Patents by Inventor Stephen McCAMMON

Stephen McCAMMON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films
    Patent number: 9661754
    Abstract: Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline soluble UV blocking composition is selectively applied to the surface of the UV blocking film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: May 23, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Krishna Balantrapu, Brian D. Amos, Stephen McCammon
  • Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films
    Patent number: 9622353
    Abstract: Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline strippable UV blocking composition is selectively applied to the surface of the UV transparent film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: April 11, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Krishna Balantrapu, Brian D. Amos, Stephen McCammon
  • IMAGING ON SUBSTRATES WITH ALKALINE STRIPPABLE UV BLOCKING COMPOSITIONS AND AQUEOUS SOLUBLE UV TRANSPARENT FILMS
    Publication number: 20160353577
    Abstract: Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline strippable UV blocking composition is selectively applied to the surface of the UV transparent film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.
    Type: Application
    Filed: September 14, 2015
    Publication date: December 1, 2016
    Inventors: Krishna Balantrapu, Brian D. Amos, Stephen McCammon
  • IMAGING ON SUBSTRATES WITH AQUEOUS ALKALINE SOLUBLE UV BLOCKING COMPOSITIONS AND AQUEOUS SOLUBLE UV TRANSPARENT FILMS
    Publication number: 20150351249
    Abstract: Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline soluble UV blocking composition is selectively applied to the surface of the UV blocking film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.
    Type: Application
    Filed: June 1, 2015
    Publication date: December 3, 2015
    Inventors: Krishna BALANTRAPU, Brian D. AMOS, Stephen McCAMMON
  • Method of removing negative acting photoresists
    Patent number: 8975008
    Abstract: Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 10, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Paul J. Ciccolo, Brian D. Amos, Stephen McCammon
  • METHOD OF REMOVING NEGATIVE ACTING PHOTORESISTS
    Publication number: 20140154631
    Abstract: Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
    Type: Application
    Filed: May 21, 2013
    Publication date: June 5, 2014
    Inventors: Paul J. CICCOLO, Brian D. AMOS, Stephen McCAMMON