Abstract: A processor provides two-level interrupt servicing. In one embodiment, the processor comprises a storage device and an interrupt handler. The storage device is configured to store an interrupt identifier corresponding to an interrupt request. The interrupt handler is configured to recognize the interrupt request, initiate a common interrupt service routine responsive to recognizing the interrupt request and subsequently initiate an interrupt service routine corresponding to the stored interrupt identifier.

Abstract: A multiple flashpoint vaporization system rapidly sterilizes large enclosures. A plurality of vaporizers (10) inject hydrogen peroxide vapor into streams of carrier gas supplied by a generator (20). Supply lines (30) transport the mixture of carrier gas and hydrogen peroxide vapor to a plurality of regions of an enclosure (32). Monitors (52) monitor hydrogen peroxide vapor concentration or other conditions in each region of the enclosure. A control system (50) adjusts the hydrogen peroxide vapor supply rate in response to the corresponding monitored conditions.

Abstract: The invention provides a method and apparatus for minimizing heat degradation of a vapor decontaminant in a vaporizer by selectively operating a plurality of vaporizer heaters to provide a decreasing heat gradient through the vaporizer. A method and apparatus are also provided for selectively operating a plurality of preheaters, in series, for preheating a carrier gas entering a vaporizer in a flow-through decontamination system, and for maintaining a predetermined carrier gas temperature. A further method and apparatus are provided for fine-tuning chamber pressure in a high flow rate closed-loop flow-through vapor phase decontamination system.

Abstract: A system including a plurality of gas flow control units in cabinets which are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Transducers are used in the system to measure pressures and other control parameters. Zero calibration of the transducers is provided by automatically subjecting each transducer to a reference computer routine to compute the difference between the standard value and the transducer output, and store the difference as an "offset" to correct the output of the transducer. Thus, re-calibration is performed simply and quickly, at a relatively low labor cost and with relatively little downtime for the system.

Abstract: A system including a plurality of gas flow control units in cabinets which are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Transducers are used in the system to measure pressures and other control parameters. Zero calibration of the transducers is provided by automatically subjecting each transducer to a reference computer routine to compute the difference between the standard value and the transducer output, and store the difference as an "offset" to correct the output of the transducer. Thus, re-calibration is performed simply and quickly, at a relatively low labor cost and with relatively little downtime for the system.

Abstract: Gas flow control units in cabinet are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. The flow control units are adapted to deliver process gas selectively from one of two supply tanks to any one or all of four different tool locations. Simple, fast, low-cost purging of the gas delivery conduits is provided to facilitate maintenance, gas cylinder changes, etc. Means are provided to enable pulse purging of the long gas delivery conduit from the cabinet to the tool when flow-through or other purging is not possible.

Abstract: Gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control cabinet has an exhaust duct which connects to an exhaust duct in the plant through which waste gases from the cabinet are exhausted by a fan to the atmosphere. Low flow alarm signals are generated if the exhaust flow is below a desired level. A programmable controller is provided for controlling the alarm function according to the size of the exhaust ducting from the plant so as to facilitate installation and operation of each cabinet in a variety of locations with different duct sizes.

Abstract: A plurality of gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control unit is connected to a single tool interface controller over a single communications cable. The status and operational characteristics of the individual units are communicated through the tool interface controller to a supervisory control computer by means of polling. Each flow control cabinet has its own data processor, and can be operated alone. Also, the supervisory computer can be used to operate each cabinet, as well as to monitor operations of the system. Gas demand and other signals are communicated from each tool location to the control units through a single cable connected to the interface controller, thus reducing the original wiring cost.