Patents by Inventor Stefan J. Caporale
Stefan J. Caporale has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190204742Abstract: Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an orType: ApplicationFiled: December 19, 2018Publication date: July 4, 2019Inventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSISTO, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
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Patent number: 9581904Abstract: Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.Type: GrantFiled: October 29, 2015Date of Patent: February 28, 2017Assignee: Rohm and Haas Electronic Materials LLCInventors: Choong-Bong Lee, Stefan J. Caporale, Jason A. DeSisto, Jong Keun Park, Cong Liu, Cheng-Bai Xu, Cecily Andes
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Patent number: 9508553Abstract: New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces.Type: GrantFiled: December 30, 2011Date of Patent: November 29, 2016Assignee: Rohm and Haas Electronic Materials LLCInventors: Gerd Pohlers, Stefan J. Caporale
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Publication number: 20160122574Abstract: Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.Type: ApplicationFiled: October 29, 2015Publication date: May 5, 2016Inventors: Choong-Bong LEE, Stefan J. CAPORALE, Jason A. DeSISTO, Jong Keun PARK, Cong LIU, Cheng-Bai XU, Cecily ANDES
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Publication number: 20160124309Abstract: Methods of forming an electronic device, comprise: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises: a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an orType: ApplicationFiled: October 29, 2015Publication date: May 5, 2016Inventors: Choong-Bong LEE, Stefan J. CAPORALE, Jason A. DeSISTO, Jong Keun PARK, Cong LIU, Cheng-Bai XU, Cecily ANDES
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Patent number: 9244355Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.Type: GrantFiled: October 30, 2007Date of Patent: January 26, 2016Assignee: Rohm and Haas Electronic Materials, LLCInventors: Stefan J. Caporale, George G. Barclay, Deyan Wang, Li Jia
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Publication number: 20150147463Abstract: Certain polyphenylene oligomers having good solvent strip resistance, low coefficient of thermal expansion and good adhesion to a variety of surfaces are useful as thin-film dielectric materials in electronics applications.Type: ApplicationFiled: November 25, 2014Publication date: May 28, 2015Inventors: Christopher D. Gilmore, Lujia BU, Peng-Wei CHUANG, Cecilia Waithera KIARIE, Young Seok KIM, Kathleen M. O'Connell, Stefan J. CAPORALE
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Publication number: 20120199957Abstract: New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride, hafnium silicate, zirconium silicate and other inorganic surfaces.Type: ApplicationFiled: December 30, 2011Publication date: August 9, 2012Applicant: Rohm and Haas Electronic Materials LLCInventors: Gerd POHLERS, Stefan J. Caporale
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Publication number: 20080193872Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials that comprise acidic groups spaced from a polymer backbone. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.Type: ApplicationFiled: October 30, 2007Publication date: August 14, 2008Applicant: Rohm and Haas Electronic Materials LLCInventors: Stefan J. Caporale, George G. Barclay, Deyan Wang, Li Jia
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Patent number: 7208261Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.Type: GrantFiled: April 5, 2004Date of Patent: April 24, 2007Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
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Patent number: 6849381Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: GrantFiled: April 7, 2003Date of Patent: February 1, 2005Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Patent number: 6849376Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.Type: GrantFiled: February 25, 2002Date of Patent: February 1, 2005Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale
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Patent number: 6841331Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.Type: GrantFiled: February 26, 2002Date of Patent: January 11, 2005Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
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Publication number: 20040259025Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.Type: ApplicationFiled: April 5, 2004Publication date: December 23, 2004Applicant: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
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Patent number: 6777157Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: GrantFiled: May 9, 2000Date of Patent: August 17, 2004Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Publication number: 20030215742Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.Type: ApplicationFiled: April 7, 2003Publication date: November 20, 2003Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
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Publication number: 20030031949Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.Type: ApplicationFiled: February 25, 2002Publication date: February 13, 2003Applicant: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale
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Publication number: 20030027075Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.Type: ApplicationFiled: February 26, 2002Publication date: February 6, 2003Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
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Patent number: 5702611Abstract: The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said organic solution with said exchange resins for a time sufficient to remove ionic metal impurities and acids. The invention is useful for removal of ionic contaminants from organic solutions requiring high purity.Type: GrantFiled: January 14, 1997Date of Patent: December 30, 1997Assignee: Shipley Company, L.L.C.Inventors: Dana A. Gronbeck, Kathleen M. O'Connell, William Andrew Burke, Michael N. Gaudet, Stefan J. Caporale