Patents by Inventor Stefan Ruckmich

Stefan Ruckmich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130134126
    Abstract: A technique, comprising defining at least part of one or more electronic devices on a substrate sheet by means of one or more material removal processes, wherein the substrate sheet is arranged on a lower layer so as to overhang said lower layer more at a first end than it does at an opposite, second end; and removing loose material from under said overhang at said first end by means of a stream of gas directed at said substrate and said lower layer from an outlet, said stream of gas having at said outlet at least a directional component parallel to a direction from said second end to said first end.
    Type: Application
    Filed: June 3, 2011
    Publication date: May 30, 2013
    Applicant: PLASTIC LOGIC LIMITED
    Inventors: Dorota Kowal-Paul, Enrico Bellmann, Oisin Kenny, Stefan Ruckmich
  • Patent number: 8097955
    Abstract: Interconnect structures and methods are disclosed. In one embodiment, an interconnect structure includes a via extendable through a workpiece from a first side of the workpiece to a second side of the workpiece. The via is partially filled with a conductive material and has sidewalls. The interconnect structure includes a contact coupled to the conductive material in the via proximate the first side of the workpiece. The conductive material in the via comprises a recessed region comprising a landing zone proximate the second side of the workpiece.
    Type: Grant
    Filed: October 15, 2008
    Date of Patent: January 17, 2012
    Assignee: Qimonda AG
    Inventors: Bernd Zimmermann, Volker Berghof, Stefan Ruckmich, Thorsten Schedel
  • Patent number: 8093696
    Abstract: According to one embodiment of the present invention, a semiconductor device is provided, that includes a semiconductor carrier; a cavity formed within the semiconductor carrier, the cavity extending from the top surface of the semiconductor carrier into the semiconductor carrier; and at least one semiconductor chip provided within the cavity.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: January 10, 2012
    Assignee: Qimonda AG
    Inventors: Kimyung Yoon, Stephan Dobritz, Stefan Ruckmich
  • Publication number: 20100090317
    Abstract: Interconnect structures and methods are disclosed. In one embodiment, an interconnect structure includes a via extendable through a workpiece from a first side of the workpiece to a second side of the workpiece. The via is partially filled with a conductive material and has sidewalls. The interconnect structure includes a contact coupled to the conductive material in the via proximate the first side of the workpiece. The conductive material in the via comprises a recessed region comprising a landing zone proximate the second side of the workpiece.
    Type: Application
    Filed: October 15, 2008
    Publication date: April 15, 2010
    Inventors: Bernd Zimmermann, Volker Berghof, Stefan Ruckmich, Thorsten Schedel
  • Publication number: 20090283899
    Abstract: According to one embodiment of the present invention, a semiconductor device is provided, that includes a semiconductor carrier; a cavity formed within the semiconductor carrier, the cavity extending from the top surface of the semiconductor carrier into the semiconductor carrier; and at least one semiconductor chip provided within the cavity.
    Type: Application
    Filed: May 16, 2008
    Publication date: November 19, 2009
    Inventors: Kimyung Yoon, Stephan Dobritz, Stefan Ruckmich
  • Publication number: 20090001366
    Abstract: A wafer arrangement in accordance with an embodiment of the invention includes a wafer having a plurality of dice, wherein at least some of the dice have a first connection, and at least one contact pad formed at the wafer edge, wherein a plurality of first connections are coupled by means of a section of a redistribution layer and the contact pad is formed by the section of the redistribution layer.
