Abstract: An apparatus to detect a liquid in a wafer processing device is provided. The apparatus includes a first conductor proximate the wafer processing device. The apparatus includes a second conductor spaced apart from the first conductor and proximate the wafer processing device. The apparatus includes a liquid absorption material surrounding the first conductor and the second conductor. The apparatus includes a current source coupled to the first conductor. The apparatus includes a current detector coupled to at least one of the first conductor or the second conductor. The liquid absorption material establishes a conductive pathway between the first conductor and the second conductor when the liquid absorption material absorbs the liquid in the wafer processing device. A current is generated, by the current source, in at least one of the first conductor or the second conductor through the conductive pathway. The current detector detects the current.