Patents by Inventor Son Nguyen Kim

Son Nguyen Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6407158
    Abstract: The present invention relates to a water-soluble or water-dispersible polymeric salt, to a cosmetic or pharmacuetical composition which comprises at least one such polymeric salt, and to the use of the polymeric salts.
    Type: Grant
    Filed: March 20, 2000
    Date of Patent: June 18, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hössel
  • Publication number: 20020064731
    Abstract: A radiation sensitive mixture essentially consists of
    Type: Application
    Filed: January 28, 2002
    Publication date: May 30, 2002
    Inventor: Son Nguyen Kim
  • Patent number: 6372876
    Abstract: The use of polyurethanes which are—soluble or dispersible in water and are composed of a) at least one compound which contains two or more active hydrogens per molecule, b) at least one diol containing acid groups or salt groups and c) at least one diisocyanate with a glass transition temperature of at least 15° C. and acid numbers of from 12 to 150 or the salts of these polyurethanes as aids in cosmetic and pharmaceutical compositions, and of polyurethanes which are soluble or dispersible in water and which contain (a) at least 5 mol % of a polycondensate of lactic acid and of a polyol of the formula where Y is a radical derived from a dihydric to tetrahydric alcohol n is 1-50 and m is 1-4 as copolymerized units.
    Type: Grant
    Filed: January 24, 1995
    Date of Patent: April 16, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Karin Sperling-Vietmeier
  • Patent number: 6368583
    Abstract: The present invention relates to hair treatment compositions comprising a hairsetting polymer together with a salt of the formula I [A—(X)n]n−.[HmB]m+ where A, X, B, n and m are as defined in the description. The novel hair treatment compositions possess improved ease of washing out, smoothness and transparency and can be formulated with a reduced VOC content.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: April 9, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Karin Sperling
  • Patent number: 6365697
    Abstract: The present invention relates to water-soluble or water-dispersible polyurethanes of a water-dispersible polyurethane prepolymer having terminal isocyanate groups and a primary or secondary amine having at least one ionogenic or ionic group, and to the salts thereof. The novel polyurethanes can be used as auxiliaries in cosmetology and pharmacy and, in particular, as hair lacquers having enhanced ease of washoff.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: April 2, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Karin Sperling
  • Publication number: 20020032276
    Abstract: The present invention relates to crosslinked, water-soluble or water-dispersible polyurethanes of
    Type: Application
    Filed: April 25, 2001
    Publication date: March 14, 2002
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hossel, Volker Schehlmann
  • Patent number: 6335003
    Abstract: Cationic polyurethanes and polyureas formed from (a) at least one diisocyanate or reaction product thereof with one or more compounds containing two or more active hydrogen atoms per molecule, and (b) at least one diol, primary or secondary amino alcohol, primary or secondary diamine or primary or secondary triamine each with one or more tertiary, quaternary or protonated tertiary amine nitrogen atoms and having a glass transition temperature of at least 25 ° C. and an amine number of from 50 to 200, based on the non-quaternized or -protonated compounds, or other salts of these polyurethanes and polyureas, are useful as ingredients of cosmetic and pharmaceutical preparations.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: January 1, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Karin Sperling-Vietmeier, Peter Hoessel
  • Patent number: 6329472
    Abstract: Water-soluble or water-dispersible graft copolymers in which a tert-butyl acrylate and a polymerizable carboxylic acid are grafted onto a polyvinyllactam, to their preparation and to their use, especially in the form of cosmetic preparations, particularly as hair-setting compositions.
