Abstract: The present invention is related to a continuous method for the functionalization of a pulverulent product in a plasma reactor comprising the steps of:—generating a plasma in a vertical reactor;—bringing the pulverulent product in contact with said plasma by letting said particles fall by gravity from top to bottom trough said reactor. The present invention also discloses an instalation for performing the functionalization method.

Abstract: A radioactive or radioactivable nanostructure has a core, the core including at least two atoms, at least one of which being radioactive or radioactivable, and a shell encapsulating the core and selected among a selected material so that at the most, 20% of the radioactive radiation produced by the core are stopped or absorbed by the shell and the manufacturing method thereof. The various uses of such a nanostructure, and more specifically the use thereof in the medical field, and more specifically in targeted radiotherapy are also disclosed.

Abstract: A radioactive implant for brachytherapy includes a composite radioactive source having at least two different types of radionuclides.

Abstract: The invention relates to a method for production of a radio-isotope (4) from a target (3), containing a precursor (1) of said radio-isotope (4), using a beam of accelerated particles, comprising the following method steps: preparation of a target (3), containing the precursor (1) of the radioisotope (4), irradiation of said target (3) within an irradiation chamber (10) with a beam of accelerated particles in order to induce the transmutation of the precursor (1) into the radio-isotope (4), heating said target (3) in order to bring about the efflux of the radio-isotope (4) from the target (3), collection of said radio-isotope (4), extracted as a gas and condensation of said radio-isotope (4) into a solid or liquid. The invention further relates to a device for carrying out the above method and use of the device and method for the production of palladium 103 from rhodium 103.

Abstract: A process of depositing a coating (5) onto a substrate (3) by reactive sputtering in a closed chamber (1) in the presence of a plasma of a non-reactive gas, and a reactive gas containing the element or elements said coating has to be made of, according to which process use is made of a target (2) having a surface layer (4) directed towards the substrate and containing at least one of the elements to be sputter deposited onto this substrate, according to which process the thickness of said surface layer (4) during the cathode sputtering is controlled by adjusting the concentration of the gases in said closed chamber (1). The single figure.

Abstract: A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the coating material takes place. With the inventive process, deposits with controlled structure and adhesion can be made on moving substrate or support even at very high speeds, so that the process can advantageously be carried out continuously or at variable speed.

Abstract: A process for forming a coating on a substrate by condensation of a coating material onto the substrate while the substrate is moving through an enclosure under vacuum in which evaporation of the coating material takes place.