Abstract: The invention is directed to a device for exposure control in photolithographic direct exposure processes for two-dimensional structures in photosensitive coatings and to a method for converting registration data into direct exposure data. The object of the invention, to find an improved exposure control in direct exposure methods for two-dimensional structures in photosensitive layers which permits a registration of target marks independent from defined locations of the target marks, is met according to the invention in that a plurality of entocentric cameras are arranged in a registration unit (1) in linear alignment transverse to the one-dimensional movement of the substrate (2) to form a gapless linear scanning area (23) over a predetermined width of the substrate (2).

Abstract: Apparatus for holding flat plates of varying sizes, including a base section having a flat surface and including plurality of interconnected channels formed on the surface thereof; at least one port connecting to the channels; a vacuum source connected to the at least one port; and an intermediate plate covering substantially all of the channels and having a multiplicity of holes formed therethrough, the holes being arranged to be covered by a flat plate that is to be held to the flat surface.

Abstract: Apparatus for holding flat plates of varying sizes, including a base section having a flat surface and including plurality of interconnected channels formed on the surface thereof; at least one port connecting to the channels; a vacuum source connected to the at least one port; and an intermediate plate covering substantially all of the channels and having a multiplicity of holes formed therethrough, the holes being arranged to be covered by a flat plate that is to be held to the flat surface.

Abstract: A method of scanning for writing a pattern on a surface, including providing a scanning beam comprised of a plurality of independently addressable sub-beams, scanning the surface with the scanning beam a plurality of times, the sub-beams scanning the surface side-by-side in the cross-scan direction, each sub-beam being modulated to reflect information to be written, and overlapping the beams in successive scans in the cross scan direction such that all written areas of the surface are written on during at least two scans.