Abstract: A device for measuring superfine particles masses includes an exposure system with at least two measurement chambers having an identical geometry. Each measurement chamber has a deposition surface for the superfine particles which each have an aerosol feed line. The aerosol feed line has an outlet region to feed an aerosol onto the deposition surface, a means for generating a potential difference between the superfine particles in the aerosol and the deposition surface, and a grid arranged above the deposition surface. The outlet region has a widened outlet cross section having a constant distance from the deposition surface. At least one deposition surface is arranged on a piezoelectric crystal as a superfine balance. A first potential corresponding to a ground potential is present at each deposition surface. A second potential having a potential difference of at least 200 V in relation to the first potential is present at each grid.

Abstract: A device for measuring superfine particles masses includes an exposure system with at least two measurement chambers having an identical geometry. Each measurement chamber has a deposition surface for the superfine particles which each have an aerosol feed line. The aerosol feed line has an outlet region to feed an aerosol onto the deposition surface, a means for generating a potential difference between the superfine particles in the aerosol and the deposition surface, and a grid arranged above the deposition surface. The outlet region has a widened outlet cross section having a constant distance from the deposition surface. At least one deposition surface is arranged on a piezoelectric crystal as a superfine balance. A first potential corresponding to a ground potential is present at each deposition surface. A second potential having a potential difference of at least 200 V in relation to the first potential is present at each grid.

Abstract: A device for measuring superfine particle masses including a quartz oscillator and an exposure system having at least two measuring chambers. Each of the at least two measuring chambers has a same geometry, a deposition surface for particles, and an aerosol feed directed at the respective disposition surface configured to feed an aerosol onto the respective deposition surface. At least one of the respective deposition surfaces is disposed on the quartz oscillator.

Abstract: A device for measuring superfine particle masses including a quartz oscillator and an exposure system having at least two measuring chambers. Each of the at least two measuring chambers has a same geometry, a deposition surface for particles, and an aerosol feed directed at the respective disposition surface configured to feed an aerosol onto the respective deposition surface. At least one of the respective deposition surfaces is disposed on the quartz oscillator.