    Type: Application
    Filed: July 16, 2007
    Publication date: January 1, 2009
    Inventors: Stephan Dobritz, Stefan Ruckmich
  • Patent number: 7390742
    Abstract: The invention relates to a method for producing a rewiring printed circuit board with a substrate wafer having passage connections between a first and a second surface. One embodiment of the method comprises applying and patterning masking layers on the first and the second surfaces, thereby uncovering a first contact location on the first surface and a second contact location on the second surface; applying a protective layer to the second surface in order to protect the corresponding masking layer and the second contact location during subsequent method steps; applying a first conductor structure to the first surface, the first conductor structure on the first surface covering the first contact location; removing the protective layer on the second surface; and applying a second conductor structure to the second surface, the second conductor structure on the second surface covering the second contact location.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: June 24, 2008
    Assignee: Infineon Technologies AG
    Inventors: Axel Brintzinger, Stefan Ruckmich, Octavio Trovarelli, Fritz Uhlendorf, legal representative, David Wallis, Ingo Uhlendorf
  • Patent number: 7368375
    Abstract: An electronic component includes compliant elevations having electrical contact areas for contact-connecting the component to an electronic circuit. The compliant elevations are arranged on a surface of the component and the electrical contact areas are arranged on the tip of the compliant elevations. The electrical contact with the electronic circuit is embodied by means of electrical conductive tracks arranged on the surface of the component. The conductive tracks ascend on the outer surfaces of the compliant elevations to the electrical contact areas.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: May 6, 2008
    Assignee: Infineon Technologies AG
    Inventors: Axel Brintzinger, Stefan Ruckmich, Octavio Trovarelli
  • Publication number: 20060121257
    Abstract: The invention relates to a method for producing a rewiring printed circuit board with a substrate wafer having passage connections between a first and a second surface. One embodiment of the method comprises applying and patterning masking layers on the first and the second surfaces, thereby uncovering a first contact location on the first surface and a second contact location on the second surface; applying a protective layer to the second surface in order to protect the corresponding masking layer and the second contact location during subsequent method steps; applying a first conductor structure to the first surface, the first conductor structure on the first surface covering the first contact location; removing the protective layer on the second surface; and applying a second conductor structure to the second surface, the second conductor structure on the second surface covering the second contact location.
    Type: Application
    Filed: October 14, 2005
    Publication date: June 8, 2006
    Inventors: Axel Brintzinger, Stefan Ruckmich, Octavio Trovarelli, David Wallis
  • Publication number: 20050275085
    Abstract: An arrangement reduces the electrical crosstalk on a chip, in particular between adjacent conductors of the redistribution routing and/or between the redistribution routing on the first passivation on the chip and the metallization of the chip. In one aspect, the arrangement reduces the crosstalk between the redistribution wiring on a chip and its metallization and can be realized simply and independently at the front end. This is achieved by at least an additional conductor (10) being respectively arranged between adjacent conductors of the redistribution routing (1) and/or at least a second passivation (7) with a lower dielectric constant of a preferred “cold dielectric” being arranged between the redistribution routing (1) and the first passivation (2) on the active region of the chip (3).
    Type: Application
    Filed: May 27, 2005
    Publication date: December 15, 2005
    Inventors: Axel Brintzinger, Octavio Trovarelli, Ingo Uhlendorf, Stefan Ruckmich, David Wallis, Fritz Uhlendorf, Helga Uhlendorf
  • Publication number: 20050127521
    Abstract: An electronic component includes compliant elevations having electrical contact areas for contact-connecting the component to an electronic circuit. The compliant elevations are arranged on a surface of the component and the electrical contact areas are arranged on the tip of the compliant elevations. The electrical contact with the electronic circuit is embodied by means of electrical conductive tracks arranged on the surface of the component. The conductive tracks ascend on the outer surfaces of the compliant elevations to the electrical contact areas.
    Type: Application
    Filed: November 24, 2004
    Publication date: June 16, 2005
    Inventors: Axel Brintzinger, Stefan Ruckmich, Octavio Trovarelli
  • Patent number: 6664176
    Abstract: A method for forming printed re-routing for wafer level packaging, especially chip size packaging. The method includes forming a contact layer on a semiconductor die, printing a conductive redistribution structure on the contact layer, and etching the contact layer of the die by using the conductive redistribution structure as a self-aligning mask.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: December 16, 2003
    Assignee: Infineon Technologies AG
    Inventors: Harry Hedler, Thorsten Meyer, Stefan Ruckmich, Barbara Vasquez
  • Publication number: 20030042620
    Abstract: A method for forming printed re-routing for wafer level packaging, especially chip size packaging. The method includes forming a contact layer on a semiconductor die, forming a conductive redistribution structure on the contact layer, and etching the contact layer of the die by using the conductive redistribution structure as a self-aligning mask. The present method significantly decreases the complexity and costs for generating redistribution structures in wafer level packaging by discarding expensive processes for photolithography and plating. Furthermore, using the redistribution structures as a self-aligning mask improves alignment and reduces the number of processes required, leading to greater production optimization and efficiency.
    Type: Application
    Filed: August 31, 2001
    Publication date: March 6, 2003
    Inventors: Harry Hedler, Thorsten Meyer, Stefan Ruckmich, Barbara Vasquez