Patents by Inventor Sinichi Hasegawa

Sinichi Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4792693
    Abstract: In a step-and-repeat exposure method, an alignment error does not influence accuracy of a shot arrangement on a photosensitive substrate. An amount corresponding to an alignment error of a reticle with respect to the apparatus is detected, a position as an origin of an x-y stage for moving a photosensitive substrate is corrected by the detected amount, and a step-and-repeat exposure is then performed using the reticle.
    Type: Grant
    Filed: February 10, 1988
    Date of Patent: December 20, 1988
    Assignee: Nikon Corporation
    Inventors: Atsushi Yamaguchi, Sinichi Hasegawa