Patents by Inventor Stephan Uhlemann
Stephan Uhlemann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11081313Abstract: A corrector has a strength of a central hexapole field (?HP2) which is selected such that the threefold axial astigmatism (A2) vanishes and the strengths of two equal outer hexapole fields (?HP1,3) are selected such that the overall corrector (5) does not have a sixfold axial astigmatism (A5). The length (L) of the central multipole element (2) in relation to the lengths (L?) of the multipole elements (1 and 3) is chosen such that the axial three-lobed aberration of sixth order (D6) vanishes. A separation between the outer multipole elements (1 and 3) and round lenses (7?, 8?) further spaced apart from a symmetry plane (6) of the corrector corresponds to the focal length (f?) of those round lenses (7?, 8?) plus an additional separation (?z) which is chosen such that the axial three-lobed aberration of fourth order (D4) vanishes for the given lengths L and L?.Type: GrantFiled: July 18, 2020Date of Patent: August 3, 2021Assignee: CEOS Corrected Electron Optical Systems GmbHInventor: Stephan Uhlemann
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Publication number: 20210050179Abstract: A corrector has a strength of a central hexapole field (?HP2) which is selected such that the threefold axial astigmatism (A2) vanishes and the strengths of two equal outer hexapole fields (?HP1,3) are selected such that the overall corrector (5) does not have a sixfold axial astigmatism (As). The length (L) of the central multipole element (2) in relation to the lengths (L) of the multipole elements (1 and 3) is chosen such that the axial three-lobed aberration of sixth order (D6) vanishes. A separation between the outer multipole elements (1 and 3) and round lenses (7?, 8?) further spaced apart from a symmetry plane (6) of the corrector corresponds to the focal length (f?) of those round lenses (7?, 8?) plus an additional separation (?z) which is chosen such that the axial three-lobed aberration of fourth order (D4) vanishes for the given lengths L and L?.Type: ApplicationFiled: July 18, 2020Publication date: February 18, 2021Inventor: Stephan Uhlemann
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Patent number: 10504681Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: May 30, 2017Date of Patent: December 10, 2019Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Publication number: 20170287674Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: May 30, 2017Publication date: October 5, 2017Inventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 9673024Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: December 18, 2015Date of Patent: June 6, 2017Assignees: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbHInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Publication number: 20160111251Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: December 18, 2015Publication date: April 21, 2016Inventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 9224576Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: January 27, 2014Date of Patent: December 29, 2015Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL, LTD.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Publication number: 20140158902Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: January 27, 2014Publication date: June 12, 2014Applicants: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbHInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Patent number: 8637834Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: December 31, 2011Date of Patent: January 28, 2014Assignees: Carl Zeiss Microscopy GmbH, Applied Materials Israel, Ltd.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximillian Haider, Antonio Casares, Steven Rogers
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Patent number: 8362442Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (x?, y?) is produced in the quadrupole field (1?) of a first quadrupole element (1) and this quadrupole field (1?) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are produced in the region of the center of the quadrupole fields (3?, 4?) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2?) of a second quadrupole element (2), the axial fundamental rays (x?, y?) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are located, each exhibit a maximum.Type: GrantFiled: December 21, 2010Date of Patent: January 29, 2013Assignee: CEOS Corrected Electron Optical Systems GmbHInventors: Joachim Zach, Stephan Uhlemann
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Publication number: 20120153147Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (x?, y?) is produced in the quadrupole field (1?) of a first quadrupole element (1) and this quadrupole field (1?) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are produced in the region of the center of the quadrupole fields (3?, 4?) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2?) of a second quadrupole element (2), the axial fundamental rays (x?, y?) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (x?, y?) are located, each exhibit a maximum.Type: ApplicationFiled: December 21, 2010Publication date: June 21, 2012Inventors: Joachim Zach, Stephan Uhlemann
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Publication number: 20120104252Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: December 31, 2011Publication date: May 3, 2012Applicants: Applied Materials Israel Ltd., Carl Zeiss SMT GmbHInventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 8097847Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: June 25, 2009Date of Patent: January 17, 2012Assignees: Carl Ziess SMT AG, Applied Materials Isreal LtdInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares
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Patent number: 7800074Abstract: An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.Type: GrantFiled: October 11, 2006Date of Patent: September 21, 2010Inventor: Stephan Uhlemann
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Patent number: 7800076Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes.Type: GrantFiled: March 31, 2007Date of Patent: September 21, 2010Inventors: Stephan Uhlemann, Harald Rose, Heiko Müller
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Publication number: 20100181479Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the firstType: ApplicationFiled: June 25, 2009Publication date: July 22, 2010Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares
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Patent number: 7745783Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2?, 3?) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8?, 9?) which eliminates the dispersion (4) of the at least one first deflecting field (2?, 3?). A radiation source (17) comprises such a monochromator (1).Type: GrantFiled: May 20, 2008Date of Patent: June 29, 2010Assignee: CEOS Corrected Electron Optical Systems GmbHInventor: Stephan Uhlemann
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Patent number: 7554094Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.Type: GrantFiled: June 13, 2007Date of Patent: June 30, 2009Assignees: Carl Zeiss SMT A.G., Applied Materials IsraelInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares
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Publication number: 20090134339Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes.Type: ApplicationFiled: March 31, 2007Publication date: May 28, 2009Inventors: Stephan Uhlemann, Harald Rose, Heiko Muller
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Publication number: 20080290273Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2?, 3?) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8?, 9?) which eliminates the dispersion (4) of the at least one first deflecting field (2?, 3?). A radiation source (17) comprises such a monochromator (1).Type: ApplicationFiled: May 20, 2008Publication date: November 27, 2008Applicant: CEOS Corrected Electron Optical Systems GmbHInventor: Stephan Uhlemann