Patents by Inventor STEFAN RIST

STEFAN RIST has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9925696
    Abstract: The invention relates to an irradiation and molding unit which can be cooled for curing light-curable polymer compositions, a method for preparing cured polymer moldings or articles coated with cured polymers by using the irradiation and molding unit which can be cooled, as well as the use of such irradiation unit for preparing polymer moldings or polymer coated articles.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: March 27, 2018
    Assignee: Momentive Performance Materials GmbH
    Inventors: Stefan Rist, Clemens Trumm, Holger Albrecht
  • Patent number: 9927714
    Abstract: A microlithography projection exposure apparatus includes a projection lens at least one manipulator to change an optical effect of at least one optical element of the projection lens, and a travel establishing device for generating a travel command for the at least one manipulator.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: March 27, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Stefan Rist
  • Patent number: 9910364
    Abstract: A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: March 6, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Stefan Rist
  • Patent number: 9823578
    Abstract: The disclosure provides a control device for controlling at least one manipulator of a microlithographic projection lens by generating a travel command, which defines a change to be undertaken, of an optical effect of at least one optical element of the projection lens by manipulating a property of the optical element via the at least one manipulator along a travel. The control device is configured to generate the travel command for the at least one manipulator from a state characterization of the projection lens by optimizing a merit function. Here, the merit function includes a linear combination of at least two exponential expressions, a setting of the at least one manipulator defining the manipulation of the property of the optical element is represented via a travel variable and the respective base of the at least two exponential expressions contains a function of the travel variable.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: November 21, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Stefan Rist
  • Patent number: 9731435
    Abstract: The invention relates to an integral irradiation unit for hardening light-hardening polymer compositions, a method for producing hardened polymer molded bodies or bodies coated with hardened polymers using the integral irradiation unit, and to the use of the integral irradiation unit for producing molded polymer bodies or bodies coated with polymers.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: August 15, 2017
    Assignee: Momentive Performance Materials GmbH
    Inventors: Stefan Rist, Clemens Trumm, Holger Albrecht
  • Publication number: 20170219932
    Abstract: A microlithography projection exposure apparatus includes a projection lens at least one manipulator to change an optical effect of at least one optical element of the projection lens, and a travel establishing device for generating a travel command for the at least one manipulator.
    Type: Application
    Filed: April 11, 2017
    Publication date: August 3, 2017
    Inventors: Boris Bittner, Stefan Rist
  • Publication number: 20170115576
    Abstract: A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.
    Type: Application
    Filed: October 20, 2016
    Publication date: April 27, 2017
    Inventors: Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Stefan Rist
  • Publication number: 20160299436
    Abstract: The disclosure provides a control device for controlling at least one manipulator of a microlithographic projection lens by generating a travel command, which defines a change to be undertaken, of an optical effect of at least one optical element of the projection lens by manipulating a property of the optical element via the at least one manipulator along a travel. The control device is configured to generate the travel command for the at least one manipulator from a state characterization of the projection lens by optimizing a merit function. Here, the merit function includes a linear combination of at least two exponential expressions, a setting of the at least one manipulator defining the manipulation of the property of the optical element is represented via a travel variable and the respective base of the at least two exponential expressions contains a function of the travel variable.
    Type: Application
    Filed: March 25, 2016
    Publication date: October 13, 2016
    Inventor: Stefan Rist
  • Publication number: 20140191445
    Abstract: The invention relates to an irradiation and molding unit which can be cooled for curing light-curable polymer compositions, a method for preparing cured polymer moldings or articles coated with cured polymers by using the irradiation and molding unit which can be cooled, as well as the use of such irradiation unit for preparing polymer moldings or polymer coated articles.
    Type: Application
    Filed: August 17, 2012
    Publication date: July 10, 2014
    Applicant: Momentive Performance Materials GmbH
    Inventors: Stefan Rist, Clemens Trumm, Holger Albrecht
  • Publication number: 20130026682
    Abstract: The invention relates to an integral irradiation unit for hardening light-hardening polymer compositions, a method for producing hardened polymer molded bodies or bodies coated with hardened polymers using the integral irradiation unit, and to the use of the integral irradiation unit for producing molded polymer bodies or bodies coated with polymers.
    Type: Application
    Filed: February 7, 2011
    Publication date: January 31, 2013
    Applicant: MOMENTIVE PERFORMANCE MATERIALS GMBH
    Inventors: Stefan Rist, Clemens Trumm, Holger Albrecht
  • Publication number: 20080033071
    Abstract: The invention relates to the use of light-activated hardenable silicon compositions for the production of thick-walled moulded articles or thick-walled coatings, such as moulds for casting compositions, moulding compositions, sealants, prosthetic moulded articles or casts, formed-in-place gaskets, thick-walled coatings such as conformal coatings and method for production thereof.
    Type: Application
    Filed: July 27, 2005
    Publication date: February 7, 2008
    Applicant: GE Bayer Silicones GmbH & Co. KG
    Inventors: Uwe Irmer, Stefan Rist, Stephan Bosshammer, Markus Putzer, Thomas Naumann
  • Publication number: 20010011117
    Abstract: Addition crosslinking silicone rubber mixtures comprising an alkenyl group—containing organopolysiloxane, a hydrogen siloxane, a Pt or Rh catalyst and an alkoxy silane or alkoxy siloxane.
    Type: Application
    Filed: May 1, 1998
    Publication date: August 2, 2001
    Inventors: KLAUS-DIETER PESCH, STEFAN RIST, HELMUT STEINBERGER, DIETER WROBEL