Abstract: Disclosed are thermal crosslink material, a manufacture method of a liquid crystal display panel and a liquid crystal display panel. A structural formula of the thermal crosslink material is wherein A is B is R is a linear or chain branched alkyl having 5-20 C atoms, and a first group obtained after some CH2 group in the alkyl is replaced by phenyl cycloalkyl, —O—, —CONH—, —COO—, —O—CO—, —CO— or —CH?CH— group, or a second group obtained after the alkyl and some H atom in the first group are replaced by F atom or Cl atom; the crosslinking reaction can be generated among the molecules of the thermal crosslink material to form polymer having crosslinked network, and the head groups A and B can be anchored on the substrate surface, and the branch R can act the result of vertical alignment, and thus to form the alignment films.

Abstract: The disclosure provides a reactive perpendicular aligned material, a liquid crystal display panel, and a method for aligning liquid crystals, a general structural formula of the reactive perpendicular aligned material is A-Z—R, A is —CH?CH—COOH; Z is where n?1; R represents a linear chained or a branched chained alkyl group with 5˜20 C atoms, a CH2 group in the alkyl group is substituted by a phenyl group, a naphthenic base, —CONH—, —COO—, —O—CO—, —S—, —CO— or —CH?CH—, or a F atom or a Cl atom substitutes for a H atom in the alkyl group.

Abstract: The disclosure provides a reactive perpendicular aligned organosilicon material and a manufacture method of a liquid crystal display panel, a general structural formula of the reactive perpendicular aligned organosilicon material is A-R, A is —SiCl3; R represents a linear chained or a branched chained alkyl group with 5˜20 C atoms, a CH2 group in the alkyl group is substituted by a phenyl group, a naphthenic base, —CONH—, —COO—, —O—CO—, —S—, —CO— or —CH?CH—, or a F atom or a Cl atom substitutes for a H atom in the alkyl group. A Cl atom in the reactive perpendicular aligned organosilicon material and —OH on a surface of the substrate without a PI film can form a hydrogen bond, leading to vertical arrangement of liquid crystal molecules.

Abstract: The present application provides a material of alignment film, a method of fabricating a liquid crystal display panel, and a liquid crystal display panel. The material of alignment film of the present application is obtained by mixing a polymerizable monomer in the polyamic acid solution, thus is easy to fabricate. The method of fabricating the liquid crystal display panel of the present application obtains an alignment film including a polyimide film and polymer protrusions located on a surface of the polyimide film by coating the material of alignment film on a substrate, and going through a series of processes; the alignment film can allow liquid crystal molecules arrange in vertical alignment and generate a pre-inclination angle, and a risk of the polymerizable monomer contaminating the liquid crystal molecules does not exist, so as to enhance quality of the liquid crystal display panel.

Abstract: The invention provides a PDLC display panel, manufacturing method thereof, and an LCD. The PDLC display panel comprises a PDLC layer, which comprising a plurality of red sub-pixel portions, green sub-pixel portions, and blue sub-pixel portions. The red, green and blue sub-pixel portion is a PDLC film having red, green and blue dye, respectively. The light passing through the red, green, and blue sub-pixel portions of the PDLC layer displays red, green and blue colors respectively. The PDLC display panel is simple in structure, on the premise to achieve color display, eliminating the upper and lower polarizers, polyimide (PI) alignment layer, CF layer and the black matrix, to achieve high light penetration rate and low manufacturing costs, as well as high backlight utilization with the use of quantum dot layer in the CF substrate.

Abstract: The invention provides a manufacturing method for VA type LCD panel. The manufacturing method of the present invention adds a photo-initiator and a polymeric monomer to LC material, and uses UV light to irradiate through a mask so that the polymeric monomer polymerizes in accordance with the mask pattern to form polymer protrusions on the array substrate side to achieve the effect similar to protrusion or slit. The method is applicable for the LC molecules to form the pre-tilt angle so that the LC molecules in the panel are lined up along the normal direction. The method is simple, eliminates ITO etching process on the array substrate side, and reduces costs.

Abstract: The invention relates to the field of liquid crystal technology, and more particularly to an alignment film being applied in a PSVA liquid crystal display panel and including a first branched chain M and a second branched chain Q bonded on polyimide as a main chain and thus having a structure as shown in the following formula: The first branched chain M is a group applied to deflect the liquid crystal in a distribution state; the second branched chain Q is a group containing nitrobenzophenone or benzoquinonyl. The invention also provides a liquid crystal display panel using the alignment film. The invention can effectively suppress the broken bright point issue of panel and thereby improve panel quality.

Abstract: The present invention provides a liquid crystal vertical alignment agent, and the liquid crystal vertical alignment agent can make the liquid crystal molecules vertically orientated relative to the substrate surface. The liquid crystal vertical alignment agent makes a cheap price, a stable performance and can make the liquid crystal molecules be vertically aligned. The alignment film such as polyimide (PI) in the present liquid crystal display (such as TFT-LCD) can be replaced, which is beneficial for raising the display performance of the liquid crystal display. The present invention further provides a liquid crystal display element, and the liquid crystal display element utilizes the said liquid crystal vertical alignment agent to make the alignment of the liquid crystal molecules in the vertical direction more consistent and have long term stability.

Abstract: The disclosure provides a polymer used for orientation film material and a method for preparing an orientation film. The polymer is formed by siloxane connecting with polyimide. The pre-tilt angle of liquid crystal molecules can be controlled within a wide range by controlling the content of siloxane in polymer, and the polymer has great heat resistance and mechanical properties. The method for preparing an orientation film of the disclosure comprises forming a precursor of orientation film by dissolving siloxane and precursor of polyimide (diamine monomer, dianhydride monomer) in a solvent, coating the precursor of orientation film on a substrate, and obtaining the orientation film after pre-solidifying and main-solidifying, the steps are simple and the prepared orientation film has a wide range of pre-tilt angle, such that the pre-tilt angle of liquid crystal molecules in the liquid crystal panels of the orientation film can be controlled within a wide range.

