Abstract: The present invention relates to a cliché, a manufacturing method of a cliché, and a pattern formed by a roll printing method to prevent deteriorations due to sagging and a disconnection of an end portion or a rounded angular portion, the cliché having a surface formed with a groove, wherein the end portion of the groove has a narrower width than the width of the center portion of the groove.

Abstract: A method of forming a pattern and a manufacturing method of a liquid crystal display includes forming the pattern with a thin thickness by coating a pattern material on a printing roll using a nozzle, removing a surplus portion of the pattern material from the printing roll by using a plate, and transferring the pattern material remaining on the printing roll to a substrate to form the pattern.

Abstract: Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.

Abstract: Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.

Abstract: In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.

Abstract: Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.

Abstract: Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.