Patents by Inventor Stephan Albrecht
Stephan Albrecht has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6504861Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: GrantFiled: April 1, 2002Date of Patent: January 7, 2003Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Patent number: 6493370Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: GrantFiled: April 12, 2002Date of Patent: December 10, 2002Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Patent number: 6490308Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: GrantFiled: April 1, 2002Date of Patent: December 3, 2002Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Publication number: 20020131468Abstract: An apparatus and method are provided for bandwidth narrowing of an excimer laser to &Dgr;&lgr;≈6 pm or less with high spectral purity and minimized output power loss. Output stability with respect to pulse energy, beam pointing, beam size and beam output location is also provided. The excimer laser includes an active laser medium for generating a spectral beam at an original wavelength, means for selecting and narrowing the broadband output spectrum of the excimer laser, a resonator having at least one highly reflecting surface, and an output coupler. Means for adapting a divergence of the resonating band within the resonator is further included in the apparatus of the invention. The divergence adapting causes the spectral purity to improve by between 20% and 50% and the output power to reduce by less than 10%. A method according to the invention includes selecting and aligning the divergence adapting means.Type: ApplicationFiled: March 28, 2002Publication date: September 19, 2002Applicant: Lambda Physik AG.Inventors: Hans-Stephan Albrecht, Peter Heist, Klaus Wolfgang Volger
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Publication number: 20020110174Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: ApplicationFiled: April 12, 2002Publication date: August 15, 2002Applicant: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Publication number: 20020101902Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: ApplicationFiled: April 1, 2002Publication date: August 1, 2002Applicant: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Publication number: 20020101901Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: ApplicationFiled: April 1, 2002Publication date: August 1, 2002Applicant: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Patent number: 6404796Abstract: An apparatus and method are provided for bandwidth narrowing of an excimer laser to &Dgr;&lgr;≈6 pm or less with high spectral purity and minimized output power loss. Output stability with respect to pulse energy, beam pointing, beam size and beam output location is also provided. The excimer laser includes an active laser medium for generating a spectral beam at an original wavelength, means for selecting and narrowing the broadband output spectrum of the excimer laser, a resonator having at least one highly reflecting surface, and an output coupler. Means for adapting a divergence of the resonating band within the resonator is further included in the apparatus of the invention. The divergence adapting causes the spectral purity to improve by between 20% and 50% and the output power to reduce by less than 10%. A method according to the invention includes selecting and aligning the divergence adapting means.Type: GrantFiled: August 6, 2001Date of Patent: June 11, 2002Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Peter Heist, Klaus Wolfgang Volger
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Patent number: 6389052Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: GrantFiled: December 11, 2000Date of Patent: May 14, 2002Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Patent number: 6389048Abstract: An ultraviolet light detection system is provided wherein a dark current background growth rate with total accumulated exposure dose is avoided, and parameters of an ultraviolet radiation source such as an ArF-excimer laser may be monitored without rapid degradation of the signal by the superposition of the dark current background over a desired signal. The invention provides a detector including a light sensitive element having a frequency conversion coating on its surface. The coating is preferably directly on the light sensitive element, absorbing incident ultraviolet light and re-emitting visible light in a direction toward the light sensitive element. The coating minimizes a dark current background that would otherwise appear when incident ultraviolet light impinges directly upon the light sensitive element, and thereby extends a lifetime of the light sensitive element.Type: GrantFiled: June 25, 2001Date of Patent: May 14, 2002Assignee: Lambda Physik AGInventors: Uwe Stamm, Hans-Stephan Albrecht, Uwe Leinhos, Wolfgang Zschocke
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Publication number: 20020031161Abstract: An apparatus and method are provided for bandwidth narrowing of an excimer laser to &Dgr;&lgr;≈6 pm or less with high spectral purity and minimized output power loss. Output stability with respect to pulse energy, beam pointing, beam size and beam output location is also provided. The excimer laser includes an active laser medium for generating a spectral beam at an original wavelength, means for selecting and narrowing the broadband output spectrum of the excimer laser, a resonator having at least one highly reflecting surface, and an output coupler. Means for adapting a divergence of the resonating band within the resonator is further included in the apparatus of the invention. The divergence adapting causes the spectral purity to improve by between 20% and 50% and the output power to reduce by less than 10%. A method according to the invention includes selecting and aligning the divergence adapting means.Type: ApplicationFiled: August 6, 2001Publication date: March 14, 2002Applicant: Lambda Physik AGInventors: Hans-Stephan Albrecht, Peter Heist, Klaus Wolfgang Vogler