Abstract: Described herein is a method for simulating an image formed within a resist layer on a substrate resulting from an incident radiation, the substrate having a first feature and a second feature underlying the resist layer, the method comprising: simulating a first partial image using interaction of the incident radiation and the first feature without using interaction of the incident radiation and the second feature; simulating a second partial image using the interaction of the incident radiation and of the second feature without using the interaction of the incident radiation and the first feature; computing the image formed within the resist layer from the first partial image, and the second partial image; wherein the interaction of the incident radiation and the first feature is different from the interaction of the incident radiation and the second feature.

Abstract: The preset invention provides methods, systems and computer program product for selection of an optimum set of patterns to calibrate a lithography model so that the model can predict imaging performance of a lithography apparatus/system more accurately and reliably without being prohibitively expensive in terms of using computational and metrology resources and time. The method is based on modeling sensitivity of the calibration patterns to measurement noise. In one aspect of the present invention, a method is disclosed, comprising: identifying a model of at least a portion of a lithographic process; identifying a set of patterns for calibrating the model; and, estimating measurement noise associated with the set of patterns.

Abstract: Described herein is a method for simulating an image formed within a resist layer on a substrate resulting from an incident radiation, the substrate having a first feature and a second feature underlying the resist layer, the method comprising: simulating a first partial image using interaction of the incident radiation and the first feature without using interaction of the incident radiation and the second feature; simulating a second partial image using the interaction of the incident radiation and of the second feature without using the interaction of the incident radiation and the first feature; computing the image formed within the resist layer from the first partial image, and the second partial image; wherein the interaction of the incident radiation and the first feature is different from the interaction of the incident radiation and the second feature.

Abstract: A system and a method for holographic storage mainly involve forming a holographic interference pattern in a holographic recording medium. The holographic storage system utilizes a light source to emit a coherent beam. The coherent beam is irradiated to a first reflector to form a divergent beam. The divergent beam is then irradiated to a second reflector to form collimating beams (a signal beam and a reference beam). The signal beam goes through a spatial light modulator (SLM) and is modulated by the SLM. After that, the reference beam and the modulated signal beam are irradiated to a convergent unit, and are directed to the holographic recording medium for forming the holographic interference pattern. The holographic storage system that the light source is split into a signal beam and a reference beam by a set of reflectors according to the reflection principle without involving refraction may employ wavelength multiplexing.

Abstract: A system and a method for holographic storage mainly involve forming a holographic interference pattern in a holographic recording medium. The holographic storage system utilizes a light source to emit a coherent beam. The coherent beam is irradiated to a first reflector to form a divergent beam. The divergent beam is then irradiated to a second reflector to form collimating beams (a signal beam and a reference beam). The signal beam goes through a spatial light modulator (SLM) and is modulated by the SLM. After that, the reference beam and the modulated signal beam are irradiated to a convergent unit, and are directed to the holographic recording medium for forming the holographic interference pattern. The holographic storage system that the light source is split into a signal beam and a reference beam by a set of reflectors according to the reflection principle without involving refraction may employ wavelength multiplexing.

Abstract: A system and a method for holographic storage mainly involve forming a holographic interference pattern in a holographic recording medium. The holographic storage system utilizes a light source to emit a coherent beam. The coherent beam is irradiated to a first reflector to form a divergent beam. The divergent beam is then irradiated to a second reflector to form collimating beams (a signal beam and a reference beam). The signal beam goes through a spatial light modulator (SLM) and is modulated by the SLM. After that, the reference beam and the modulated signal beam are irradiated to a convergent unit, and are directed to the holographic recording medium for forming the holographic interference pattern. The holographic storage system that the light source is split into a signal beam and a reference beam by a set of reflectors according to the reflection principle without involving refraction may employ wavelength multiplexing.

Abstract: A system and a method for holographic storage mainly involve forming a holographic interference pattern in a holographic recording medium. The holographic storage system utilizes a light source to emit a coherent beam. The coherent beam is irradiated to a first reflector to form a divergent beam. The divergent beam is then irradiated to a second reflector to form collimating beams (a signal beam and a reference beam). The signal beam goes through a spatial light modulator (SLM) and is modulated by the SLM. After that, the reference beam and the modulated signal beam are irradiated to a convergent unit, and are directed to the holographic recording medium for forming the holographic interference pattern. The holographic storage system that the light source is split into a signal beam and a reference beam by a set of reflectors according to the reflection principle without involving refraction may employ wavelength multiplexing.

Abstract: An optical disk control mechanism comprising an electric motor, a transmission component, a limiting switch and a sliding plate. The transmission component rotates when driven by the electric motor. The transmission component includes a first timing element and a second timing element. The limiting switch has a first electrode head and a second electrode head. The first timing element makes contact with the first electrode head so that the first electrode head and the second electrode head can connect electrically when the transmission component rotates. The sliding plate has an edge. The second timing element makes contact with the edge of the sliding plate and pushes the sliding plate along as the transmission component rotates.

Abstract: An optical disk control mechanism comprising an electric motor, a transmission component, a limiting switch and a sliding plate. The transmission component rotates when driven by the electric motor. The transmission component includes a first timing element and a second timing element. The limiting switch has a first electrode head and a second electrode head. The first timing element makes contact with the first electrode head so that the first electrode head and the second electrode head can connect electrically when the transmission component rotates. The sliding plate has an edge. The second timing element makes contact with the edge of the sliding plate and pushes the sliding plate along as the transmission component rotates.