Patents by Inventor Stephen Shiu-Kong Poon

Stephen Shiu-Kong Poon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Capped shallow trench isolation and method of formation
    Patent number: 6146970
    Abstract: A method for forming a capped shallow trench isolation (CaSTI) structure begin by etching a trench opening (210). The opening (210) is filled with an oxide or like trench fill material (216b) via a deposition and chemical mechanical polish (CMP) step. The plug (216b) is reactive ion etched (RIE) to recess a top of the plug (216b) into the trench opening (210) to form a recessed plug region (216c). A silicon nitride or oxynitride capping layer (218b) is then formed over the recessed plug region (216c) via another deposition and polishing step. The nitride cap layer (218b) protects the underlying region (216c) from erosion due to active area preparation, cleaning, and processing.
    Type: Grant
    Filed: May 26, 1998
    Date of Patent: November 14, 2000
    Assignee: Motorola Inc.
    Inventors: Keith E. Witek, Mike Hsiao-Hui Chen, Stephen Shiu-Kong Poon