Patents by Inventor Simon I. Selitser

Simon I. Selitser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Atmospheric pressure inductive plasma apparatus
    Patent number: 6686558
    Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: February 3, 2004
    Assignee: TimeDomain CVD, Inc.
    Inventor: Simon I. Selitser
  • Atmospheric pressure inductive plasma apparatus
    Publication number: 20010008229
    Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.
    Type: Application
    Filed: January 23, 2001
    Publication date: July 19, 2001
    Applicant: TimeDomain CVD, Inc.
    Inventor: Simon I. Selitser
  • Atmospheric pressure inductive plasma apparatus
    Patent number: 6218640
    Abstract: An inductive plasma torch operating at atmospheric pressure is used for wafer or glass substrate processing. Said torch employs a linear type of plasma confinement. This linear torch is particularly suitable for photoresist etching and processes in which it has the advantages of high chemical isotropic etch rate and low plasma damage.
    Type: Grant
    Filed: July 19, 1999
    Date of Patent: April 17, 2001
    Assignee: TimeDomain CVD, Inc.
    Inventor: Simon I. Selitser