    Type: Grant
    Filed: November 16, 1999
    Date of Patent: December 11, 2001
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hössel, Volker Schehlmann
  • Patent number: 6277386
    Abstract: A cosmetic or pharmaceutical composition which comprises at least one water-soluble or water-dispersible polyurethane of a) at least one polymer having two active hydrogen atoms per molecule which is selected from polytetrahydrofurans, polysiloxanes and mixtures thereof, b) at least one polyesterdiol, c) at least one compound comprising two active hydrogens per molecule and having a molecular weight of 56-300, d) at least one compound which contains two active hydrogen atoms and at least one anionogenic or anionic group per molecule, e) at least one diisocyanate, or a salt thereof, said polyurethane not comprising any unit which originates from a primary or secondary amine having an ionogenic or ionic group.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: August 21, 2001
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Wilma M Dausch, Volker Schehlmann
  • Patent number: 6262176
    Abstract: The present invention relates to crosslinked, water-soluble or water-dispersible polyurethanes of A) at least one water-soluble or water-dispersible polyurethane prepolymer having terminal isocyanate groups of a) at least one compound having a molecular weight in the range from 56 to 300 which contains two active hydrogen atoms per molecule, b) at least one polymer containing two active hydrogen atoms per molecule, c) at least one compound which contains two active hydrogen atoms and at least one ionogenic or ionic group per molecule, d) at least one diisocyanate, B) at least one polymer containing groups which are reactive toward isocyanate groups, chosen from hydroxyl, and primary and secondary amino and/or carboxyl groups, or the salts thereof.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: July 17, 2001
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hössel, Volker Schehlmann
  • Patent number: 6123963
    Abstract: The use of water-soluble or water-dispersible polyurethanes which consists ofa) 0.1-30% by weight of at least one polyol,b) 20-45% by weight of at least one polyetherpolyol,c) 10-45% by weight of at least one diamine comprising an ionic group,d) 30-50% by weight of at least one polyisocyanate with or withoute) further additives as coatings or binders for pharmaceutical presentations.
    Type: Grant
    Filed: October 8, 1998
    Date of Patent: September 26, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Karl Kolter
  • Patent number: 6103858
    Abstract: The aqueous dispersion of a biodegradable aliphatic-aromatic polyester is useful as a binder for nonwovens and for coating paper.
    Type: Grant
    Filed: March 17, 1999
    Date of Patent: August 15, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Motonori Yamamoto, Volker Warzelhan, Ursula Seeliger, Son Nguyen Kim, Karl-Heinz Schumacher, Rainer Hummerich, Dieter Bernhard Beimborn, Udo Pagga
  • Patent number: 6051370
    Abstract: A radiation-sensitive mixture suitable for producing relief structures consists essentially of(a) a water-insoluble but alkali-soluble binder or binder mixture and(b) a compound which forms a strong acid on irradiation, wherein component (a) is a phenolic resin whose phenolic hydroxyl groups have been replaced to a certain extent by groups (I) ##STR1## where R.sup.1 is alkyl, andR.sup.2 and R.sup.3 are each hydrogen or alkyl, or R.sup.1 forms a ring with R.sup.2.
    Type: Grant
    Filed: January 9, 1995
    Date of Patent: April 18, 2000
    Assignee: BASF Aktiengesellschaft
    Inventor: Son Nguyen Kim
  • Patent number: 5961965
    Abstract: A description is given of water-soluble or water-dispersible polyaspartic acid derivatives, their preparation and their use in cosmetology, especially in hair cosmetology.
    Type: Grant
    Filed: July 1, 1997
    Date of Patent: October 5, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hossel, Matthias Kroner
  • Patent number: 5925728
    Abstract: A description is given of water-soluble or water-dispersible polyaspartic acid derivatives, their preparation and their use in cosmetology, especially in hair cosmetology.
    Type: Grant
    Filed: July 1, 1997
    Date of Patent: July 20, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Axel Sanner, Peter Hossel, Matthias Kroner
  • Patent number: 5880252
    Abstract: Pyrrolidonyl-containing polyesters and polyamides I to III ##STR1## where R, X, A and Z are defined herein, are suitable as film formers and conditioners in hair-cosmetic formulations, for stabilizing hydrogen-peroxide in aqueous solution, for complexing iodine, as tablet binders and as a constituent of film coatings in pharmaceutical preparations, for enzyme and bleach stabilization in detergent formulations, as an auxiliary in the production and finishing of textiles, as a solubilizer and protective colloid in the preparation and stabilization of polymer dispersions, and as an adhesive raw material.
    Type: Grant
    Filed: March 22, 1996
    Date of Patent: March 9, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen Kim, Jorg Breitenbach, Axel Sanner, Peter Hossel, Siegfried Lang
  • Patent number: 5035979
    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,where the organic compound (c) is a malonic acid ester.This radiation-sensitive mixture may be used to prepare photoresists.
    Type: Grant
    Filed: October 17, 1989
    Date of Patent: July 30, 1991
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen-Kim, Gerhard Hoffmann, Reinhold Schwalm
  • Patent number: 5034305
    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,wherein the organic compound (c) is a .beta.-ketoacide ester.This radiation-sensitive mixture may be used to prepare photoresists.
    Type: Grant
    Filed: October 17, 1989
    Date of Patent: July 23, 1991
    Assignee: BASF Aktiengesellschaft
    Inventors: Son Nguyen-Kim, Gerhard Hoffmann, Reinhold Schwalm, Horst Binder