roger Patrick, Chung Ho Huang, Simon Gosselin, Vincent Wong, Ronald Ramnarine, Neal K. Newton, Mukesh Shah, Kerwin Hoversten, Bob Ahrens, Marco Mora
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Patent number: 9017513Abstract: A plasma processing chamber is provided comprising one or more process gas inlets, one or more exhaust gas outlets, plasma generating hardware configured to generate a process gas plasma in a plasma processing portion of the plasma processing chamber, a wafer processing stage positioned in the plasma processing chamber, and a plasma monitoring probe assembly. The plasma monitoring probe assembly comprises an electrically conductive probe and an insulator sleeve assembly positioned about the electrically conductive probe. The insulator sleeve assembly comprises a plasma-side sleeve portion and a subterranean sleeve portion positioned about distinct portions of a longitudinal probe axis of the electrically conductive probe of the probe assembly.Type: GrantFiled: November 7, 2012Date of Patent: April 28, 2015Assignee: Lam Research CorporationInventor: Simon Gosselin
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Publication number: 20140124138Abstract: A plasma processing chamber is provided comprising one or more process gas inlets, one or more exhaust gas outlets, plasma generating hardware configured to generate a process gas plasma in a plasma processing portion of the plasma processing chamber, a wafer processing stage positioned in the plasma processing chamber, and a plasma monitoring probe assembly. The plasma monitoring probe assembly comprises an electrically conductive probe and an insulator sleeve assembly positioned about the electrically conductive probe. The insulator sleeve assembly comprises a plasma-side sleeve portion and a subterranean sleeve portion positioned about distinct portions of a longitudinal probe axis of the electrically conductive probe of the probe assembly.Type: ApplicationFiled: November 7, 2012Publication date: May 8, 2014Applicant: LAM RESEARCH CORPORATIONInventor: Simon Gosselin
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Patent number: 8536071Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.Type: GrantFiled: August 21, 2012Date of Patent: September 17, 2013Assignee: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin, Sandy Chao
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Patent number: 8419959Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.Type: GrantFiled: September 17, 2010Date of Patent: April 16, 2013Assignee: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng., Sandy Chao, Anthony de la Llera, Pratik Mankidy
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Publication number: 20130034967Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.Type: ApplicationFiled: August 21, 2012Publication date: February 7, 2013Inventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng., Sandy Chao
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Patent number: 8272346Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.Type: GrantFiled: April 10, 2009Date of Patent: September 25, 2012Assignee: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng, Sandy Chao
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Publication number: 20110070740Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.Type: ApplicationFiled: September 17, 2010Publication date: March 24, 2011Applicant: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng., Sandy Chao, Anthony de la Llera, Pratik Mankidy
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Publication number: 20100261354Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.Type: ApplicationFiled: April 10, 2009Publication date: October 14, 2010Applicant: Lam Research CorporationInventors: GREGORY R. BETTENCOURT, Gautam Bhattacharyya, Simon Gosselin Eng, Sandy Chao