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Patent number: 6327284Abstract: An ultraviolet light detection system is provided wherein a dark current background growth rate with total accumulated exposure dose is avoided, and parameters of an ultraviolet radiation source such as an ArF-excimer laser may be monitored without rapid degradation of the signal by the superposition of the dark current background over a desired signal. The invention provides a detector including a light sensitive element having a frequency conversion coating on its surface. The coating is preferably directly on the light sensitive element, absorbing incident ultraviolet light and re-emitting visible light in a direction toward the light sensitive element. The coating minimizes a dark current background that would otherwise appear when incident ultraviolet light impinges directly upon the light sensitive element, and thereby extends a lifetime of the light sensitive element.Type: GrantFiled: October 14, 1998Date of Patent: December 4, 2001Assignee: Lambda Physik AGInventors: Uwe Stamm, Hans-Stephan Albrecht, Uwe Leinhos, Wolfgang Zschocke
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Publication number: 20010042840Abstract: A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected with a discharge circuit for energizing the laser gas, a resonator including the discharge chamber for generating a laser beam, and a processor. The processor runs an energy control algorithm and sends a signal to the discharge circuit based on said algorithm to apply electrical pulses to the electrodes so that the laser beam exiting the laser system has a specified first energy distribution over a group of pulses. The energy control algorithm is based upon a second energy distribution previously determined of a substantially same pattern of pulses as the group of pulses having the first energy distribution.Type: ApplicationFiled: March 16, 2001Publication date: November 22, 2001Inventors: Uwe Stamm, Hans-Stephan Albrecht, Guenter Nowinsk
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Publication number: 20010040905Abstract: An ultraviolet light detection system is provided wherein a dark current background growth rate with total accumulated exposure dose is avoided, and parameters of an ultraviolet radiation source such as an ArF-excimer laser may be monitored without rapid degradation of the signal by the superposition of the dark current background over a desired signal. The invention provides a detector including a light sensitive element having a frequency conversion coating on its surface. The coating is preferably directly on the light sensitive element, absorbing incident ultraviolet light and re-emitting visible light in a direction toward the light sensitive element. The coating minimizes a dark current background that would otherwise appear when incident ultraviolet light impinges directly upon the light sensitive element, and thereby extends a lifetime of the light sensitive element.Type: ApplicationFiled: June 25, 2001Publication date: November 15, 2001Applicant: Lambda Physik AGInventors: Uwe Stamm, Hans-Stephan Albrecht, Uwe Leinhos, Wolfgang Zschocke
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Patent number: 6285701Abstract: An apparatus and method are provided for bandwidth narrowing of an excimer laser to &Dgr;&lgr;≈6 pm or less with high spectral purity and minimized output power loss. Output stability with respect to pulse energy, beam pointing, beam size and beam output location is also provided. The excimer laser includes an active laser medium for generating a spectral beam at an original wavelength, means for selecting and narrowing the broadband output spectrum of the excimer laser, a resonator having at least one highly reflecting surface, and an output coupler. Means for adapting a divergence of the resonating band within the resonator is further included in the apparatus of the invention. The divergence adapting causes the spectral purity to improve by between 20% and 50% and the output power to reduce by less than 10%. A method according to the invention includes selecting and aligning the divergence adapting means.Type: GrantFiled: August 6, 1998Date of Patent: September 4, 2001Assignee: Lambda Physik AGInventors: Hans-Stephan Albrecht, Peter Heist, Klaus Wolfgang Volger
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Publication number: 20010012309Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber preferably less than 0.2 mbar per injection. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the constituent gas in the discharge chamber.Type: ApplicationFiled: December 11, 2000Publication date: August 9, 2001Inventors: Hans-Stephan Albrecht, Klaus Wolfgang Vogler, Thomas Schroeder
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Patent number: 6160831Abstract: An excimer laser system having a precisely calibratable absolute emission wavelength is provided wherein at least one source of reference light is used. The reference light may be a laser such as a HeNe laser or a cathode lamp such as a hollow Pt, As, C, or Fe cathode lamp. The reference light and the excimer laser beam are directed along substantially the same optical path. The beams are broadened and recollimated by beam expanding optics. The broadened beams impinge upon a dispersive element, preferably an echelle grating, and various orders for each incident wavelength are dispersed. The beams are refocused onto a position sensitive detector such as a CCD camera. Different orders of one or more lines of known wavelength of the reference light and a line from the excimer laser emission are also incident at the detector simultaneously.Type: GrantFiled: March 17, 1999Date of Patent: December 12, 2000Assignee: Lambda Physik GmbHInventors: Jurgen Kleinschmidt, Hans-Stephan Albrecht, Peter Heist
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Patent number: 5826891Abstract: A snowboard binding with step-in function holds a boot by means of front and heel brackets. The heel bracket is preferably coupled to a driving element that moves the heel bracket in the direction toward the other bracket and simultaneously downward, namely in the direction toward the snowboard surface, during the movement from the open position to the closed position. A spring piston locks the driving element directly or indirectly in the closed position. This locking effect is realized in such a way that the closing force of the binding does not depend on the force of the spring of the spring piston.Type: GrantFiled: July 13, 1995Date of Patent: October 27, 1998Assignee: F2 International Ges.m.b.H.Inventor: Stephan Albrecht